公开(公告)号：KR1020000074993A

公开(公告)日：2000-12-15

申请号：KR1019990019288

申请日：1999-05-27

Applicant: 학교법인연세대학교

Inventor： 황정남 ,  조성진 ,  김기원

IPC: H01L21/20

Abstract: PURPOSE: A surface deposition system is provided to uniformly deposit a thin film on a large surface by using a physical deposition method such as a molecular beam epitaxy(MBE) deposition method or ionized cluster beam deposition(ICBD) method. CONSTITUTION: A surface deposition system comprises the first and second axes, the first and second driving units(175,185), a moving unit, a source and a second-dimensional substrate. The first and second axes form a plane coordinate system, separated from each other. The first and second driving units are capable of performing an operation selected from a direct motion, a reciprocating motion and an oscillatory motion with reference to the first and second axes. The moving unit is capable of moving on an axis selected from the first and second axes. The source emits a depositing material, established in the moving unit. The second-dimensional substrate corresponds to a second-dimensional space formed by the first and second axes, separated a predetermined interval from the source.

Abstract translation: 目的：提供表面沉积系统，通过使用分子束外延（MBE）沉积方法或电离聚束束沉积（ICBD）方法的物理沉积方法在大的表面上均匀地沉积薄膜。 构成：表面沉积系统包括第一和第二轴，第一和第二驱动单元（175,185），移动单元，源和第二维基板。 第一和第二轴形成彼此分离的平面坐标系。 第一和第二驱动单元能够参照第一和第二轴执行从直接运动，往复运动和振荡运动中选择的操作。 移动单元能够在从第一和第二轴线选择的轴上移动。 源发出沉积材料，建立在移动单元中。 第二维基板对应于由第一轴和第二轴形成的第二维空间，与源相隔预定间隔。

公开(公告)号：KR100329207B1

公开(公告)日：2002-03-22

申请号：KR1019990019288

申请日：1999-05-27

Applicant: 학교법인연세대학교

Inventor： 황정남 ,  조성진 ,  김기원

IPC: H01L21/20

Abstract: 본발명은 ICBD 혹은 MBE와같은물리적방법을이용한물질증착방법에있어서, 대면적증착방법및 그시스템에관련된것이다. 본발명은증착물질을담은소스를 2차원을이루는서로직교하는두 개의좌표축상에서임의로이동하면서상기소스와일정거리떨어져설치된기판위에박막을증착하는대면적증착법을제공한다. 따라서, 본발명은증착물질을담은소스와, 상기소스에서분사된증착물질이임의의 2차원공간의모든위치를지적할수 있는좌표계와, 상기좌표축상에서상기소스를이동시킬수있는구동수단을포함하는대면적증착시스템을제공한다.