公开(公告)号：KR1020120069293A

公开(公告)日：2012-06-28

申请号：KR1020100130786

申请日：2010-12-20

Applicant: 제일모직주식회사 ,  삼성전자주식회사

Inventor： 조현용 ,  정민국 ,  정지영 ,  이종화 ,  유용식 ,  이정우 ,  전환승 ,  김수영 ,  김영호 ,  김재현 ,  박수민

IPC: G03F7/039 ,  G03F7/016 ,  H01L21/027

CPC classification number: G03F7/0233 ,  H01L23/293 ,  H01L2924/0002 ,  H01L21/0273 ,  G03F7/0163 ,  G03F7/0166 ,  G03F7/0395 ,  G03F7/0397 ,  H01L21/0274 ,  H01L2924/00

Abstract: PURPOSE: A positive type photo-sensitive resin composition is provided to improve patter shapes by including polybenzoxazole precursors, photo-sensitive diazoquinone compounds, silane compounds, phenol compounds, and a solvent. CONSTITUTION: A positive type photo-sensitive resin composition includes polybenzoxazole precursors, photo-sensitive diazoquinone compounds, silane compounds, phenol compounds, and a solvent. The polybenzoxazole precursors include repeating units represented by chemical formula 1. In chemical formula 1, X1 and X2 are respectively aromatic organic groups or tetravalent to hexavalent aliphatic organic groups; Y1 is an aromatic organic group or a divalent to hexavalent organic group; R1 and R2 are respectively C1 to C6 alkylene groups; and R3 is a C1 to C6 alkyl group.

Abstract translation: 目的：提供正型感光树脂组合物，通过包括聚苯并恶唑前体，光敏重氮醌化合物，硅烷化合物，酚化合物和溶剂来改善图案形状。 构成：正型感光树脂组合物包括聚苯并恶唑前体，光敏重氮醌化合物，硅烷化合物，酚化合物和溶剂。 聚苯并恶唑前体包括由化学式1表示的重复单元。在化学式1中，X 1和X 2分别是芳族有机基团或四价至六价的脂族有机基团; Y1是芳族有机基团或二价至六价有机基团; R1和R2分别为C1〜C6亚烷基; 且R 3为C 1至C 6烷基。

公开(公告)号：KR101423539B1

公开(公告)日：2014-07-25

申请号：KR1020100130786

申请日：2010-12-20

Applicant: 제일모직주식회사 ,  삼성전자주식회사

Inventor： 조현용 ,  정민국 ,  정지영 ,  이종화 ,  유용식 ,  이정우 ,  전환승 ,  김수영 ,  김영호 ,  김재현 ,  박수민

IPC: G03F7/039 ,  G03F7/016 ,  H01L21/027

CPC classification number: G03F7/0233 ,  H01L23/293 ,  H01L2924/0002 ,  H01L2924/00

Abstract: (A) 하기 화학식 1의 반복단위를 포함하는 폴리벤조옥사졸 전구체; (B) 감광성 디아조퀴논 화합물; (C) 실란 화합물; (D) 페놀 화합물; 및 (E) 용매를 포함하는 것인 포지티브형 감광성 수지 조성물이 제공된다.
[화학식 1]

상기 식에서, 각 치환기의 정의는 명세서에 정의된 것과 동일하다.

公开(公告)号：KR1020120066924A

公开(公告)日：2012-06-25

申请号：KR1020100128278

申请日：2010-12-15

Applicant: 삼성전자주식회사

Inventor： 정민국 ,  정지영 ,  조현용 ,  유용식 ,  이정우 ,  이종화 ,  전환승 ,  김수영 ,  김영호 ,  김재현 ,  박수민

IPC: C07C205/35 ,  C07C205/42 ,  G03F7/039 ,  H01L21/027

CPC classification number: C07C205/42 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/0751 ,  G03F7/0755 ,  C07C205/35 ,  G03F7/0395 ,  H01L21/0274

Abstract: PURPOSE: An ortho-nitrobenzyl ester compound is provided to restrain the dissolution of non-exposure part, and to provide a positive type photosensitive resin composition with excellent sensitivity, resolution, pattern formation, and removal of residue. CONSTITUTION: An ortho-nitrobenzyl ester compound comprises a compound in chemical formula 1. In chemical formula 1, R^1 and R^2 is respectively and independently C1-20 aliphatic organic group, or a substituted or unsubstituted cycloaliphatic organic group, R^3 and R^4 is respectively and independently single bond, or substituted or unsubstituted divalent C1-20 aliphatic organic group, and Z^1 and Z^2 is respectively and independently a hydroxy group, an amine group, a carboxy group, or an aldehyde group, n1 and n2 is respectively and independently an integer from 0-5, and n1+n2 is an integer from 1-5.

Abstract translation: 目的：提供邻硝基苄酯化合物以抑制非曝光部分的溶解，并提供具有优异的灵敏度，分辨率，图案形成和残留物去除的正型感光性树脂组合物。 构成：邻硝基苄基酯化合物包括化学式1中的化合物。在化学式1中，R 1和R 2分别为C 1-20脂族有机基团或取代或未取代的脂环族有机基团R 1， 3和R 4分别为单键或取代或未取代的二价C 1-20脂族有机基团，Z 1和Z 2分别独立地为羟基，胺基，羧基或 醛基，n1和n2分别为0-5的整数，n1 + n2为1-5的整数。

公开(公告)号：KR1020120066923A

公开(公告)日：2012-06-25

申请号：KR1020100128277

申请日：2010-12-15

Applicant: 제일모직주식회사 ,  삼성전자주식회사

Inventor： 정지영 ,  정민국 ,  조현용 ,  유용식 ,  이정우 ,  이종화 ,  전환승 ,  김수영 ,  김영호 ,  김재현 ,  박수민

IPC: C07C69/84 ,  G03F7/039 ,  H01L21/02

CPC classification number: G03F7/0226 ,  C07C69/84 ,  G03F7/0233

Abstract: PURPOSE: A positive type photosensitive composition is provided to improve physical properties and reliability of a membrane, and to boating excellent sensitivity, resolution, pattern formation, removal of residue, high elongation, high tensile strength, and low membrane shrinkage. CONSTITUTION: A phenol compound comprises one selected from a group consisting of a compound in chemical formula 1, a compound in chemical formula 2, and combinations thereof. A positive type photosensitive composition comprises 100.0 parts by weight of polybenzoxazole precursor, 5-100 parts by weight of a photosensitive diazoquinone compound, 1-30 parts by weight of a phenol compound, 0.1-30 parts by weight of a silane compound, and 50-300 parts by weight of a solvent. The polybenzoxazole precursor has the weight average molecular weight of 3,000-300,000.

Abstract translation: 目的：提供一种正型感光组合物，以改善膜的物理性能和可靠性，并且具有优异的灵敏度，分辨率，图案形成，残留物的去除，高伸长率，高拉伸强度和低膜收缩率。 构成：酚化合物包括选自化学式1中的化合物，化学式2中的化合物及其组合的一种酚化合物。 正型感光性组合物包含100.0重量份聚苯并恶唑前体，5-100重量份光敏重氮醌化合物，1-30重量份酚化合物，0.1-30重量份硅烷化合物和50 -300重量份溶剂。 聚苯并恶唑前体的重均分子量为3,000-300,000。