CIGS 광흡수층 제조 방법
    2.
    发明公开
    CIGS 광흡수층 제조 방법 有权
    CIGS光吸收层的制造方法

    公开(公告)号:KR1020140047762A

    公开(公告)日:2014-04-23

    申请号:KR1020120113536

    申请日:2012-10-12

    Abstract: The present invention relates to a method of manufacturing a CIGS light absorbing layer. According to one embodiment of the present invention, the method of manufacturing a CIGS light absorbing layer includes a step of forming a CIGS thin film; a selenization step; and a thermal treatment step. According to one embodiment of the present invention, the CIGS thin film is formed on a substrate by using a selenium precursor solution. [Reference numerals] (AA) Start; (BB) End; (S10) Forming a CIGS thin film on a substrate in a solution method; (S20) Selenizing the CIGS thin film in the solution method; (S30) Thermal treatment in a nitrogen atmosphere chamber

    Abstract translation: 本发明涉及一种制造CIGS光吸收层的方法。 根据本发明的一个实施例,制造CIGS光吸收层的方法包括形成CIGS薄膜的步骤; 硒化步骤 和热处理步骤。 根据本发明的一个实施方案,通过使用硒前体溶液在基底上形成CIGS薄膜。 (附图标记)(AA)开始; (BB)结束; (S10)溶液法在基板上形成CIGS薄膜; (S20)溶液法对CIGS薄膜进行硒化处理; (S30)氮气氛下的热处理

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