公开(公告)号：KR100900496B1

公开(公告)日：2009-06-03

申请号：KR1020080098952

申请日：2008-10-09

Applicant: 충남대학교산학협력단

Inventor： 김동표 ,  홍난영 ,  박성준

IPC: H01L21/027 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B82Y40/00

Abstract: A highly durable silica hard mold for nano imprint lithography and a manufacturing method thereof are provided to perform demolding of the mold with high intensity and Young's modulus by hydrating inorganic polymer with ammonia steam. A thin film is formed by spin-coating polyvinylsilazane in a wafer(S100). A PDMS mold is pressed and stacked by facing a fine pattern of the PMS mold to the polyvinylsilazane thin film. The polyvinylsilazane thin film is cured by irradiating an ultraviolet ray in the upper part of the PDMS mold(S200). After the PDMS mold is removed, the polyvinylsilazane thin film is heated and cured(S300). A silica hard mold is made by performing hydration with the ammonia steam(S400).

Abstract translation: 提供用于纳米压印光刻的高度耐用的二氧化硅硬质模具及其制造方法，以通过用氨蒸汽水合无机聚合物来实现具有高强度和杨氏模量的模具的脱模。 通过在晶片中旋涂聚乙烯基硅氮烷来形成薄膜（S100）。 通过将PMS模具的精细图案面向聚乙烯基硅氮烷薄膜来压制和堆叠PDMS模具。 通过在PDMS模具的上部照射紫外线来固化聚硅氧烷薄膜（S200）。 在除去PDMS模具之后，将聚乙烯基硅氮烷薄膜加热固化（S300）。 通过与氨蒸汽进行水合（S400）制备二氧化硅硬质模具。