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公开(公告)号：KR1020100108732A
公开(公告)日：2010-10-08
申请号：KR1020090026894
申请日：2009-03-30
Applicant: 서울대학교산학협력단 , 고려대학교 산학협력단
Abstract: PURPOSE: A thin film for detecting gas, a gas sensor including the same, and a method for manufacturing a gas sensor and a thin film for detecting gas are provided to manufacture a porous crystalline tin oxide thin film having improved reaction with certain gas, since a thin tin film is anodized and heat-treated. CONSTITUTION: A method for forming a thin film for detecting gas comprises following steps. A thin tin film is formed on a substrate. A thin tin film is anodized, so that a porous amorphous tin oxide film may be formed. The porous amorphous tin oxide film is heat-treated, so that the porous crystalline tin oxide thin film may be formed.
Abstract translation: 目的：提供一种用于检测气体的薄膜，包括该薄膜的气体传感器，以及用于制造气体传感器和用于检测气体的薄膜的方法，以制造具有改善与某些气体的反应的多孔结晶氧化锡薄膜，因为 对薄锡膜进行阳极氧化和热处理。 构成：形成用于检测气体的薄膜的方法包括以下步骤。 在基板上形成薄锡膜。 阳极氧化薄锡膜，从而可以形成多孔非晶氧化锡膜。 多孔非晶态氧化锡膜进行热处理，可以形成多孔结晶氧化锡薄膜。
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公开(公告)号：KR101350361B1
公开(公告)日：2014-01-14
申请号：KR1020110123736
申请日：2011-11-24
Applicant: 서울대학교산학협력단
IPC: H01M4/139 , H01M4/38 , H01M4/587 , H01M10/052
Abstract: 일 실시 예에 따르는 전극활물질의 제조방법에 있어서, 먼저, 집전체 상에 주석을 포함하는 금속층을 전착(electrodeposition)한다. 상기 금속층에 탄소를 전착한다. 이때, 상기 주석을 포함하는 금속층을 전착하는 과정과 상기 금속층에 탄소를 전착하는 과정은 순차적으로 진행한다.
Abstract translation: 目的：提供电极活性材料的制造方法以控制形成在金属层上的碳层，具有均匀的分布，并且控制沉积在金属层上的碳的量。 构成：电极活性物质的制造方法包括：在集电体（110）上电沉积含锡材料层的工序; 以及在所述金属层（120）上电沉积碳的步骤。 第一步包括形成具有多孔结构的锡金属层的步骤以及另外注入铁，镍，铜和钴中的至少一种的步骤。 （附图标记）（110）在集电体上电镀金属层; （120）金属层上的电镀碳; （AA）开始; （BB）结束
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公开(公告)号：KR1020130057804A
公开(公告)日：2013-06-03
申请号：KR1020110123736
申请日：2011-11-24
Applicant: 서울대학교산학협력단
IPC: H01M4/139 , H01M4/38 , H01M4/587 , H01M10/052
CPC classification number: H01M4/1395 , H01M4/1393 , H01M4/387 , H01M4/587 , H01M10/0525 , Y02E60/122
Abstract: PURPOSE: A manufacturing method of an electrode active material is provided to control a carbon layer formed on a metal layer, to have a uniform distribution, and to control the amount of carbon deposited on the metal layer. CONSTITUTION: A manufacturing method of an electrode active material comprises: a step of electrodepositing a tin-containing material layer on a current collector(110); and a step of electrodepositing carbon on the metal layer(120). The first step includes a step of forming a tin metal layer with a porous structure and a step of additionally injecting at least one of iron, nickel, copper, and cobalt. [Reference numerals] (110) Electroplate a metal layer on a current collector; (120) Electroplate carbon on the metal layer; (AA) Start; (BB) End
Abstract translation: 目的：提供电极活性材料的制造方法以控制形成在金属层上的碳层，具有均匀的分布，并且控制沉积在金属层上的碳的量。 构成：电极活性物质的制造方法包括：在集电体（110）上电沉积含锡材料层的工序; 以及在所述金属层（120）上电沉积碳的步骤。 第一步包括形成具有多孔结构的锡金属层的步骤以及另外注入铁，镍，铜和钴中的至少一种的步骤。 （附图标记）（110）在集电体上电镀金属层; （120）金属层上的电镀碳; （AA）开始; （BB）结束
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