公开(公告)号：KR100592823B1

公开(公告)日：2006-06-23

申请号：KR1020030092191

申请日：2003-12-16

Applicant: 에이에스엠엘 네델란즈 비.브이.

Inventor： 레바시에르레온마르틴 ,  덴보에프아리에,예프레이 ,  디른스토르페르인고 ,  예우닌크안드레베르나르두스 ,  크뤼요스비요크슈테판게르테 ,  펠레만스헨리쿠스페트루스마리아 ,  세티야이르반다니 ,  톨스마호이테피에터데오도르

IPC: G03F7/20

CPC classification number: G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

Abstract: 본 발명에 따른 리소그래피장치는, 기판테이블(WT)상의 기판(W)을 패터닝수단(MA)에 대하여 정렬하는 정렬 서브시스템(21)을 포함한다. 정렬구조체(10)는 정렬 서브시스템(21)내의 기준회절격자(26)를 이용하여 캡처위치 또는 체크위치로서 검출될 수 있는 비주기적 피처(15)를 포함한다. 비주기적피처(15)는 정렬 서브시스템(21)의 검출된 신호의 위상효과 또는 진폭효과를 유발할 수 있다.

公开(公告)号：KR1020040055638A

公开(公告)日：2004-06-26

申请号：KR1020030092191

申请日：2003-12-16

Applicant: 에이에스엠엘 네델란즈 비.브이.

Inventor： 레바시에르레온마르틴 ,  덴보에프아리에,예프레이 ,  디른스토르페르인고 ,  예우닌크안드레베르나르두스 ,  크뤼요스비요크슈테판게르테 ,  펠레만스헨리쿠스페트루스마리아 ,  세티야이르반다니 ,  톨스마호이테피에터데오도르

IPC: G03F7/20

CPC classification number: G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

Abstract: PURPOSE: Provided are a lithography apparatus comprising an alignment subsystem, a method for preparing a device and an alignment structure to improve the capture range of a periodic alignment system and robustness. CONSTITUTION: The lithography apparatus comprises a supporting structure which supports the patterning means patterning the projected beam of radiation according to a desired pattern; a substrate table which holds a substrate(W) provided with an alignment structure having spatially periodic optical properties; and an alignment subsystem(21) which aligns the substrate to the pattern means, wherein the alignment subsystem(21) comprises an optical device(20, 24, 26) which optically treats the light reflected from the alignment structure or transmitted by the alignment structure to produce a measuring light whose intensity is changed according to the reference position defined to the patterning means and the relative position of the spatially periodic alignment structure; a sensor which is connected with an optical interference device for measuring the intensity of measuring light and/or the information of phase; and an actuator(PW) which controls the relative position of the patterning means and the substrate table based on the intensity of measuring light and/or the information of phase. The alignment subsystem is aligned so as to use an aperiodic pitcher provided on the alignment structure detectable as a capture position or a check position.

Abstract translation: 目的：提供一种光刻设备，其包括对准子系统，用于制备器件的方法和对准结构，以改善周期性对准系统的捕获范围和鲁棒性。 构成：光刻设备包括支撑结构，其支撑图案化装置以根据期望的图案图案化投射的辐射束; 保持具有空间周期性光学特性的取向结构的基板（W）的基板台; 以及对准子系统（21），其将衬底对准图案装置，其中对准子系统（21）包括光学装置（20,24,26），其光学地对待由对准结构反射或由对准结构传播的光 以产生其强度根据与图案形成装置限定的基准位置和空间周期性取向结构的相对位置而改变的测量光; 与用于测量测量光的强度和/或相位信息的光学干涉装置连接的传感器; 以及基于测量光的强度和/或相位信息来控制图案形成装置和衬底台的相对位置的致动器（PW）。 对准子系统被对准以便使用提供在对准结构上的非周期性的投手，其被检测为捕获位置或检查位置。