公开(公告)号：KR100314761B1

公开(公告)日：2001-11-17

申请号：KR1019990006989

申请日：1999-03-03

Applicant: 한국과학기술원

Inventor： 김진백 ,  이범욱

IPC: C07C69/73

CPC classification number: C08F32/08 ,  G03F7/0045 ,  G03F7/039

Abstract: 본발명은노르보르넨에콜릭산, 디옥시콜릭산또는리소콜릭산유도체를결합시킨단량체를단독중합하거나또는말레산무수물과공중합하거나또는말레산무수물및 2-하이드록시에틸 5-노르보르넨-2-카르복실레이트또는 5-노르보르넨-2-카르복실릭산을단독또는혼합하여중합시킨중합체및 그용도에관한것이다. 본발명은노르보르넨에콜릭산또는디옥시콜릭산또는리소콜릭산유도체를결합시켜단량체를합성하고이 단량체들을단독중합하거나또는말레산무수물과공중합하거나또는말레산무수물및 2-하이드록시에틸 5-노르보르넨-2-카르복실레이트또는 5-노르보르넨-2-카르복실릭산과단독또는혼합하여라디칼중합을시켜중합체를제조한다. 본발명에서합성한중합체는광산발생제와함께용제에녹인다음필터에여과하여포토레지스트용액을만들고이 것으로부터미세화상을얻는용도로이용할수 있다.

公开(公告)号：KR1020000059422A

公开(公告)日：2000-10-05

申请号：KR1019990006989

申请日：1999-03-03

Applicant: 한국과학기술원

Inventor： 김진백 ,  이범욱

IPC: C07C69/73

CPC classification number: C08F32/08 ,  G03F7/0045 ,  G03F7/039

Abstract: PURPOSE: A polymer using a monomer wherein cholic acid, dioxycholic acid or lithocholic acid derivative is bound with norbornene is provided which contains many fatty radical rings so that it shows excellent dry etching resistance. CONSTITUTION: The polymer shown in a structural XIV independently polymerizes the monomer shown in a structural formula I wherein cholic acid, dioxycholic acid or lithocholic acid derivative is bound with norbornene. In the structural formual I, R1, R2 are H, CH3 substituted in norbornene, OH, CH2OH, CO2CH3 or CO2C(CH3)3, R3 is (CH2)nO(n=0-3), CO(CH2)nO(n=0-3) or COO(CH2)nO(n=1-3), R4, R5 are H, OH, OCOCH3, OCO(CH2O)nCH3(n=1-10), OCO(CH2CH2O)nCH3(n=1-7) or OCOO(CH2CH2O)nCH3(n=1-7) and R6 is H, C(CH3)3, CH(CH3)O(CH2)nCH3(n=1-3) or tetrahydro pyranil protection radial. In the structural formula XIV, n is polymerization degree ranged from 1 to 100.

Abstract translation: 目的：提供使用其中胆酸，二氧胆酸或石胆酸衍生物与降冰片烯结合的单体的聚合物，其含有许多脂肪基环，使得其显示出优异的耐干蚀刻性。 构成：结构XIV中所示的聚合物独立地聚合结构式I所示的单体，其中胆酸，二氧胆酸或石胆酸衍生物与降冰片烯结合。 在结构式I中，R 1，R 2是H，在降冰片烯中OH，CH 2 OH，CO 2 CH 3或CO 2 C（CH 3）3取代的CH 3，R 3是（CH 2）n O（n = 0-3），CO（CH 2）n O = 0-3）或COO（CH2）nO（n = 1-3），R4，R5为H，OH，OCOCH3，OCO（CH2O）nCH3（n = 1-10），OCO（CH2CH2O）nCH3（n = 1-7）或OCOO（CH2CH2O）nCH3（n = 1-7），R6是H，C（CH3）3，CH（CH3）O（CH2）nCH3（n = 1-3）或四氢吡喃保护放射状。 在结构式XIV中，n为1〜100的聚合度。