Abstract:
본 발명의 실시예에 따른 건강 자산 계산 방법 및 장치는 전인적 존재로서의 건강 자산으로서, 개인 또는 집단인의 건강을 향상시키기 위한 노력과 건강 향상을 위한 개인 또는 집단의 의지가 수치화된 데이터인 건강 자산 정보를 제공할 수 있다. 실시예에 따른 건강 자산 계산 방법은 사용자의 사용자 장치에 건강 상태에 관한 제1 설문을 제공하고, 상기 사용자 장치로부터 상기 제1 설문에 대한 답변을 수신하여 건강 상태 정보를 수집하는 단계; 상기 사용자 장치에 건강 가치 비율에 관한 제2 설문을 제공하고, 상기 사용자 장치로부터 상기 제2 설문에 대한 답변을 수신하여 건강 가치 비율 정보를 수집하는 단계; 상기 사용자의 연간 소득 정보를 수신하는 단계; 및 상기 건강 상태 정보, 상기 건강 가치 비율 정보 및 상기 연간 소득 정보에 기초하여 상기 사용자의 건강 자산 정보를 계산하는 단계를 포함한다.
Abstract:
PURPOSE: A capping composition for post CU CMP(chemical mechanical polishing) is provided to form a capping layer at room temperature without separate temperature increase. CONSTITUTION: A capping composition for post CU CMP(chemical mechanical polishing) comprises 0.01-1 M of cobalt compound, 0.02-2 M of complexing agent, and 0.01-0.11 M of at least two kinds of reducing agents. A method for preparing copper wires comprises the steps of: performing chemical mechanical polishing of the copper surface in a copper wiring process; capping the chemical mechanical polished copper surface using the capping composition; and washing the copper surface with a washing solution.
Abstract:
PURPOSE: An environment-friendly bean-curd adhesive, a floor using thereof, and a manufacturing method of the floor are provided to improve the adhesive force, and to reduce the formaldehyde diffusion amount. CONSTITUTION: An environment-friendly bean-curd adhesive for adhering wood materials, contains bean-curd hydrolysate and a phenol-resolsinol resin. The bean-curd hydrolysate is bean-curd modified with sulfuric acid and caustic sodium carbonate. The bean-curd hydrolysate and the phenol-resolsinol resin are mixed with a weight ratio of 70:30~90:10.
Abstract:
Disclosed is a healthcare application driving method comprises the steps of: providing questionnaire data, including at least one prestored medical examination, according to a preset method; receiving answer data corresponding to the questionnaire data; analyzing the user's current state by using the answer data and a prestored algorithm, and providing the user's current state; constructing and providing a plurality of estimated scenarios corresponding to the user's current state; providing a planning setup interface on at least one between the amount of exercise and the living habits of the user; and receiving a target amount on at least one between the amount of exercise and the living habits, and determining and displaying the appropriateness of the target amount based on the inputted target amount and the user's current state. [Reference numerals] (AA) Start;(BB) End;(S201) Provide questionnaire data;(S203) Receive answer data;(S205) Analyze and provide the user's current state;(S207) Construct and provide a plurality of estimated scenarios;(S209) Provide a target amount setup interface;(S211) Display the appropriateness of the target amount
Abstract:
PURPOSE: A slurry composition is provided to have excellent dispersion stability and polishing ratio in chemical mechanical polishing process, especially in copper CMP, and to improve polishing rate, polishing selectivity ratio, etc. CONSTITUTION: A slurry composition comprises: abrasive selected from a group consisting of ceria, alumina, silica, titania and zirconia and of which solid content is 0.5-10 weight%; a complexing agent having a carboxy group and amino group at the same time, and a corrosion inhibitor comprising an azole group. The complexing agent comprises one or more selected from serine, arginine, glutamine, and salts thereof and has a pH of 6-8. The corrosion inhibitor comprises 5-aminotetrazole or benzotriazoles.
Abstract:
PURPOSE: A cleaning solution for cleaning process after copper chemical mechanical polishing is provided to improve manufacture yield of semiconductor device and removal strength. CONSTITUTION: A cleaning solution for cleaning process after copper chemical mechanical polishing comprises ethylenediaminetetraacetate, 5-aminotetrazole, and a pH adjusting agent consisting of a basic compound. The concentration of the ethylenediaminetetraacetate is 0.006-0.3 M. The concentration of 5- aminotetrazole is 0.001-0.15 M. The basic compound is one or more selected from potassium hydroxide, tetramethylammonium hydroxide, and sodium hydroxide. The washing solution additionally includes one or more components selected from tetramethylammonium hydroxide, RE610, and alcohol ether sulfate.