광전자재료 및 응용소자, 및 광전자재료의 제조방법
    1.
    发明公开
    광전자재료 및 응용소자, 및 광전자재료의 제조방법 失效
    光电材料及其应用的元件及制造光电材料的方法

    公开(公告)号:KR1020010088335A

    公开(公告)日:2001-09-26

    申请号:KR1020010007675

    申请日:2001-02-16

    CPC classification number: H01L31/0284 H01L31/09 H01L33/346

    Abstract: PURPOSE: To provide an optoelectronic material, for an applied element and a method for manufacturing the optoelectronic material, which has no deteriorations, etc., of emission characteristics in the atmosphere to obtain stable characteristics. CONSTITUTION: This optoelectronic material is composed of a porous silicon 12, and the surface of the porous silicon 12 is nitrided to form a silicon nitride film 13. Thus a stable light emission can be obtained, without having to oxidize the surface of the porous silicon 12.

    Abstract translation: 目的:提供一种光电子材料,用于制造光电子材料的应用元件和方法,该光电材料在大气中不发生特性的劣化等,以获得稳定的特性。 构成:该光电子材料由多孔硅12构成,并且多孔硅12的表面被氮化以形成氮化硅膜13.因此,可以获得稳定的发光,而不必氧化多孔硅的表面 12。

    광전자재료 및 광전자재료의 제조방법
    2.
    发明授权
    광전자재료 및 광전자재료의 제조방법 失效
    광전자재료및광전자재료의제조방법

    公开(公告)号:KR100448417B1

    公开(公告)日:2004-09-14

    申请号:KR1020040028084

    申请日:2004-04-23

    CPC classification number: H01L31/0284 H01L31/09 H01L33/346

    Abstract: An optoelectronic material, device applications, and methods for manufacturing the optoelectronic material are provided to make it possible to obtain stable characteristics without deterioration of luminescence over time in the atmosphere. The optoelectronic material is composed of a porous silicon the surface of which is nitrided to form a silicon nitride layer thereon. This allows a stable electroluminescence to be obtained, without oxidation of the surface of the porous silicon.

    Abstract translation: 提供光电子材料,器件应用和用于制造光电子材料的方法以使得可以获得稳定的特性,而不会在大气中随着时间的发光劣化。 光电子材料由多孔硅构成,多孔硅的表面被氮化以在其上形成氮化硅层。 这使得可以获得稳定的电致发光,而不会氧化多孔硅的表面。

    광전자재료 및 광전자재료의 제조방법
    4.
    发明公开
    광전자재료 및 광전자재료의 제조방법 失效
    用于制造光电材料的光电材料和方法,涉及获得稳定的发光,因此多孔Si的表面不能被氧化

    公开(公告)号:KR1020040043147A

    公开(公告)日:2004-05-22

    申请号:KR1020040028084

    申请日:2004-04-23

    CPC classification number: H01L31/0284 H01L31/09 H01L33/346

    Abstract: PURPOSE: An optoelectronic material and a method for manufacturing an optoelectronic material is provided to obtain an optoelectronic material which emits at a constant illumination level without being oxidized in air. CONSTITUTION: A target material(107) is arranged in a reaction chamber(101). An accumulation substrate(109) is arranged inside of the reaction chamber. A laser light is irradiated on the target material in order to cause an ejection of the target material. Microparticles resulted from condensing the ejected material in air atmosphere are collected on the accumulating substrate in order to obtain an optoelectric material. In an ablation operation where the target material is ejected by illuminating the laser light, a nitride atmosphere gas is introduced at a constant pressure, and at least a surface of a whole portion of the microparticles is nitride-treated.

    Abstract translation: 目的:提供光电子材料和制造光电子材料的方法,以获得以恒定的照明水平发射而不在空气中被氧化的光电子材料。 构成:在反应室(101)中配置目标材料(107)。 积聚基板(109)布置在反应室内部。 激光照射在目标材料上以引起目标材料的喷射。 在空气气氛中将喷射材料冷凝而产生的微粒被收集在积聚基板上,以获得光电材料。 在通过照射激光来喷射目标材料的消融操作中,以恒定的压力引入氮化物气氛气体,并且至少将微粒的整个部分的表面进行氮化物处理。

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