公开(公告)号：KR100467805B1

公开(公告)日：2005-01-24

申请号：KR1020020003544

申请日：2002-01-22

Applicant: 학교법인연세대학교

Inventor： 정광호

IPC: C23C14/24

CPC classification number: C23C14/243

Abstract: The present invention relates to an evaporator for manufacturing a thin film, and more particularly to a linear or planar type evaporator for evaporating and depositing a source material on a substrate located over the evaporator by using a slit with a certain pattern, comprising a crucible formed of an elongate barrel longitudinally extending to a predetermined distance to contain the material to be deposited therein; and a slit formed on the top surface of the crucible in the longitudinal direction of the crucible and having an area smaller than the sectional area of the crucible or a slit separately installed, thereby performing the deposition of a thin film by moving a substrate in a direction perpendicular to the longitudinal direction of the crucible. Therefore, the deposited thin film has improved uniformity of film thickness profile and a desired pattern.

Abstract translation: 本发明涉及一种用于制造薄膜的蒸发器，更具体地涉及一种用于通过使用具有特定图案的狭缝在位于蒸发器上方的基板上蒸发和沉积源材料的线性或平面型蒸发器，其包括形成的坩埚 纵向延伸到预定距离的细长筒体，以容纳待沉积在其中的材料; 以及在坩埚的长度方向上在坩埚的上表面上形成的狭缝，其具有比单独安装的坩埚或狭缝的截面积小的面积，从而通过在基板上移动基板来执行沉积薄膜 垂直于坩埚纵向的方向。 因此，沉积的薄膜具有改进的膜厚度分布的均匀性和期望的图案。

公开(公告)号：KR100448349B1

公开(公告)日：2004-09-10

申请号：KR1020010061927

申请日：2001-10-08

Applicant: 학교법인연세대학교

Inventor： 정광호 ,  김신철

IPC: H05B33/10

Abstract: PURPOSE: A method for manufacturing a substrate structure having an inserted electrode for a flat display is provided to maintain a flat surface even when the thickness of the electrode increases, adjust protruded degree of the electrode, reduce voltage drop due to electrode lines, and increase forward luminescence. CONSTITUTION: A substrate structure for a flat display is manufactured by inserting an electrode into the substrate. At a first step(S1), the substrate is cleaned. At a second step(S2), photoresist is applied on the substrate. At a third step(S3), a mask of a pattern is disposed on the photoresist. At a fourth step(S4), the masked surface is exposed and developed. At a fifth step(S5), unnecessary photoresist is removed. At a sixth step(S6), the area of the substrate corresponding to the electrode is etched for inserting the electrodes. At a seventh step(S7), the electrode is formed at the etched area of the substrate. At an eighth step(S8), remaining photoresist is removed. An insulating film is formed between the first step(S1) and the second step(S2).

Abstract translation: 目的：提供一种用于制造具有用于平板显示器的插入电极的基板结构的方法，以即使当电极的厚度增加时也保持平坦表面，调节电极的突出程度，降低由于电极线引起的电压降并增加 正向发光。 构成：用于平面显示器的基板结构是通过将电极插入基板而制造的。 在第一步骤（S1）中，清洁衬底。 在第二步骤（S2）中，将光致抗蚀剂施加在基板上。 在第三步骤（S3）中，图案的掩模设置在光致抗蚀剂上。 在第四步骤（S4）中，掩模表面被曝光并显影。 在第五步骤（S5）中，去除不必要的光致抗蚀剂。 在第六步骤（S6）中，蚀刻对应于电极的基板的区域以插入电极。 在第七步骤（S7）中，电极形成在基板的蚀刻区域处。 在第八步骤（S8）中，去除剩余的光致抗蚀剂。 在第一步骤（S1）和第二步骤（S2）之间形成绝缘膜。

公开(公告)号：KR1020030063015A

公开(公告)日：2003-07-28

申请号：KR1020020003544

申请日：2002-01-22

Applicant: 학교법인연세대학교

Inventor： 정광호

IPC: C23C14/24

CPC classification number: C23C14/243

Abstract: PURPOSE: A linear or planar evaporation source capable of controlling thin film thickness distribution is provided to improve uniformity of thickness distribution of thin film deposited or enable the thin film to be controlled in desired patterns by using slits having specific patterns. CONSTITUTION: The linear or planar evaporation source comprises a crucible(10) in which a depositing material is contained, and which is longitudinally extended to a certain length so that the crucible is formed in a long cylinder shape; and a slit(20) having a smaller area compared to cross sectional area of the crucible formed along a length direction of the crucible on the upper surface of the crucible, or a separate slit(20) installed thereon so that a thin film is deposited as substrate is being moved perpendicularly to the length direction of the crucible, wherein the slit is formed in such a manner that both ends of the slit are wide while size of the slit is getting narrower as it goes from the both ends of the slit to the center of the slit.

Abstract translation: 目的：提供能够控制薄膜厚度分布的线性或平面蒸发源，以提高沉积薄膜厚度分布的均匀性，或使薄膜通过使用具有特定图案的狭缝而被控制在所需图案中。 构成：线性或平面蒸发源包括坩埚（10），其中容纳沉积材料，并且其纵向延伸到一定长度，使得坩埚形成为长圆筒形状; 以及与坩埚的上表面上的坩埚的长度方向形成的坩埚的横截面积相比，具有较小的面积的狭缝（20），或者设置在其上的单独的狭缝（20），从而沉积薄膜 当基板正在垂直于坩埚的长度方向移动时，其中狭缝形成为使得狭缝的两端宽，同时狭缝的尺寸随着狭缝的两端变窄而变窄 狭缝的中心。

公开(公告)号：KR1020020028805A

公开(公告)日：2002-04-17

申请号：KR1020010061927

申请日：2001-10-08

Applicant: 학교법인연세대학교

Inventor： 정광호 ,  김신철

IPC: H05B33/10

CPC classification number: H01L51/0017 ,  H01L51/0021

Abstract: PURPOSE: A method for manufacturing a substrate structure having an inserted electrode for a flat display is provided to maintain a flat surface even when the thickness of the electrode increases, adjust protruded degree of the electrode, reduce voltage drop due to electrode lines, and increase forward luminescence. CONSTITUTION: A substrate structure for a flat display is manufactured by inserting an electrode into the substrate. At a first step(S1), the substrate is cleaned. At a second step(S2), photoresist is applied on the substrate. At a third step(S3), a mask of a pattern is disposed on the photoresist. At a fourth step(S4), the masked surface is exposed and developed. At a fifth step(S5), unnecessary photoresist is removed. At a sixth step(S6), the area of the substrate corresponding to the electrode is etched for inserting the electrodes. At a seventh step(S7), the electrode is formed at the etched area of the substrate. At an eighth step(S8), remaining photoresist is removed. An insulating film is formed between the first step(S1) and the second step(S2).

Abstract translation: 目的：提供一种用于制造具有用于平面显示器的插入电极的基板结构的方法，以便即使当电极的厚度增加时也保持平坦表面，调节电极的突出度，减少由于电极线引起的电压降，并且增加 正向发光。 构成：通过将电极插入基板来制造用于平板显示器的基板结构。 在第一步骤（S1）中，清洁基底。 在第二步骤（S2）中，将光刻胶施加在基板上。 在第三步骤（S3）中，在光致抗蚀剂上设置图案的掩模。 在第四步骤（S4）中，将掩蔽的表面曝光和显影。 在第五步骤（S5）中，除去不需要的光致抗蚀剂。 在第六步骤（S6）中，蚀刻与电极相对应的衬底的面积以插入电极。 在第七步（S7）中，电极形成在基板的蚀刻区域。 在第八步骤（S8）中，除去剩余的光致抗蚀剂。 在第一步骤（S1）和第二步骤（S2）之间形成绝缘膜。