연마 패드 컨디셔닝 디스크 및 이를 갖는 연마 패드컨디셔너
    2.
    发明公开
    연마 패드 컨디셔닝 디스크 및 이를 갖는 연마 패드컨디셔너 无效
    抛光盘调节盘和抛光垫调节器

    公开(公告)号:KR1020040070492A

    公开(公告)日:2004-08-11

    申请号:KR1020030006544

    申请日:2003-02-03

    Abstract: PURPOSE: A polishing pad conditioning disk and a polishing pad conditioner having the same are provided to remove polishing residues from a surface of a polishing pad and lengthen the lifetime of the polishing pad by using the first conditioning part having diamond particles and the second conditioning part having a brush. CONSTITUTION: A plate(110) is formed with a shape of a disk. The first conditioning part(120) is partially formed on one side of the plate. A plurality of diamond particles are adhered on the first conditioning part in order to dress a surface of a polishing pad by cutting the surface of the polishing pad. The second conditioning part(130) is formed on one side of the plate adjacent to the first condition part. A brush is adhered on the second conditioning part in order to remove polishing residues from the surface of the polishing pad.

    Abstract translation: 目的:提供抛光垫调节盘和具有该抛光垫调节盘的抛光垫调节器以从抛光垫的表面去除抛光残余物并通过使用具有金刚石颗粒的第一调节部分和第二调理部分来延长抛光垫的寿命 有刷子 构成:板(110)形成为盘形。 第一调节部分(120)部分地形成在板的一侧上。 多个金刚石颗粒粘附在第一调理部分上,以便通过切割抛光垫的表面来修整抛光垫的表面。 第二调节部(130)形成在与第一状态部相邻的板的一侧。 刷子附着在第二调理部件上,以从抛光垫的表面去除抛光残余物。

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