公开(公告)号：KR1020060107656A

公开(公告)日：2006-10-16

申请号：KR1020050029886

申请日：2005-04-11

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/66 ,  H01L21/02

CPC classification number: G01N21/9503 ,  H01L22/12

Abstract: 본 발명은 웨이퍼 에지영역 손상 검출장치 및 그 검출방법에 관한 것이다. 상기한 바와 같이 본 발명에서는, 척 상부에 로딩되어 회전되는 웨이퍼와 동일선상으로 일정 간격 이격된 위치에 레이저 센서를 형성한다. 그리고, 상기 레이저 센서의 레이저 빔 송신부를 통해 웨이퍼 에지영역으로 레이저 빔을 송신하고, 상기 송신된 레이저 빔이 레이저 빔 수신부로 정확히 수신되는가의 여부를 통해 웨이퍼 에지영역의 손상여부를 실시간 감지하여 적절한 대응조치를 취함으로써, 아킹등의 추가 불량 및 웨이퍼가 완전히 깨져 웨이퍼가 손실되는 문제점을 미연에 방지할 수 있게 된다.
반도체, 웨이퍼, 에지영역, 레이저 센서

公开(公告)号：KR1020030094748A

公开(公告)日：2003-12-18

申请号：KR1020020032023

申请日：2002-06-07

Applicant: 삼성전자주식회사

Inventor： 김상호 ,  배도인 ,  이상열 ,  윤기덕

IPC: H01L21/68

Abstract: PURPOSE: A method for detecting a vacuum leakage of a lift bellows is provided to detect damaged lift bellows by sealing lift holes formed in a support member while using a plate having a similar type to a chuck on which a semiconductor substrate is placed and a plurality of caps and by measuring the inner pressure of a chamber while sequentially removing the caps. CONSTITUTION: The chuck on which the substrate is placed is included inside the chamber for processing the substrate. The support member supports the chuck. Lift holes in which lift pins for loading/unloading the substrate are installed are sealed, penetrating the chuck and the support member(S100). The inside of the chamber is made vacuum(S200). The sealed lift holes sequentially gets open and the inner pressure of the chamber is measured, so that the sealing state of the lift bellows respectively connected to the lift holes formed in the support member is checked(S300).

Abstract translation: 目的：提供一种用于检测提升波纹管的真空泄漏的方法，用于通过密封形成在支撑构件中的升降孔来检测损坏的提升波纹管，同时使用与其上放置半导体基板的卡盘具有相似类型的板，并且多个 并且通过测量腔室的内部压力，同时顺序地移除盖子。 构成：将基板放置在其上的卡盘包含在用于处理基板的室内。 支撑构件支撑卡盘。 安装有用于装载/卸载基板的提升销的提升孔被密封，穿过卡盘和支撑构件（S100）。 室内部被制成真空（S200）。 密封的提升孔顺序地打开，并且测量室的内部压力，从而检查分别连接到形成在支撑构件中的提升孔的提升波纹管的密封状态（S300）。

公开(公告)号：KR1020030091447A

公开(公告)日：2003-12-03

申请号：KR1020020029491

申请日：2002-05-28

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/304

Abstract: PURPOSE: A gas scrubber is provided to be capable of effectively filtering harmful gas, and reducing the load of a gas pump by increasing the pressure difference between an outlet pipe and an inlet pipe. CONSTITUTION: A gas scrubber is provided with a resin filter(145) for filtering harmful gas, a canister(100), an inlet pipe located at one side of the canister for being used as an inlet path of the harmful gas, and an outlet pipe located at the other side of the canister for being used as an outlet path of filtered gas. The gas scrubber further includes the first staying space(115) having the first predetermined fan, connected with the inlet pipe, the second staying space(120) having the second predetermined fan, connected with the outlet pipe, filtering parts(150,155) located at each sidewall of the first and second staying space, and a motor for driving the fans.

Abstract translation: 目的：提供气体洗涤器以能够有效地过滤有害气体，并通过增加出口管和入口管之间的压力差来减少气泵的负载。 构成：气体洗涤器设置有用于过滤有害气体的树脂过滤器（145），罐（100），位于罐一侧的入口管用作有害气体的入口路径，以及出口 位于罐的另一侧的管，用作过滤气体的出口路径。 气体洗涤器还包括具有与入口管连接的第一预定风扇的第一停留空间（115），具有第二预定风扇的第二停留空间（120）与出口管连接，过滤部分（150,155）位于 第一和第二停留空间的每个侧壁，以及用于驱动风扇的电动机。

公开(公告)号：KR1020070024978A

公开(公告)日：2007-03-08

申请号：KR1020050080668

申请日：2005-08-31

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/3065 ,  H01L21/02

CPC classification number: H01J37/32651 ,  H01J37/3211 ,  H01L21/67069

Abstract: A plasma etching chamber is provided to avoid difficulty in designing a plasma etching chamber by forming an RF coil having a type of surrounding the plasma etching chamber so that the RF coil functions as a limitation element in an additionally required construction of an electrical/electronic device. An RF coil(120) is installed between the outer and the inner walls of a plasma etching chamber(110), supplying RF power for generating plasma(124) in the plasma etching chamber. The RF coil can be installed as a spiral type along the inside of the chamber between the outer and the inner walls(130,140) of the plasma etching chamber wherein the inner and the outer walls of the chamber are made of an insulator capable of shielding the RF coil.

Abstract translation: 提供等离子体蚀刻室，以避免通过形成具有围绕等离子体蚀刻室的类型的RF线圈来设计等离子体蚀刻室的困难，使得RF线圈用作额外要求的电气/电子设备结构中的限制元件 。 射频线圈（120）安装在等离子体蚀刻室（110）的外壁和内壁之间，在等离子体蚀刻室中提供产生等离子体（124）的RF功率。 RF线圈可以沿等离子体蚀刻室的外壁和内壁（130,140）之间的室内安装为螺旋型，其中室的内壁和外壁由能够屏蔽 射频线圈。

公开(公告)号：KR1020090012685A

公开(公告)日：2009-02-04

申请号：KR1020070076716

申请日：2007-07-31

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/02

Abstract: An apparatus for an air cylinder and semiconductor device manufacturing equipment used the same are provided to improve the productivity of the wafer processing by controlling the speed of piston in the processing chamber. An air-cylinder apparatus(160) comprises a cylinder, a piston, an air supply portion(165), an air discharge section(166), a main air line(168), a main air valve(170), a sub air line(169) and a sub air valve(171). The air is accommodated the cylinder. The piston linearly moves in the cylinder. The main air valve controls the air flow of the main air line. The sub air line is branched from the main air line and flow the air. The sub air valve controls the speed of the oscillation of piston while controlling the air flow of the sub air line.

Abstract translation: 提供了一种用于气缸的设备和使用其的半导体器件制造设备，以通过控制处理室中的活塞的速度来提高晶片加工的生产率。 气缸装置（160）包括气缸，活塞，供气部分（165），排气部分（166），主空气管路（168），主空气阀（170），副气体 （169）和副空气阀（171）。 空气容纳气缸。 活塞在气缸中线性移动。 主空气阀控制主空气管路的气流。 副空气管线从主空气管线分支并流动空气。 副空气阀控制活塞的振动速度，同时控制副空气管路的气流。

公开(公告)号：KR1020080100951A

公开(公告)日：2008-11-21

申请号：KR1020070047026

申请日：2007-05-15

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/205 ,  H01L21/304 ,  H01L21/02

CPC classification number: B08B7/0035 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/68785

Abstract: The life of the lift cylinder and the production cost can be reduced can be extended by performing the dry clean process that the lift pin is not moved and a electrostatic chuck cathode part is moved up. The dry cleaning method of the semiconductor manufacturing facilities having the multiple lifter is provided. A step(102) is for detecting whether the wafer is transferred to outside from the electrostatic chuck when the dry clean cycle comes. A step(104) is for elevating the electrostatic chuck cathode part when the wafer was transferred from the electrostatic chuck. A step(105) is for progressing the dry clean process using the plasma by the electrostatic chuck cathode part. A step(107) is for dropping the electrostatic chuck cathode part when the dry clean process is completed.

Abstract translation: 可以通过执行提升销不移动的干洗处理和静电吸盘阴极部分向上移动来延长提升缸的寿命和生产成本。 提供具有多重升降器的半导体制造设备的干式清洗方法。 步骤（102）用于在干洗周期到来时检测晶片是否从静电卡盘转移到外部。 当从静电卡盘转移晶片时，步骤（104）用于升高静电吸盘阴极部分。 步骤（105）用于通过静电吸盘阴极部分使用等离子体进行干洗处理。 步骤（107）用于在干式清洁处理完成时使静电吸盘阴极部分落下。

公开(公告)号：KR100437471B1

公开(公告)日：2004-06-23

申请号：KR1020020029491

申请日：2002-05-28

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/304

Abstract: PURPOSE: A gas scrubber is provided to be capable of effectively filtering harmful gas, and reducing the load of a gas pump by increasing the pressure difference between an outlet pipe and an inlet pipe. CONSTITUTION: A gas scrubber is provided with a resin filter(145) for filtering harmful gas, a canister(100), an inlet pipe located at one side of the canister for being used as an inlet path of the harmful gas, and an outlet pipe located at the other side of the canister for being used as an outlet path of filtered gas. The gas scrubber further includes the first staying space(115) having the first predetermined fan, connected with the inlet pipe, the second staying space(120) having the second predetermined fan, connected with the outlet pipe, filtering parts(150,155) located at each sidewall of the first and second staying space, and a motor for driving the fans.

Abstract translation: 目的：提供一种气体洗涤器，其能够有效地过滤有害气体，并通过增加出口管和入口管之间的压差来减小气体泵的负载。 一种气体洗涤器，设有过滤有害气体的树脂过滤器（145），罐体（100），位于罐体一侧的入口管道作为有害气体的入口通道，出口 位于罐的另一侧的管道用作过滤气体的出口路径。 所述气体洗涤器还包括具有与所述入口管连接的所述第一预定风扇的所述第一停留空间（115），具有所述第二预定风扇的所述第二停留空间（120），与所述出口管连接，位于所述出口管的过滤部（150,155） 第一和第二停留空间的每个侧壁以及用于驱动风扇的电动机。

公开(公告)号：KR1020020068606A

公开(公告)日：2002-08-28

申请号：KR1020010008701

申请日：2001-02-21

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/66

Abstract: PURPOSE: An apparatus for testing a surface of a wafer and a testing method using the same are provided to detect an error of the surface of the wafer without loss in a fabrication process. CONSTITUTION: A wafer surface test system checks a surface of a wafer by using a cooling period of a wafer in a cool down chamber. A digital camera and a lighting apparatus are loaded on an upper end portion of the cool down chamber. The digital camera is used for scanning a surface of wafer loaded on a cooling plate of the cool down chamber(S10). Data of the scanned images are transmitted to a microcomputer through an interface. The micro computer analyzes the scanned images of the surface of the wafer by comparing the scanned images with reference data(S20). The data compared and analyzed from the microcomputer are displayed on an equipment monitor(S30).

Abstract translation: 目的：提供用于测试晶片表面的装置和使用其的测试方法，以在制造过程中不损失地检测晶片表面的误差。 构成：晶片表面测试系统通过使用冷却室中的晶片的冷却周期来检查晶片的表面。 数字照相机和照明装置被装载在冷却室的上端部分上。 数码相机用于扫描装在冷却室的冷却板上的晶片的表面（S10）。 扫描图像的数据通过接口发送到微型计算机。 微型计算机通过将扫描图像与参考数据进行比较来分析晶片表面的扫描图像（S20）。 从微型计算机进行比较和分析的数据显示在设备监视器上（S30）。

公开(公告)号：KR100886015B1

公开(公告)日：2009-02-26

申请号：KR1020070047026

申请日：2007-05-15

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/205 ,  H01L21/304 ,  H01L21/02

CPC classification number: B08B7/0035 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/68785

Abstract: 본 발명은 반도체 제조 공정 후 크린공정을 진행할 시 웨이퍼를 업다운시키는 리프트핀을 구동시키지 않고 정전척 캐소드부만 구동시키는 드라이 크린방법에 관한 것이다.
반도체 제조설비에서 드라이 크린 시 리프트핀을 승,하강시키는 공정을 스킵하여 생산성을 향상시킬 수 있는 다중 리프터를 갖는 반도체 제조설비의 드라이 크린방법은, 드라이 크린주기가 되었을 시 공정완료된 웨이퍼가 정전척으로부터 외부로 반송되었는지 검사하는 단계와, 상기 웨이퍼가 정전척으로부터 반송되었을 시 웨이퍼를 상승시키는 리프트핀의 상승을 스킵하고 정전척 캐소드부를 상승시키는 단계와, 상기 정전척 캐소드부를 상승시킨 플라즈마를 형성하여 드라이 크린공정을 진행하는 단계를 포함한다.
플라즈마, 리프트핀, 드라이 크린, 리프트 승하강,

公开(公告)号：KR1020060094237A

公开(公告)日：2006-08-29

申请号：KR1020050015244

申请日：2005-02-24

Applicant: 삼성전자주식회사

Inventor： 윤기덕

IPC: H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: 본 발명은 웨이퍼 이물질 검출장치에 관한 것으로, 본 발명에 따른 웨이퍼 이물질 검출장치는, 웨이퍼의 중심부 일정영역이 놓여지는 웨이퍼 안착부와; 상기 웨이퍼 안착부와 접촉되지 않는 웨이퍼 가장자리 부위의 하부에 근접된 위치에 설치되며, 상기 웨이퍼 하부면의 이물질 부착여부를 검출하기 위한 센서부를 구비함을 특징으로 한다. 본 발명에 따르면 웨이퍼 하부면의 이물질을 검출할 수 있어 이에 따른 웨이퍼 불량을 방지 또는 최소화할 수 있다.
웨이퍼, 얼라인, 이물질, 센서