Abstract:
PURPOSE: An epoxy composition for sealing semiconductor devices is provided to manufacture a semiconductor device with high reliability and moldability by improving warpage properties due to temperature change by having improved high temperature dimensional stability, hardening effectiveness and degree because of high glass transition temperature. CONSTITUTION: An epoxy composition for sealing semiconductor devices comprises an epoxy compound, a hardener, a curing accelerator, and filler. The epoxy compound is a naphthalene-based epoxy dimer with two naphthalene-based core units in chemical formula 1. In chemical formula 1, The naphthalene-based unit 1 and 2 is independently selected from a group consisting of chemical formula 2-1 and chemical formula 2-2. In chemical formula 2-2, R is a single bond or a C1-C5 alkanediyl group. The equivalent ratio of the hardener to the epoxy compound is 0.5-1.5. [Reference numerals] (AA) Naphthalene unit 1; (BB) Naphthalene unit 2
Abstract:
A polycarbonate resin composition is provided to minimize the loss of light transmission generated by light scattering on the inorganic filler surface by using metal oxide-composite inorganic filler. A polycarbonate resin composition for a plastic substrate comprises polycarbonate 100.0 parts by weight and inorganic filler 5-95 parts by weight consisting of mixed metal oxide. The difference of a refraction index of polycarbonate and inorganic filler is 0.1 or less. The polycarbonate resin composition further comprises at least one selected from 1-20 parts by weight surfactant based on 100.0 parts by weight inorganic filler or 1-30 parts by weight polyfunctional monomers/oligomers based on 100.0 parts by weight polycarbonate.
Abstract:
Core-shell inorganic particles are provided to ensure good compatiblity with a polymer, low coefficient of thermal expansion, excellent optical property, especially, light transmission. Core-shell inorganic particles with excellent compatibility with polycarbonate have the surface forming core, wherein the surface is modified with polycarbonate or polycarbonate precursor. The inorganic particles forming core is selected from the group consisting of silica, TiO2, ZrO2, MgO, SiC, Al2O3 and their mixed metal oxide. The polycarbonate precursor is selected from the group consisting of bisphenol A and bisphenol A-based polycarbonate oligomer.
Abstract translation:提供核壳无机颗粒以确保与聚合物的良好相容性,低热膨胀系数,优异的光学性能,特别是透光性。 与聚碳酸酯具有优异相容性的核壳无机颗粒具有表面形成芯,其中表面用聚碳酸酯或聚碳酸酯前体改性。 形成芯的无机颗粒选自二氧化硅,TiO 2,ZrO 2,MgO,SiC,Al 2 O 3及其混合金属氧化物。 聚碳酸酯前体选自双酚A和双酚A基聚碳酸酯低聚物。
Abstract:
PURPOSE: A naphthalene based epoxy dimer and a manufacturing method thereof are provided to improve thermal expansion property, workability, and packing efficiencies between epoxy resin main chains. CONSTITUTION: A naphthalene based epoxy dimer has two naphthalene based core units represented by chemical formula 1. In the chemical formula 1, the naphthalene based unit 1 and 2 are represented by chemical formula 2-1 or 2-2. The hydroxy group of the chemical formula 1 is reformed as epoxy radical, (meta) acrylate group, vinyl group, allyl group or alkoxy silyl group. A manufacturing method of naphthalene based epoxy dimer having two naphthalene based core unit of the chemical formula 1 comprises the following steps: reacting naphthalene based epoxy dimer at room temperature to 200 deg. Celsius for 10 minutes to 5 hours under the existence of solvent and base in order for dihydroxynaphthalene to be 3-10 equivalent based on 1 equivalent of 1,3- bifunctional propanol; forming dihydroxynaphthalene dimer; and reacting at room temperature to 200 deg. Celsius for 1-24 hours under the existence of base and arbitrary solvent in order for epichlorohydrin to be 4-15 equivalent based on 1 equivalent of dihydroxynaphthalene dimer. [Reference numerals] (AA) Naphthalene unit1; (BB) Naphthalene unit2
Abstract:
A polycarbonate resin composition having coefficient of thermal expansion is provided to reduce the coefficient of thermal expansion of the optical film for the plastic substrate effectively by preparing an organic and inorganic hybrid complex which is chemically combined with an inorganic filler reformed with polycarbonate and light reaction functional group. A polycarbonate resin composition comprises 100 parts by weight of curable binder; 20-90 parts by weight of a polycarbonate; 5-50 parts by weight of photocurable monomer including a multi-functional monomer having a thiol group; 5-90 parts by weight of inorganic filler surface-modified to the photocurable functional group; and 0.1-5 parts by weight of a photoinitiator. The polycarbonate is at least one selected from a group consisting of polycarbonate having photocurable functional group and polycarbonate which does not have a photocurable functional group.
Abstract:
보다 상세하게 본 발명은 향상된 성형성, 경화특성 및 보존안정성을 갖는 나프탈렌계 에폭시 다이머를 포함하는 성형변형이 거의 없고 열팽창계수가 낮아 신뢰성 및 성형성이 우수한 반도체용 에폭시 조성물 및 이로 밀봉된 반도체 장치에 관한 것이다. 본 발명에 의하면, 에폭시 화합물(A), 경화제(B), 경화촉진제(C) 및 충전제(D)를 포함하는 에폭시 조성물에서, 상기 에폭시 화합물(A)은 하기 화학식 1의 2개의 나프탈렌계 코어 유니트(unit)를 갖는 나프탈렌계 에폭시 다이머임을 특징으로 하는 에폭시 조성물 및 상기 에폭시 조성물로 반도체 소자가 밀봉된 반도체 장치가 제공된다. 상기 화학식 1의 나프탈렌계 에폭시 다이머를 포함하는 에폭시 조성물은 개선된 Warpage 변형 특성을 나타낼 뿐만 아니라, 낮은 열팽창계수를 갖는 것으로 본 발명에 의한 에폭시 조성물을 사용하므로서 우수한 성형성 및 신뢰성을 갖는 반도체 소자(장치)를 제조할 수 있다.
Abstract:
본 발명은 플라스틱 기판 소재로 사용될 수 있는 유무기 하이브리드 수지 조성물, 그 제조 방법 및 이를 이용한 플라스틱 기판용 광학 필름 제조 방법에 관한 것으로, 본 발명은 에폭시 또는 아민 작용기로 표면 개질된 실리카 졸 5 내지 90 중량%; 폴리카보네이트계 또는 에폭시계 고분자 시스템 10 내지 90 중량%; 및 용매를 포함하여 이루어진 유무기 하이브리드 수지 조성물, 그 제조 방법 및 이를 이용한 플라스틱 기판용 광학 필름 제조 방법을 제공한다.
Abstract:
An organic and inorganic hybrid resin composition, its preparation method, and an organic and inorganic hybrid resin are provided to lower a coefficient of thermal expansion and to improve optical characteristic without the deterioration of the transparency of a film. An organic and inorganic hybrid resin composition comprises 5-90 wt% of a silica sol whose surface is modified with an epoxy functional group or an amine functional group; 10-90 wt% of a polycarbonate-based or epoxy-based polymer system; and a solvent. The silica sol is prepared by reacting a silane compound represented by the formula I, or a mixture of the silane compound represented by the formula I and a silane compound represented by the formula II, wherein at least one of R1, R2, R3 and R4 is an organic substituent having an epoxy group or an amine group, and the rest are independently OH or a C1-10 alkoxy group; and at least one of R5, R6, R7 and R8 is OH or a C1-10 alkoxy group, and the rest are independently a C1~10 alkyl group, a C6~20 arylene group, a C1~10 alkyl C6~20 arylene group or a C6~20 aryl C1~10 alkylene group.
Abstract:
본 발명은 플라스틱 기판용 폴리카보네이트 수지 조성물에 관한 것으로, 폴리카보네이트 100중량부; 및 혼합 금속산화물로 이루어진 무기필러 5 내지 95 중량부를 포함하여 이루어지며, 상기 폴리카보네이트와 무기필러의 굴절율 차이가 0.1 이하인 것을 그 특징으로 한다. 본 발명의 폴리카보네이트 수지 조성물은 금속 산화물이 복합된 무기 필러를 사용하여 폴리카보네이트 수지와의 굴절율 차이를 최소화함으로써, 무기 필러 표면에서 빛이 산란됨으로 인해 발생하는 투광성 상실을 최소화하였다. 플라스틱기판, 폴리카보네이트필름