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公开(公告)号:KR100649091B1
公开(公告)日:2006-11-27
申请号:KR1020050050557
申请日:2005-06-13
Applicant: 한국과학기술연구원
Abstract: A tungsten contained diamond-like carbon film that increases the service life of the target by maintaining the coating reliably in a target coated with a diamond-like carbon film with excellent mechanical properties, a method for manufacturing the tungsten contained diamond-like carbon film, and a dental tool manufactured by the method are provided. A tungsten contained diamond-like carbon film comprises: a thin film type amorphous carbon matrix; and tungsten in the atomic state added to the carbon matrix, wherein the tungsten is added to the carbon matrix up to a range in which a secondary phase of the carbon matrix is not generated. A tungsten contained diamond-like carbon film comprises: a thin film type amorphous carbon matrix; and tungsten in the atomic state added to the carbon matrix, wherein the tungsten is added to the carbon matrix in a range of 2.3 to 3.3 at.%. A method for manufacturing a tungsten contained diamond-like carbon film comprises the steps of: (a) holding a target to a holder within a vacuum chamber of a composite coating equipment; and (b) controlling a content of tungsten sputtered to the target to a range of 2.3 to 3.3 at.% by controlling an Ar fraction while injecting an ion beam toward the target.
Abstract translation: 一种含钨类金刚石碳膜,通过将涂层可靠地保持在涂覆有具有优异机械性能的类金刚石碳膜的靶中而延长了靶的使用寿命,一种制造含钨类金刚石碳膜的方法, 以及通过该方法制造的牙科工具。 含钨类金刚石碳膜包括:薄膜型无定形碳基质; 以及添加到碳基体中的处于原子状态的钨,其中将钨添加到碳基体中直到其中不产生碳基体的次生相的范围。 含钨类金刚石碳膜包括:薄膜型无定形碳基质; 以及添加到碳基体中的处于原子状态的钨,其中钨以2.3-3.3原子%的范围添加到碳基体中。 一种制造含钨类金刚石碳膜的方法,包括以下步骤:(a)将靶固定在复合涂层设备的真空室内的夹具上; (b)通过控制Ar分数,同时将离子束注入靶材,将溅射到靶材上的钨含量控制在2.3-3.3原子%的范围内。