公开(公告)号：KR1020110056712A

公开(公告)日：2011-05-31

申请号：KR1020090113153

申请日：2009-11-23

Applicant: 삼성전자주식회사

Inventor： 박명수 ,  김수홍 ,  정화준 ,  조성근

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H02N13/00

Abstract: PURPOSE: An electrostatic chuck is provided to prevent damage to a target and the electrostatic chuck by intercepting the generation of plasma discharge around a fluid path. CONSTITUTION: In an electrostatic chuck, an insulating layer(300) is arranged on the top of a support stand(600) and supports a target(100) to be processed. A space(200) for controlling the temperature of the target is formed between the target and the insulating layer. A first insulating member(700) and a second insulating member(800) are inserted inside the support stand. A fluid path for the cooling gas is formed by the first and second insulating members. The fluid path includes a stepped period of the fluid path.

Abstract translation: 目的：提供静电卡盘，以通过拦截流体路径周围的等离子体放电产生来防止目标物和静电卡盘的损坏。 构成：在静电卡盘中，绝缘层（300）布置在支撑架（600）的顶部，并支撑待加工的靶（100）。 在靶和绝缘层之间形成用于控制靶的温度的空间（200）。 第一绝缘构件（700）和第二绝缘构件（800）插入支撑架内。 用于冷却气体的流体路径由第一和第二绝缘构件形成。 流体路径包括流体路径的阶梯期。

公开(公告)号：KR1020110055837A

公开(公告)日：2011-05-26

申请号：KR1020090112431

申请日：2009-11-20

Applicant: 삼성전자주식회사

Inventor： 김수홍 ,  정화준 ,  박명수 ,  조성근

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H02N13/00

Abstract: PURPOSE: An electrostatic chuck is provided to prevent plasma or a hydrochloric acid gas from reaching an adhesive layer to prevent corrosion of the adhesive layer to lower a defective process rate, thereby increasing productivity. CONSTITUTION: A support stand(40) forms the entire structure of an electrostatic chuck(1). An insulating layer(20) supports an object(10) to be processed. An adhesive layer(30) connects the support stand with the insulating layer. The support stand and the insulating layer form a channel(110) in a direction in which the support stand and the insulating layer face each other. The shape of the channel includes at least one straight unit or at least one curved unit.

Abstract translation: 目的：提供静电卡盘，以防止等离子体或盐酸气体到达粘合剂层，以防止粘合剂层的腐蚀，从而降低加工速度，从而提高生产率。 构成：支撑架（40）形成静电卡盘（1）的整个结构。 绝缘层（20）支撑要处理的物体（10）。 粘合剂层（30）将支撑架与绝缘层连接。 支撑架和绝缘层在支撑架和绝缘层彼此面对的方向上形成通道（110）。 通道的形状包括至少一个直的单元或至少一个弯曲单元。