公开(公告)号：KR1020010046843A

公开(公告)日：2001-06-15

申请号：KR1019990050777

申请日：1999-11-16

Applicant: 한국과학기술연구원

Inventor： 이전국 ,  정형진 ,  이시형

IPC: H01L21/8247

Abstract: PURPOSE: A method for manufacturing a multicomponent oxide ferroelectric thin film including a volatile component is provided to control loss of a volatile component generated in forming the multicomponent oxide thin film by using a radio frequency(RF) magnetron sputtering method. CONSTITUTION: A target(15) composed of a multicomponent oxide material is sputtered to form a multicomponent oxide thin film on a substrate by a radio frequency(RF) magnetron sputtering method. A vacuum chamber where the sputtering process is performed is maintained at a pressure from 200 to 300 milli Torr to reduce loss of a volatile component of the thin film during the sputtering process.

Abstract translation: 目的：提供一种制造包含挥发性成分的多组分氧化物铁电薄膜的方法，以通过使用射频（RF）磁控溅射法来控制在形成多组分氧化物薄膜时产生的挥发性成分的损失。 构成：通过射频（RF）磁控溅射法溅射由多组分氧化物材料组成的靶（15），以在衬底上形成多组分氧化物薄膜。 进行溅射处理的真空室保持在200-300毫乇的压力下，以减少溅射过程中薄膜挥发性成分的损失。

公开(公告)号：KR100321561B1

公开(公告)日：2002-01-23

申请号：KR1019990050777

申请日：1999-11-16

Applicant: 한국과학기술연구원

Inventor： 이전국 ,  정형진 ,  이시형

IPC: H01L21/8247

Abstract: 본발명은 RF 마그네트론스퍼터링시스퍼터링이일어나는진공챔버내의압력을 200 내지 300 밀리토르(mTorr)로유지하여휘발성분의손실을감소시킨다성분산화물강유전체박막, 특히비스무트층상산화물로된 강유전체박막의제조방법을제공한다. 본발명은또한스퍼터링시타겟과기판과의거리를 3 내지 5 cm로하고기판을타겟중심선에서벗어나게위치시켜우수한강유전특성을부여하는, RF 마그네트론스퍼터링법을이용한강유전체박막의제조방법을제공한다. 그밖에도본 발명은, 스퍼터링시타겟면에대한기판면의각도를 30°내지 60°로하여우수한강유전특성을부여하는, RF 마그네트론스퍼터링법을이용한강유전체박막의제조방법을제공한다.