公开(公告)号：KR1020020027069A

公开(公告)日：2002-04-13

申请号：KR1020000058403

申请日：2000-10-05

Applicant: 한국과학기술연구원

Inventor： 조영상 ,  김재익 ,  오재춘 ,  정소연

IPC: C02F1/52

Abstract: PURPOSE: Treatment method for chemical mechanical polishing wastewater is provided to remove minute particles of SiO2 suspended in chemical mechanical polishing wastewater by injecting sulfuric acid of 0.001-0.008g/L-wastewater, anion polymer of 0.001-0.008g/L-wastewater, cation polymer of 0.001-0.008g/L-wastewater, and calcium compound of 0.1-1g/L-wastewater as coagulants. Coagulated SiO2 is removed by a membrane. CONSTITUTION: The method comprises the following continuous steps: (a) injecting sulfuric acid to wastewater in a primary mixing tank(110) and mixing thereof; (b) injecting anion polymer in a secondary mixing tank(120) and mixing thereof; (c) injecting calcium compound in a third mixing tank(130) and mixing thereof; (d) injecting cation polymer in a fourth mixing tank(140) and mixing thereof; and (e) mixing thereof in fifth mixing tank(200). Mixing in primary, secondary, and third mixing tanks(110)(120)(130) is operated in the rate of 200-800 rpm for 3-20 minutes, and in the fourth mixing tank(140) is operated in the rate of 200-800 rpm for 3-10 minutes. And mixing in the fifth mixing tank(200) is operated in the rate of 50-100 rpm for 20-60 minutes.

Abstract translation: 目的：提供化学机械抛光废水处理方法，通过注入0.001-0.008g / L废水的硫酸，0.001-0.008g / L废水的阴离子聚合物，阳离子 聚合物为0.001-0.008g / L废水，钙化合物为0.1-1g / L废水为絮凝剂。 通过膜去除凝结的SiO 2。 方法：该方法包括以下连续步骤：（a）向主混合罐（110）中的废水中注入硫酸并混合; （b）将阴离子聚合物注入二次混合罐（120）中并将其混合; （c）在第三混合罐（130）中注入钙化合物并将其混合; （d）在第四混合罐（140）中注入阳离子聚合物并将其混合; 和（e）在第五混合罐（200）中混合。 在一次，二次和第三混合罐（110）（120）（130）中的混合以200-800rpm的速度运行3-20分钟，并且在第四混合罐（140）中以 200-800 rpm，3-10分钟。 并且在第五混合罐（200）中的混合以50-100rpm的速率运行20-60分钟。

公开(公告)号：KR100369513B1

公开(公告)日：2003-01-30

申请号：KR1020000058403

申请日：2000-10-05

Applicant: 한국과학기술연구원

Inventor： 조영상 ,  김재익 ,  오재춘 ,  정소연

IPC: C02F1/52

Abstract: PURPOSE: Treatment method for chemical mechanical polishing wastewater is provided to remove minute particles of SiO2 suspended in chemical mechanical polishing wastewater by injecting sulfuric acid of 0.001-0.008g/L-wastewater, anion polymer of 0.001-0.008g/L-wastewater, cation polymer of 0.001-0.008g/L-wastewater, and calcium compound of 0.1-1g/L-wastewater as coagulants. Coagulated SiO2 is removed by a membrane. CONSTITUTION: The method comprises the following continuous steps: (a) injecting sulfuric acid to wastewater in a primary mixing tank(110) and mixing thereof; (b) injecting anion polymer in a secondary mixing tank(120) and mixing thereof; (c) injecting calcium compound in a third mixing tank(130) and mixing thereof; (d) injecting cation polymer in a fourth mixing tank(140) and mixing thereof; and (e) mixing thereof in fifth mixing tank(200). Mixing in primary, secondary, and third mixing tanks(110)(120)(130) is operated in the rate of 200-800 rpm for 3-20 minutes, and in the fourth mixing tank(140) is operated in the rate of 200-800 rpm for 3-10 minutes. And mixing in the fifth mixing tank(200) is operated in the rate of 50-100 rpm for 20-60 minutes.

Abstract translation: 目的：提供化学机械抛光废水处理方法，通过注入0.001-0.008g / L废水的硫酸，0.001-0.008g / L废水的阴离子聚合物，阳离子 0.001-0.008g / L废水的聚合物和0.1-1g / L废水的钙化合物作为凝结剂。 凝结的SiO2被膜去除。 构成：该方法包括以下连续步骤：（a）将硫酸注入主混合罐（110）中的废水并将其混合; （b）将阴离子聚合物注入第二混合罐（120）中并混合; （c）将钙化合物注入第三混合罐（130）中并混合; （d）将阳离子聚合物注入第四混合罐（140）并混合; 和（e）在第五混合罐（200）中混合。 在第一，第二和第三混合罐（110）（120）（130）中的混合以200-800rpm的速率运行3-20分钟，并且在第四混合罐（140）中以 200-800转3-10分钟。 并且在第五混合罐（200）中混合以50-100rpm的速率操作20-60分钟。

公开(公告)号：KR100362066B1

公开(公告)日：2002-11-23

申请号：KR1020000047155

申请日：2000-08-16

Applicant: 한국과학기술연구원

Inventor： 조영상 ,  김재익 ,  오재춘 ,  정소연

IPC: C02F1/52

Abstract: 본 발명의 화학적 기계적 연마의 폐수 처리 방법은 화학적 기계적 연마의 폐수에 현탁되어 있는 SiO
2 미립자를 제거하기 위하여 칼슘화합물, 양이온 고분자응집제, 알룸, 및 음이온 고분자응집제를 투입하여 폐수와 응집제를 교반하되, 교반 속도 또는 교반 시간을 차별화하는 것이다. 본 발명에 의하면, 크기가 크고 점착도가 낮은 SiO
2 미립자응집체를 형성시킬 수 있으므로, 화학적 기계적 연마의 폐수에 포함되어 있는 SiO
2 미립자를 단층 여과막으로 쉽게 분리할 수 있으며, 여과막을 짧은 시간에 역세척할 수 있다.

公开(公告)号：KR1020020014075A

公开(公告)日：2002-02-25

申请号：KR1020000047155

申请日：2000-08-16

Applicant: 한국과학기술연구원

Inventor： 조영상 ,  김재익 ,  오재춘 ,  정소연

IPC: C02F1/52

Abstract: PURPOSE: A treatment method for chemical mechanical polishing wastewater is provided which easily separates SiO2 particulate contained in wastewater generated in the chemical mechanical polishing process with a single layered filtration membrane and shortly backwashes the filtration membrane by forming a large sized low tackiness particulate aggregation. CONSTITUTION: The treatment method for chemical mechanical polishing wastewater comprises the steps of transferring wastewater generated in the chemical mechanical polishing process to a first rapid mixing tank(110), and agitating the materials by putting a calcium compound into the wastewater transferred to the first rapid mixing tank; transferring the wastewater in the first rapid mixing tank to a second rapid mixing tank(120), and agitating the materials by putting a cationic polymer coagulant into the wastewater transferred to the second rapid mixing tank; transferring the wastewater in the second rapid mixing tank to a third rapid mixing tank(130), and agitating the materials by putting alum into the wastewater transferred to the third rapid mixing tank; transferring the wastewater in the third rapid mixing tank to a fourth rapid mixing tank(140), and agitating the materials by putting an anionic polymer coagulant into the wastewater transferred to the fourth rapid mixing tank; and transferring the wastewater in the fourth rapid mixing tank to a slow mixing tank(200), and agitating the wastewater transferred to the slow mixing tank at a speed slower than an agitation speed in the fourth rapid mixing tank.

Abstract translation: 目的：提供化学机械抛光废水的处理方法，使化学机械抛光过程中产生的废水中的SiO2颗粒与单层过滤膜分离，并通过形成大尺寸低粘性颗粒聚集物短时间反冲洗过滤膜。 构成：化学机械抛光废水的处理方法包括将在化学机械抛光工艺中产生的废水转移到第一快速混合罐（110）的步骤，通过将钙化合物放入转移到第一快速混合罐 混合罐 将第一快速混合罐中的废水转移到第二快速混合罐（120），并通过将阳离子聚合物凝结剂放入转移到第二快速混合罐的废水中来搅拌材料; 将第二快速混合罐中的废水转移到第三快速混合罐（130）中，并通过将明矾放入转移到第三快速混合罐的废水中来搅拌物料; 将第三快速混合罐中的废水转移到第四快速混合罐（140），并通过将阴离子聚合物凝结剂放入转移到第四快速混合罐的废水中来搅拌材料; 并将第四快速混合罐中的废水转移到缓慢混合罐（200）中，并且以比第四快速混合罐中的搅拌速度慢的速度搅拌转移到缓慢混合罐中的废水。