公开(公告)号：KR100686318B1

公开(公告)日：2007-02-26

申请号：KR1020050096395

申请日：2005-10-13

Applicant: 성균관대학교산학협력단

Inventor： 한전건 ,  명현식

IPC: B05C1/08 ,  B82Y30/00

Abstract: An apparatus for coating a nanostructure of conductive carbon is provided to produce a coating in which the hardness and the electrical resistivity are controlled to a predetermined value and the residual stress is reduced more than 50%. The apparatus for coating a nanostructure of conductive carbon includes a vacuum chamber(110), a material to be coated, a power supply(190), a first and second magnetron source(160,170) equipped with a first and second target(140,150) which contains a target material for synthesizing a conductive nano-structural carbon layer on the material to be coated, respectively and a power control part(200). The power control part(200) controls the power supply(190) to supply the first and second target(140,150) with direct current bias voltage(-) so that the target material can be sputtered. The sputtered target material is synthesized on the material to be coated which is rotated by the rotatable zig(180) to form a conductive nano-structural carbon layer.

Abstract translation: 提供一种用于涂覆导电碳的纳米结构的设备以产生其中硬度和电阻率被控制到预定值并且残余应力被降低超过50％的涂层。 用于涂覆导电碳纳米结构的设备包括真空室（110），待涂覆材料，电源（190），配备有第一和第二靶（140,150）的第一和第二磁控管源（160,170），其中 包含分别在待涂覆材料上合成导电纳米结构碳层的目标材料和功率控制部件（200）。 功率控制部分（200）控制电源（190）向第一和第二目标（140,150）供应直流偏压（ - ），使得目标材料能够被溅射。 溅射靶材合成在被旋转Zig（180）旋转的待涂覆材料上以形成导电纳米结构碳层。