투명 전도성 반사방지막을 갖는 광전 소자
    1.
    发明授权
    투명 전도성 반사방지막을 갖는 광전 소자 有权
    具有透明导电抗反射膜的光电元件

    公开(公告)号:KR101264367B1

    公开(公告)日:2013-05-14

    申请号:KR1020120076844

    申请日:2012-07-13

    CPC classification number: Y02E10/50 H01L31/04 H01L31/0216 H01L31/0224

    Abstract: PURPOSE: A photoelectric element having a transparent conductive antireflection film is provided to reduce the resistance between a front electrode and an emitter by forming an antireflection layer made of transparent conducting oxide. CONSTITUTION: An emitter layer(23) is formed on a semiconductor substrate(21). An antireflection layer(13) made of transparent conducting oxide is formed on the emitter layer. A front electrode(31) made of metal is formed on the antireflection layer. The front electrode is partly inserted into the antireflection layer. A rear electrode(12) is formed in the lower part of the semiconductor substrate.

    Abstract translation: 目的:提供具有透明导电抗反射膜的光电元件,通过形成由透明导电氧化物制成的抗反射层,以减小前电极和发射极之间的电阻。 构成:在半导体衬底(21)上形成发射极层(23)。 在发射极层上形成由透明导电氧化物构成的抗反射层(13)。 在防反射层上形成由金属制成的前电极(31)。 前电极部分插入防反射层。 在半导体衬底的下部形成有后电极(12)。

    강도와 연신율이 향상된 니켈-알루미늄-동 합금 및 이의 용도
    2.
    发明公开
    강도와 연신율이 향상된 니켈-알루미늄-동 합금 및 이의 용도 审中-实审
    具有改进的强度和伸长率的镍 - 铜 - 铜合金及其用途

    公开(公告)号:KR1020170124255A

    公开(公告)日:2017-11-10

    申请号:KR1020160053931

    申请日:2016-05-02

    CPC classification number: C22C9/01 B22D23/00 B63B2745/00 C22C1/02

    Abstract: 본발명은구리기지에합금전체중량부에대해, 7 ~ 11 중량부의알루미늄; 3 ~ 6 중량부의니켈; 및 0.005 ~ 0.07 중량부의지르코늄을포함하는강도및 연신율이동시에향상된니켈-알루미늄-동합금에관한것이다. 상기본 발명에따른니켈-알루미늄-동합금에의하면, 고강도를갖는동시에고연신율특성을가지는해수용물품을효율적으로제조할수 있는이점이있다.

    Abstract translation: 本发明涉及一种铜合金,其包含7至11重量份的铝, 3-6重量份的镍; 和0.005-0.07重量份的锆,同时镍 - 铝 - 铜合金具有改善的强度和伸长率。 根据上述基本发明的镍 - 铝 - 铜合金,有一点可以有效地生产具有高强度和高伸长性能的集水件。

    입체 패턴을 갖는 광전 소자 및 이의 제조 방법
    4.
    发明授权
    입체 패턴을 갖는 광전 소자 및 이의 제조 방법 有权
    具有三维图案的光电元件及其制作方法

    公开(公告)号:KR101186242B1

    公开(公告)日:2012-09-27

    申请号:KR1020120014865

    申请日:2012-02-14

    CPC classification number: Y02E10/50 H01L31/06 H01L31/0224 H01L31/04 H01L31/18

    Abstract: PURPOSE: A photoelectric device having 3D patterns and a manufacturing method thereof are provided to improve a photoelectric effect by forming nano patterns on a transparent electrode. CONSTITUTION: A PN junction semiconductor layer(10) is made into a crystalline silicon wafer shape. The PN junction semiconductor layer comprises a P-type semiconductor layer(11) and an N-type semiconductor layer(12). A rear electrode(21) is arranged on a first side of the PN junction semiconductor layer. A transparent electrode(23) is arranged on a second side facing the first side of the PN junction semiconductor layer. The transparent electrode includes a first transparent conductive oxide layer(24) and a second transparent conductive oxide layer(25).

    Abstract translation: 目的:提供具有3D图案的光电装置及其制造方法,以通过在透明电极上形成纳米图案来改善光电效应。 构成:将PN结半导体层(10)制成晶体硅晶片形状。 PN结半导体层包括P型半导体层(11)和N型半导体层(12)。 背电极(21)布置在PN结半导体层的第一侧上。 透明电极(23)布置在面对PN结半导体层的第一侧的第二面上。 透明电极包括第一透明导电氧化物层(24)和第二透明导电氧化物层(25)。

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