公开(公告)号：KR1020100092212A

公开(公告)日：2010-08-20

申请号：KR1020090011489

申请日：2009-02-12

Applicant: 삼성전자주식회사

Inventor： 박상욱 ,  클루브프란시스 ,  김의석 ,  조성휘 ,  이근희 ,  홍상준

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70408 ,  G01B11/02 ,  G03F7/7085

Abstract: PURPOSE: The prism for the holographic exposure apparatus and exposure apparatus including the same improves the space measurement structure between the holographic mask and material. It applies to the prism having the various shape. CONSTITUTION: The holographic mask(50) is combined in the mask combining surface(11). The wire extend of the second incline(13) and the first inclined plane(12) prepares in order to accomplish approximately, figure 45 with the wire extend of the mask combining surface. The beam incident part for the space measurement at least prepares among the first inclined plane and the second incline in one. The beam incident part for the space measurement comprises the entrance face in which the beam for the space measurement for measuring interval between the material(60) is income.

Abstract translation: 目的：全息曝光装置的棱镜和包括其的曝光装置改善了全息掩模和材料之间的空间测量结构。 适用于具有各种形状的棱镜。 构成：全息掩模（50）组合在掩模组合表面（11）中。 准备第二斜面（13）和第一倾斜平面（12）的导线延伸，以便通过掩模组合表面的导线延伸达到图45。 用于空间测量的光束入射部分至少在第一倾斜平面和第二倾斜面之间准备。 用于空间测量的光束入射部分包括入射面，用于用于测量物质（60）之间的间隔的空间测量的光束是入射面。

公开(公告)号：KR1020100099806A

公开(公告)日：2010-09-15

申请号：KR1020090018324

申请日：2009-03-04

Applicant: 삼성전자주식회사

Inventor： 박상욱 ,  클루브프란시스 ,  김의석

IPC: H01L21/027

CPC classification number: G03F7/70408 ,  G03F7/70091 ,  G03F7/70716 ,  G03F7/70775

Abstract: PURPOSE: A holographic exposure apparatus is provided to measure the gap between a holographic mask and a substrate by sequential driving of an optical switch which corresponds to a probe and a multiple probes installed on multiple positions. CONSTITUTION: A mask(70) is installed to a prism(10). A substrate(80) is installed to oppose the mask. A space measurement module comprises a plurality of probes and a plurality of switches. The space measurement module measures interval between the substrate and the mask in the plural locations.

Abstract translation: 目的：提供全息曝光装置，通过顺序驱动对应于探针的光开关和安装在多个位置的多个探针来测量全息掩模和基板之间的间隙。 构成：将面罩（70）安装到棱镜（10）上。 安装基板（80）以与掩模相对。 空间测量模块包括多个探针和多个开关。 空间测量模块测量多个位置的基板和掩模之间的间隔。