公开(公告)号：KR1020090041913A

公开(公告)日：2009-04-29

申请号：KR1020070107692

申请日：2007-10-25

Applicant: 삼성전자주식회사

Inventor： 조형철 ,  이영동 ,  진경환 ,  이형구 ,  박종록 ,  최희영

IPC: H01L21/02

Abstract: An air inflow detection device of a vacuum chamber and a method thereof are provided to detect an air inflow in a vacuum chamber although plasma is not generated in a vacuum room. An inflow detection room(210) of an air inflow detection chamber(200) is connected to a vacuum chamber(10). A reference gas and an air generate plasma in the air inflow detection room by a plasma source(300). An optical emission analyzer(250) is installed in one side of the air inflow detection chamber. The optical emission analyzer detects a light intensity having wavelength related to the reference gas and a light intensity having wavelength related to the air among lights generating the plasma. A control part(400) determines an air inflow by using the detected light intensity.

Abstract translation: 提供真空室的空气流入检测装置及其方法，以便在真空室中不产生等离子体来检测真空室中的空气流入。 空气流入检测室（200）的流入检测室（210）与真空室（10）连接。 参考气体和空气通过等离子体源（300）在空气流入检测室中产生等离子体。 光发射分析器（250）安装在空气流入检测室的一侧。 光发射分析仪在产生等离子体的光中检测具有与参考气体相关的波长的光强度和具有与空气相关的波长的光强度。 控制部件（400）通过使用检测到的光强度来确定空气流入。

公开(公告)号：KR1020070115063A

公开(公告)日：2007-12-05

申请号：KR1020060048878

申请日：2006-05-30

Applicant: 삼성전자주식회사

Inventor： 이형구 ,  기기태 ,  김의환 ,  신영일 ,  이광한 ,  전창식 ,  진경환 ,  최병철

IPC: H01L21/68 ,  H01L21/205

CPC classification number: H01L21/68742 ,  C23C16/4586 ,  C23C16/54 ,  H01L21/67017

Abstract: A wafer loading and unloading method of semiconductor device manufacturing equipment is provided to prevent a wafer sliding without auxiliary equipment by performing pumping and purge processes with respect to an inside of a process chamber when a wafer is raised from a susceptor. A wafer is placed in a process chamber. The placed wafer is received on an upper portion of a raised lift pin(120). When the wafer is received on the upper portion of the lift pin, an inside of the process chamber is pumped. After completing the pumping process, the lift pin is dropped to load the wafer on an upper portion of a susceptor(118). Thereafter, the lift pin is raised so that the wafer is raised from the susceptor. When the wafer is raised from the susceptor, purge gas(128) is injected into the process chamber. After completing the purge process using the purge gas, the wafer is transferred back from the process chamber.

Abstract translation: 提供了一种半导体器件制造设备的晶片装载和卸载方法，用于当晶片从基座升起时，通过对处理室的内部执行抽取和清除处理，以防止没有辅助设备的晶片滑动。 将晶片放置在处理室中。 放置的晶片被容纳在升高的升降销（120）的上部。 当晶片被接收在提升销的上部时，处理室的内部被泵送。 在完成泵送过程之后，提升销下落以将晶片装载在基座（118）的上部。 此后，提升销升起，使得晶片从基座升起。 当晶片从基座升起时，吹扫气体（128）被注入到处理室中。 在使用吹扫气体完成吹扫过程之后，晶片从处理室传回。

公开(公告)号：KR1020060086600A

公开(公告)日：2006-08-01

申请号：KR1020050007454

申请日：2005-01-27

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: H01L21/02

CPC classification number: H01L21/6719 ,  H01L21/67034 ,  H01L21/6835

Abstract: 본 발명은 반도체 디바이스 제조를 위한 챔버 구조에 관한 것이다. 본 발명에서는, 챔버 내벽과 이에 인접하고 있는 척 사이의 공간을 보다 넓게 확보하기 위하여, 척과 인접하는 챔버의 내벽에 안쪽으로 오목한 형상의 홈을 형성함을 특징으로 한다. 챔버 내벽과 척 사이의 공간이 넓어짐으로 인해 클리닝 공정가스가 챔버 전체 영역에 대해 원활히 순환되어 챔버 내벽과 척 사이의 공간에 존재하는 잔여물이 말끔히 제거되며, 고온의 척에 의해 유발되는 파티클 다운 문제가 해소된다. 또한, 상기 챔버 내벽과 척 사이의 클리닝 공정이 원활히 진행되어 상기 척 상부에 로딩되는 웨이퍼의 에지영역에 상대적으로 두꺼운 물질막이 형성되는 종래의 문제점 또한 해소된다.

반도체, 챔버, 척, 파티클 다운, 클리닝

公开(公告)号：KR1020040106754A

公开(公告)日：2004-12-18

申请号：KR1020030037590

申请日：2003-06-11

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: G03G15/20

CPC classification number: G03G15/2053

Abstract: PURPOSE: An image forming apparatus is provided to easily assemble a fixing unit into the image forming apparatus and prevent a gear cap from being escaped from the fixing unit. CONSTITUTION: An image forming apparatus includes a fixing unit. The fixing unit includes a fixing part and a press roller. The fixing part includes a fixing roller(45), a gear cap(51) combined with the end of the fixing roller to transfer rotation to the fixing roller, and an elastic member(70) for combining the gear cap with the fixing roller. The press roller presses a recording medium against the fixing roller. The gear cap includes an inserted part(52) inserted into the end of the fixing roller, and a gear part(55) rotated by a driver. The elastic member is located between the outer side of the inserted part of the gear cap and the inner side of the fixing roller to combine the gear cap with the fixing roller.

Abstract translation: 目的：提供一种图像形成装置，用于容易地将定影单元组装到图像形成装置中，并防止齿轮帽从定影单元逸出。 构成：图像形成装置包括定影单元。 定影单元包括固定部和压辊。 固定部分包括定影辊（45），与定影辊的端部组合的齿轮帽（51），以将旋转转移到定影辊;以及弹性构件（70），用于将齿轮盖与定影辊组合。 压辊将记录介质压靠在定影辊上。 齿轮盖包括插入定影辊的端部的插入部分（52）和由驾驶员旋转的齿轮部分（55）。 弹性构件位于齿轮盖的插入部分的外侧和定影辊的内侧之间，以将齿轮盖与定影辊组合。

公开(公告)号：KR1020040057775A

公开(公告)日：2004-07-02

申请号：KR1020020084571

申请日：2002-12-26

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: G03G15/20

Abstract: PURPOSE: A heating roller for a fixing device is provided to secure durability and stability of combination of a gear cap with the body of the heating roller. CONSTITUTION: A heating roller for a fixing device includes a conductive cylindrical roller body(10), a resistant heat-radiator, an end cap, a gear cap(20), and the first and second combining members(30,40). The resistant heat-radiator is included in the roller body. The end cap and gear cap are respectively combined with both sides of the roller body and respectively have electrodes for supplying current to the resistant heat-radiator. The first combining member restricts the gear cap combined with the roller body from being escaped from the roller body in the axial direction of the roller body. The second combining member restricts the gear cap from racing.

Abstract translation: 目的：提供一种用于固定装置的加热辊，以确保齿轮盖与加热辊体的组合的耐久性和稳定性。 构成：用于定影装置的加热辊包括导电圆柱滚子体（10），耐热散热器，端盖，齿轮盖（20）以及第一和第二组合构件（30,40）。 耐热散热器包括在辊体内。 端帽和齿轮帽分别与辊体的两侧结合，并分别具有用于向耐热散热器供电的电极。 第一组合构件限制与辊体结合的齿轮帽在辊主体的轴向方向上从辊体逸出。 第二个组合部件限制了赛车的齿轮帽。

公开(公告)号：KR1020030009626A

公开(公告)日：2003-02-05

申请号：KR1020010044160

申请日：2001-07-23

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: H01L21/68

Abstract: PURPOSE: An apparatus for transferring a wafer carrier is provided to prevent the separation of a wafer from the wafer carrier in a wafer transferring process by installing shock absorbers at both sides of a bearing. CONSTITUTION: A wafer carrier transferring apparatus(20) includes a cassette(21), a cassette guide(22), and a cassette transferring portion. A wafer carrier(30) is loaded on a cassette(21). The cassette guide(22) is used for guiding a movement of the cassette(21). The cassette transferring portion transfers the cassette(21). The wafer carrier(30) is inserted and fixed into an edge portion of a fixing block(29) installed on an upper face of the cassette(21). A bearing(23) is coupled with a lower face of the cassette(21). A cassette guide(22) is installed under the cassette(21). A part of the bearing(23) is projected to a lower face of the cassette guide(22). A plurality of shock absorber(24) are installed at both sides of the lower face of the cassette guide(22). A cylinder(26) is connected with the bearing(23). The shock absorber(24) is fixed to the lower face of the cassette guide(22) by the first coupling block(25). One end portion of the cylinder rod(27) is connected with the second coupling block(28).

Abstract translation: 目的：提供一种用于传送晶片载体的装置，以通过在轴承的两侧安装减震器来防止在晶片传送过程中将晶片与晶片载体分离。 构成：晶片载体传送装置（20）包括盒（21），盒引导件（22）和盒传送部分。 晶片载体（30）装载在盒（21）上。 盒引导件（22）用于引导盒（21）的移动。 盒传送部分传送盒（21）。 晶片载体（30）插入并固定到安装在盒（21）的上表面上的固定块（29）的边缘部分。 轴承（23）与盒（21）的下表面连接。 盒导向件（22）安装在盒（21）的下方。 轴承（23）的一部分突出到盒引导件（22）的下表面。 多个减震器（24）安装在盒引导件（22）的下表面的两侧。 气缸（26）与轴承（23）连接。 减震器（24）通过第一联接块（25）固定到盒引导件（22）的下表面。 气缸杆（27）的一个端部与第二联接块（28）连接。

公开(公告)号：KR1020020088711A

公开(公告)日：2002-11-29

申请号：KR1020010027570

申请日：2001-05-21

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: H01L21/205

Abstract: PURPOSE: An apparatus for fabricating a semiconductor device is provided to prevent contamination of the inside of a head cover due to powders and reduce a time for maintenance by simplifying a coupling/decoupling structure. CONSTITUTION: A susceptor(20) is located at an upper portion of a chamber for performing a deposition process. A back side of a wafer(W) is adhered on a bottom portion of the susceptor(20). An upper face of the wafer(W) faces a bottom portion of the chamber. A heater(22) is fixed by a clamp(24). The heater(22) is used for heating the susceptor(20) and the wafer(W). A quartz guide ring(26) is installed at a side portion of the susceptor(20) in order to prevent alien substances. A main frame(28) is installed at a side portion of the quartz guide ring(26) in order to support the quartz guide ring(26). A projection portion is formed at a lower portion of the main frame(28). A distribution head(30) is installed at a bottom portion of the chamber. A deposition gas line(32) is connected with the distribution head(30). A distribution head cover(34) is installed around the distribution head(30). An exhaust line(36) is installed at a lower portion of the distribution head cover(34).

Abstract translation: 目的：提供一种用于制造半导体器件的装置，以防止由于粉末而导致的头盖内部的污染，并且通过简化耦合/解耦结构来减少维护的时间。 构成：基座（20）位于用于进行沉积工艺的室的上部。 晶片（W）的背面粘附在基座（20）的底部。 晶片（W）的上表面面对腔室的底部。 加热器（22）由夹具（24）固定。 加热器（22）用于加热基座（20）和晶片（W）。 石英引导环（26）安装在基座（20）的侧部，以防止外来物质。 为了支撑石英导向环（26），主框架（28）安装在石英导向环（26）的侧部。 突起部分形成在主框架（28）的下部。 分配头（30）安装在室的底部。 沉积气体管线（32）与分配头（30）连接。 分配头盖（34）安装在分配头（30）周围。 排气管（36）安装在分配头罩（34）的下部。

公开(公告)号：KR100287142B1

公开(公告)日：2001-04-16

申请号：KR1019970068324

申请日：1997-12-12

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: G03G15/06

Abstract: PURPOSE: A developer supplying method of a developer supply device used for a wet-type developing apparatus is provided to require no additional process tank to control the concentration and level of a developer. CONSTITUTION: A developer having a predetermined concentration, which is made by mixing a carrier with an ink is supplied to a circulation tank at a predetermined solution level(S210). The concentration and solution level of the developer contained in the circulation tank are judged(S220,S260). When the concentration is lower than a minimum concentration value or the level is less than a minimum level, the developer is drained to a process tank(S230). A predetermined amount of developer contained in the process tank is supplied to the circulation tank in order to measure the concentration of the solution in the process tank using a concentration sensor of the circulation tank(S240). The carrier, ink or solution in the process tank is provided to the circulation tank to make the developer in the circulation tank be a predetermined concentration and a predetermined solution level(S250).

公开(公告)号：KR100270691B1

公开(公告)日：2000-11-01

申请号：KR1019970074162

申请日：1997-12-26

Applicant: 삼성전자주식회사

Inventor： 이형구

IPC: H04N1/00

Abstract: PURPOSE: A double-sided scanning apparatus is provided to easily scan double-sided printed papers using a single scanning unit and an equipment device. CONSTITUTION: A facsimile(100) having a double-sided scanning apparatus includes a guide stacker(10) into papers(80) are inserted. A feed roller(20) feeds the papers inserted into the guide stacker(10) into the inside of the body. An abrasion pad(21) is installed to contact one side of the feed roller(20). A scanning unit(30) scans the papers feed from the feed roller(20). A U-turn path(35) transfers the papers via the scanning unit(30) upwardly. A discharge roller(40) discharges the papers through the U-turn path(35).

Abstract translation: 目的：提供双面扫描装置，可以使用单个扫描单元和设备装置轻松扫描双面打印纸。 构成：具有双面扫描装置的传真机（100）包括插入纸（80）的引导堆垛机（10）。 进料辊（20）将插入导向堆垛机（10）中的纸进给到机体的内部。 磨擦垫（21）安装成与进料辊（20）的一侧接触。 扫描单元（30）扫描来自进给辊（20）的纸张进给。 U形转弯路径（35）经由扫描单元（30）向上传送纸张。 排出辊（40）通过U形转弯路径（35）排出纸张。

公开(公告)号：KR1020000056594A

公开(公告)日：2000-09-15

申请号：KR1019990006066

申请日：1999-02-24

Applicant: 삼성전자주식회사

Inventor： 이형구 ,  조민수

IPC: B01F7/06

Abstract: PURPOSE: A stirring apparatus is provided, to stir the liquid in a cylindrical tank with the smooth vertical flowability of liquid and the improved stirring efficiency. CONSTITUTION: A stirring apparatus comprises a shaft (20) which is set in length direction at the center of the tank to enable to be rotated; a plurality of propellers (22) which are set radially in the lower part of the shaft (20) and are separated from the inner surface of the tank; a cylindrical rib (24) which is set with the same axis to that of the shaft (20), connects the propellers (22), and forms the inhalation part together with the shaft (20); a baseplate (28) which is almost perpendicular to the propellers (22) and is set along the circumference surface of the rib (24) and whose length (diameter) is shorter than that of the propellers (22); and a drive motor (30) which rotates the shaft (20). The space between the baseplate (28) and the bottom surface of the tank forms the release part, and the fluid which is flown by the propellers (22) is stirred by circulation from the inhalation part to the release part.

Abstract translation: 目的：提供一种搅拌装置，以液体的平滑垂直流动性搅拌液体，并提高搅拌效率。 构成：搅拌装置包括：轴（20），其沿长度方向设置在罐的中心以能够旋转; 多个螺旋桨（22），其径向设置在所述轴（20）的下部并与所述油箱的内表面分离; 与轴（20）的轴线相同的圆柱形肋（24）连接螺旋桨（22），并与轴（20）一起形成吸入部分。 几乎垂直于螺旋桨（22）的基板（28）沿着肋（24）的圆周表面设置，其长度（直径）比螺旋桨（22）的长度短。 以及使所述轴（20）旋转的驱动马达（30）。 基板（28）与槽底面之间的空间形成释放部分，并且由螺旋桨（22）流动的流体通过循环从吸入部分向释放部分进行搅拌。