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公开(公告)号：KR100635302B1
公开(公告)日：2006-10-19
申请号：KR1020050036993
申请日：2005-05-03
Applicant: 한국과학기술연구원
Abstract: A method of preparing a large sized-nanocrystalline cobalt metal thin film with excellent catalytic activity in mild conditions is provided. A method of preparing a cobalt metal thin film by electrodeposition comprises: immersing a counter electrode and a working electrode into an aqueous solution that has a pH of 4 to 5 and contains a cobalt salt with a concentration of 10 to 500 mM; and impressing a voltage of -0.7 to -1.3 V to both electrodes at a temperature of 0 to 40 deg.C to form a Co metal thin film on the working electrode. The cobalt salt is selected from the group consisting of cobalt nitrate(Co(NO3)2), cobalt acetate(Co(C2H3O2)3), cobalt sulfate(CoSO4) and cobalt chloride(CoCl2). The working electrode and the counter electrode are substrates respectively selected from the group consisting of titanium(Ti), nickel(Ni), molybdenum(Mo), cadmium(Cd), platinum(Pt), gold(Au), Indium-Tin-Oxide(ITO) coated glass, stainless steel, and carbon substrate.
Abstract translation: 提供了在温和条件下制备具有优异催化活性的大尺寸纳米晶钴金属薄膜的方法。 通过电沉积制备钴金属薄膜的方法包括：将对电极和工作电极浸入pH值为4至5且含有浓度为10至500mM的钴盐的水溶液中; 在0〜40℃的温度下对两个电极施加-0.7〜-1.3V的电压，在工作电极上形成Co金属薄膜。 钴盐选自硝酸钴（Co（NO 3）2），乙酸钴（Co（C 2 H 3 O 2）3），硫酸钴（CoSO 4）和氯化钴（CoCl 2）。 工作电极和反电极是分别选自由钛（Ti），镍（Ni），钼（Mo），镉（Cd），铂（Pt），金（Au），铟锡合金 氧化物（ITO）镀膜玻璃，不锈钢和碳基板。
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公开(公告)号：KR100635303B1
公开(公告)日：2006-10-19
申请号：KR1020050036994
申请日：2005-05-03
Applicant: 한국과학기술연구원
Abstract: A method of preparing a crystalline Mo-Co mixture thin film with excellent catalytic activity efficiently in mild conditions is provided. A method of preparing a molybdenum-cobalt mixture thin film by electrodeposition comprises: immersing a counter electrode and a working electrode into an aqueous weak basic solution with a pH of 7 to 10 containing a cobalt salt and molybdic acid((NH4)6Mo7O24+85%MoO3) that respectively have concentrations of 10 to 200 mM; and impressing a voltage of -1.0 to -1.5 V to both electrodes at a temperature of 0 to 80 deg.C to form a Mo-Co mixture thin film on the working electrode. The aqueous weak basic solution is prepared by mixing an aqueous cobalt salt solution with an aqueous molybdic acid solution at a volume ratio of 20:1 to 1:20. The cobalt salt is selected from the group consisting of cobalt nitrate(Co(NO3)2), cobalt acetate(Co(C2H3O2)3), cobalt sulfate(CoSO4) and cobalt chloride(CoCl2). The working electrode and the counter electrode are substrates respectively selected from the group consisting of titanium(Ti), nickel(Ni), molybdenum(Mo), cadmium(Cd), platinum(Pt), gold(Au), Indium-Tin-Oxide(ITO) coated glass, stainless steel, and carbon substrate.
Abstract translation: 提供了在温和条件下有效地制备具有优异催化活性的结晶Mo-Co混合物薄膜的方法。 通过电沉积制备钼 - 钴混合物薄膜的方法包括：将对电极和工作电极浸入pH值为7至10的含有钴盐和钼酸（（NH 4）6 Mo 7 O 24 +85 ％MoO 3），其分别具有10至200mM的浓度; 并在0至80℃的温度下对两个电极施加-1.0至-1.5V的电压以在工作电极上形成Mo-Co混合物薄膜。 通过将钴盐水溶液与钼酸水溶液以20:1至1:20的体积比混合来制备弱碱性水溶液。 钴盐选自硝酸钴（Co（NO 3）2），乙酸钴（Co（C 2 H 3 O 2）3），硫酸钴（CoSO 4）和氯化钴（CoCl 2）。 工作电极和反电极是分别选自由钛（Ti），镍（Ni），钼（Mo），镉（Cd），铂（Pt），金（Au），铟锡合金 氧化物（ITO）镀膜玻璃，不锈钢和碳基板。
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公开(公告)号：KR100635300B1
公开(公告)日：2006-10-19
申请号：KR1020050036995
申请日：2005-05-03
Applicant: 한국과학기술연구원
Abstract: A method of preparing a Mo-Co alloy thin film with excellent catalytic activity efficiently in mild conditions is provided. A method of preparing a molybdenum-cobalt alloy(Co2Mo3) thin film by electrodeposition comprises: immersing a counter electrode and a working electrode into an aqueous acidic solution with a pH of 3 to 6 containing a complexing agent, a cobalt salt and molybdic acid((NH4)6Mo7O24+85%MoO3) that respectively have concentrations of 10 to 200 mM; and impressing a voltage of -1.0 to -1.5 V to both electrodes at a temperature of 0 to 80 deg.C to form a Mo-Co alloy thin film on the working electrode. The complexing agent is citric acid. The aqueous acidic solution is prepared by mixing an aqueous complexing agent solution, an aqueous cobalt salt solution and an aqueous molybdic acid solution. The cobalt salt is selected from the group consisting of cobalt nitrate(Co(NO3)2), cobalt acetate(Co(C2H3O2)3), cobalt sulfate(CoSO4) and cobalt chloride(CoCl2). The working electrode and the counter electrode are substrates respectively selected from the group consisting of titanium(Ti), nickel(Ni), molybdenum(Mo), cadmium(Cd), platinum(Pt), gold(Au), Indium-Tin-Oxide(ITO) coated glass, stainless steel, and carbon substrate.
Abstract translation: 提供了在温和条件下有效地制备具有优异催化活性的Mo-Co合金薄膜的方法。 通过电沉积制备钼 - 钴合金（Co 2 Mo 3）薄膜的方法包括：将对电极和工作电极浸入含有络合剂，钴盐和钼酸的pH为3至6的酸性水溶液（ （NH 4）6 Mo 7 O 24 + 85％MoO 3），其浓度分别为10至200mM; 在0〜80℃的温度下对两个电极施加-1.0〜-1.5V的电压，在工作电极上形成Mo-Co合金薄膜。 络合剂是柠檬酸。 通过混合络合剂水溶液，钴盐水溶液和钼酸水溶液来制备酸性水溶液。 钴盐选自硝酸钴（Co（NO 3）2），乙酸钴（Co（C 2 H 3 O 2）3），硫酸钴（CoSO 4）和氯化钴（CoCl 2）。 工作电极和反电极是分别选自由钛（Ti），镍（Ni），钼（Mo），镉（Cd），铂（Pt），金（Au），铟锡合金 氧化物（ITO）镀膜玻璃，不锈钢和碳基板。
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