公开(公告)号：KR1020110006080A

公开(公告)日：2011-01-20

申请号：KR1020090063547

申请日：2009-07-13

Applicant: 삼성전자주식회사

Inventor： 우석훈 ,  여정호 ,  조병옥 ,  박주온 ,  박창민 ,  김원선

IPC: G01N21/25 ,  G01B11/30

CPC classification number: G01B11/06 ,  G01B11/02 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/95615 ,  G03F7/70625

Abstract: PURPOSE: A structure inspecting method is provided to facilitate the measurement of the line width and thicknesses of structure by removal in processes of offsetting measurement difference between a model and a structure to be measured. CONSTITUTION: A structure inspecting method comprises following steps. A preliminary spectrum of standard diffraction intensity according to the line widths of the standard structures is prepared(S100). The linear spectrum is obtained from the preliminary spectrum in a fixed line width range(S110). The first light is incident to a structure formed on a structure to be measured(S120). The diffracted measurement diffraction intensity is measured from the structure(S130). The line width of the structure is obtained from the measurement diffraction intensity using the linear spectrum(S140).

Abstract translation: 目的：提供一种结构检查方法，以便在模拟和待测量结构之间的测量差异偏移的过程中通过去除在线宽度和结构厚度的测量。 构成：结构检查方法包括以下步骤。 准备根据标准结构的线宽的标准衍射强度的初步光谱（S100）。 从固定线宽范围的初步光谱获得线性光谱（S110）。 第一光入射到待测结构上形成的结构（S120）。 从结构（S130）测量衍射测量衍射强度。 使用线性光谱从测量衍射强度获得结构的线宽（S140）。