플라즈마를 이용한 초소수성 표면 처리 방법
    1.
    发明公开
    플라즈마를 이용한 초소수성 표면 처리 방법 无效
    使用等离子体的疏水表面处理

    公开(公告)号:KR1020120133244A

    公开(公告)日:2012-12-10

    申请号:KR1020110051816

    申请日:2011-05-31

    CPC classification number: H01L21/3065

    Abstract: PURPOSE: A superhydrophobic surface processing method is provided to improve an anti-fouling property capable of preventing contamination due to foreign substances by elevating a range of surface roughness of a substrate or depositing a hydrophobic thin film on the surface of the substrate. CONSTITUTION: A substrate(10) is fixed with a chuck(20). The chuck fixes the substrate using vacuum or static electricity. Plasma(40) is formed on the upper side of the substrate. The roughness of the substrate surface is changed by etching the substrate surface using the plasma. The substrate surface is formed into a pyramid structure(30). [Reference numerals] (10) Substrate; (20) Chuck; (40) Plasma

    Abstract translation: 目的:提供一种超疏水性表面处理方法,通过提高基板的表面粗糙度或在基板的表面上沉积疏水性薄膜,提高能够防止异物污染的防污性。 构成:用卡盘(20)固定衬底(10)。 卡盘使用真空或静电固定基板。 等离子体(40)形成在基板的上侧。 通过使用等离子体蚀刻衬底表面来改变衬底表面的粗糙度。 基板表面形成为金字塔结构(30)。 (附图标记)(10)基板; (20)卡盘; (40)等离子体

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