씨브이디 공정용 유체의 유동 분배 장치
    1.
    发明公开
    씨브이디 공정용 유체의 유동 분배 장치 无效
    用于CVD的流体流动分布装置

    公开(公告)号:KR1020140056704A

    公开(公告)日:2014-05-12

    申请号:KR1020120121867

    申请日:2012-10-31

    CPC classification number: C23C16/455 C23C16/44

    Abstract: A flow distributing apparatus of fluid for a CVD process is provided. The flow distributing apparatus of fluid for a CVD process according to an embodiment of the present invention includes a chamber having a predetermined space; multiple flow dividing members formed in a multi-layer in the chamber for dividing the flow of the fluid into each layer; and a flow hole formed in each flow dividing member and being increased in number and evenly divided as the number of the layer increases according to the flow of the fluid for uniformly forming the flow of the fluid.

    Abstract translation: 提供了一种用于CVD工艺的流体流量分配装置。 根据本发明的实施例的用于CVD工艺的流体的流量分配装置包括具有预定空间的腔室; 多个分流部件形成在腔室中的多层中,用于将流体流分成每层; 以及形成在每个分流构件中的流动孔,并且数量增加并且随着层数的增加而均匀分配,根据用于均匀地形成流体流动的流体的流动而增加。

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