Abstract:
A manufacturing method of a surface plasmonic color filter includes: a step (a) of forming a photonic crystal structure on a substrate; a step (b) of forming a first dielectric layer on the photonic crystal structure; a step (c) of forming a metal film on the first dielectric layer; a step (d) of forming a photosensitive layer on the metal film; a step (e) of forming a nano-hole array having periodicity on the photosensitive layer by irradiating laser interference patterns on the photosensitive layer; a step (f) of forming a nano-hole array on the metal film by etching the metal film using the nano-hole array of the photosensitive layer; and a step (g) of removing the photosensitive layer having the nano-hole array from the metal film on which the nano-hole array is formed and forming a second dielectric layer including the same dielectric substance as the dielectric substance included in the first dielectric layer on the metal film on which the nano-hole array is formed. The cutoff wavelength band of the photonic crystal structure is different from the pass wavelength band of the nano-hole array.
Abstract:
The present invention relates to a surface plasmon color filter comprising: a substrate, a photonic crystal structure on the substrate, a metal thin film having a plurality of nanosized holes arranged at regular intervals formed on the photonic crystal structure, and a first dielectric layer formed on the metal thin film. A transmission wavelength band of photonic crystal structure and a transmission wavelength band of a hole array pattern having holes of metal thin films are different from each other.
Abstract:
표면 플라즈모닉 컬러 필터의 제조 방법은, (a) 기판 위에 광결정 구조를 형성하는 단계와, (b) 광결정 구조 위에 제1 유전체층을 형성하는 단계; (c) 제1 유전체층 위에 금속막을 형성하는 단계와, (d) 금속막 위에 감광층을 형성하는 단계와, (e) 감광층에 레이저 간섭무늬를 조사하여 감광층에 주기성을 가지는 나노 홀 어레이(nano hole array)를 형성하는 단계와, (f) 감광층의 나노 홀 어레이를 이용하여 금속막을 식각(etching)하여 금속막에 나노 홀 어레이를 형성하는 단계와, (g) 나노 홀 어레이를 가지는 감광층을 나노 홀 어레이가 형성된 금속막으로부터 제거하고 나노 홀 어레이가 형성된 금속막 위에 제1 유전체층에 포함된 유전물질과 동일한 유전물질을 포함하는 제2 유전체층을 형성하는 단계를 포함한다. 광결정 구조의 차단 파장 대역과 나노 홀 어레이의 투과 파장 대역은 서로 다르다.
Abstract:
An active surface plasmonic color filter comprises: a substrate; a metal thin film formed on the substrate including a plurality of holes disposed periodically with each having a nanosize; and a first dielectric layer formed on the metal thin film. The holes included in the metal thin film are disposed periodically along a first direction axis and a second direction axis perpendicular to each other, such that a color adjustment is possible in accordance to a polarization direction of linear polarization provided from the outside. The interval between holes disposed along the first direction axis is different from the interval between holes disposed along the second direction axis. The active surface plasmonic color filter capable of expressing a gray scale comprises: a substrate; a metal thin film formed on the substrate and includes a plurality of holes disposed periodically each having an anisotropic pattern having a nanosize, such that the strength of linear polarization is adjustable according to the polarization direction of the linear polarization provided from the outside; and a first dielectric layer formed on the metal thin film. The holes included in the metal thin film are disposed in a repeated manner according to a square-type unit hole array pattern or a hexagonal-type unit hole array pattern.
Abstract:
표면 플라즈모닉 컬러 필터의 제조 방법은, (a) 기판 위에 금속막을 형성하는 단계와, (b) 금속막 위에 감광층을 형성하는 단계와, (c) 감광층에 레이저 간섭무늬를 조사하여 감광층에 주기성을 가지는 나노 홀 어레이(nano hole array)를 형성하는 단계와, (d) 감광층의 나노 홀 어레이를 이용하여 금속막을 식각(etching)하여 금속막에 나노 홀 어레이를 형성하는 단계와, (e) 나노 홀 어레이를 가지는 감광층을 나노 홀 어레이가 형성된 금속막으로부터 제거하고 나노 홀 어레이가 형성된 금속막 위에 유전체층을 형성하는 단계를 포함한다.
Abstract:
A method of manufacturing a surface plasmonic color filter using laser interference lithography comprises the steps of: (a) forming a metal film on a substrate; (b) forming a photosensitive layer on the metal film; (c) forming a nanohole array having periodicity on the photosensitive layer by irradiating the photosensitive layer with a laser interference patterns; (d) forming the nanohole array on the metal film by etching the metal film using the nanohole array of the photosensitive layer; and (e) removing the photosensitive layer having the nanohole array from the metal film having the nanohole array, and forming a dielectric layer on the metal film having the nanohole array.
Abstract:
A manufacturing method of a surface plasmonic color filter includes the steps of: (a) forming a metal film on a substrate; (b) forming a photosensitive layer on the metal layer; (c) forming a periodical nono hole array on the photosensitive layer by emitting a laser interference pattern on the photosensitive layer; (d) etching the metal film by using the nano hole array on the photosensitive layer to form another nano hole array on the metal film; and (e) removing the photosensitive layer with the nano hole array from the metal film with the nano hole array and forming a dielectric layer on the metal layer with the nano hole array.
Abstract:
표면 플라즈몬 컬러필터는, 기판과, 기판 위에 형성되는 광 결정 구조와, 광 결정 구조 위에 형성되고, 주기적으로 배치되고 나노(nano) 크기를 각각 가지는 다수의 구멍(hole)들을 포함하는 금속 박막과, 금속 박막 위에 형성되는 제1 유전체층을 포함한다. 광 결정 구조의 차단 파장 대역과 금속 박막의 구멍(hole)들로 구성되는 홀 어레이 패턴(hole array pattern)의 투과 파장 대역은 서로 다르다.