Abstract:
PURPOSE: Treatment method for chemical mechanical polishing wastewater is provided to remove minute particles of SiO2 suspended in chemical mechanical polishing wastewater by injecting sulfuric acid of 0.001-0.008g/L-wastewater, anion polymer of 0.001-0.008g/L-wastewater, cation polymer of 0.001-0.008g/L-wastewater, and calcium compound of 0.1-1g/L-wastewater as coagulants. Coagulated SiO2 is removed by a membrane. CONSTITUTION: The method comprises the following continuous steps: (a) injecting sulfuric acid to wastewater in a primary mixing tank(110) and mixing thereof; (b) injecting anion polymer in a secondary mixing tank(120) and mixing thereof; (c) injecting calcium compound in a third mixing tank(130) and mixing thereof; (d) injecting cation polymer in a fourth mixing tank(140) and mixing thereof; and (e) mixing thereof in fifth mixing tank(200). Mixing in primary, secondary, and third mixing tanks(110)(120)(130) is operated in the rate of 200-800 rpm for 3-20 minutes, and in the fourth mixing tank(140) is operated in the rate of 200-800 rpm for 3-10 minutes. And mixing in the fifth mixing tank(200) is operated in the rate of 50-100 rpm for 20-60 minutes.
Abstract:
The granular fertilizer is prepd. by i) mixing 30˜100 wt.% rosin and 0˜70 wt.% rosin derivative, ii) adding 0˜20 wt.% polymer into the obtd. mixt., and dissolving in the organic solvent to obtain the basic coating material contg. 0.5˜50 wt.% polymer, iii) basic-coating granular fertilizer with 2˜40 wt.% obtd. basic coating material, and iv) protective-coating the basic coated granular fertilizer with 0.2˜30 wt.% organic soln. or emulsified soln. contg. 0.5˜50 wt.% organic solvent.
Abstract:
PURPOSE: A treatment method for chemical mechanical polishing wastewater is provided which easily separates SiO2 particulate contained in wastewater generated in the chemical mechanical polishing process with a single layered filtration membrane and shortly backwashes the filtration membrane by forming a large sized low tackiness particulate aggregation. CONSTITUTION: The treatment method for chemical mechanical polishing wastewater comprises the steps of transferring wastewater generated in the chemical mechanical polishing process to a first rapid mixing tank(110), and agitating the materials by putting a calcium compound into the wastewater transferred to the first rapid mixing tank; transferring the wastewater in the first rapid mixing tank to a second rapid mixing tank(120), and agitating the materials by putting a cationic polymer coagulant into the wastewater transferred to the second rapid mixing tank; transferring the wastewater in the second rapid mixing tank to a third rapid mixing tank(130), and agitating the materials by putting alum into the wastewater transferred to the third rapid mixing tank; transferring the wastewater in the third rapid mixing tank to a fourth rapid mixing tank(140), and agitating the materials by putting an anionic polymer coagulant into the wastewater transferred to the fourth rapid mixing tank; and transferring the wastewater in the fourth rapid mixing tank to a slow mixing tank(200), and agitating the wastewater transferred to the slow mixing tank at a speed slower than an agitation speed in the fourth rapid mixing tank.
Abstract:
The slow released agrochemical is prepared by melting 0.5-50wt.% rosin in an organic solvent to obtain a basic coating solution, coating the granules of agrochemical by spraying it to 2-40wt.% of total weight, recoating them with the second coating solution which is made by melting 0.05-50wt.% organic polymer to an organic solvent.
Abstract:
본 발명은 루이스 산으로 분류되는 화합물, 루이스 산에 전자쌍을 제공할 수 있는 금속 화합물, 전이금속 또는 전이금속 화합물 및 전해질을 필요에 따라 혼합한 촉매 조성물에 관한 것으로 본 발명에 의한 촉매 조성물은 기상유기물을 분해하고 물을 분해하여 수소를 생성시키며, 물과 이산화탄소를 반응시켜 유기물을 합성하는 특성을 갖는다. 기상 유기물 분해, 유기물 합성, 이산화탄소 전환, 물분해, 루이스 산.