公开(公告)号：KR101331493B1

公开(公告)日：2013-11-20

申请号：KR1020120057342

申请日：2012-05-30

Applicant: 한국원자력연구원

Inventor： 장규하 ,  김경남 ,  이기태 ,  박성희 ,  김하나 ,  정영욱

IPC: H01J27/02

Abstract: The present invention relates to a method of manufacturing a multi-layer target including a vacuum layer with a narrow vacuum gap for the laser induced, specifically, by this the step five (5 step) forming the vacuum layer in the metal layer intervening space the side in which the step four (4 step), patterning the photoresist layer of the first substrate and the metal layer of the second substrate are formed in which the photoresist layer is formed on the upper part of the metal layer of the step three (3 step). The first substrate manufacturing the second substrate with the step one and step two is patterning the opposite surface of the side in which the metal layer is formed from the previous step one and manufactures the first substrate, and step two and the same method generate the metal layer in one side of the substrate or the second substrate. According to the invention, the double-layer target can be easily manufactured from the micro-electromechanical system (MEMS) technology, and it is used for manufacturing the conventional semiconductor processes. The each thickness of the double-layer target as well as the energy spectrum of the ion beam particle to generate can be controlled by the invention. [Reference numerals] (1) Silicon substrate;(10) Double layer target including a vacuum layer;(2) Spread a metal film material;(3) Aluminum (masking material) deposition;(4) Photoresist deposition;(5) Photolithography;(6) Photoresist development;(7) Etch an aluminum layer;(8) Etch the silicon substrate-DRIE;(9) Photoresist + Photolithography;(AA) Make two sheets

Abstract translation: 本发明涉及一种制造多层靶的方法，该多层靶包括用于激光诱发的具有窄真空间隙的真空层，具体地说，通过在金属层中间空间中形成真空层的步骤5（5步骤） 形成步骤四（4步骤），图案化第一基板的光致抗蚀剂层和第二基板的金属层，其中光致抗蚀剂层形成在步骤三（3）的金属层的上部 步）。 用第一步和第二步制造第二衬底的第一衬底是从前一步骤中形成其中形成金属层的一侧的相反表面并制造第一衬底，并且步骤二和相同的方法产生金属 层在基板的一侧或第二基板上。 根据本发明，双层靶可以容易地从微机电系统（MEMS）技术制造，并且用于制造常规的半导体工艺。 通过本发明可以控制双层靶的每个厚度以及所产生的离子束粒子的能谱。 （1）硅衬底;（10）包括真空层的双层靶;（2）扩展金属膜材料;（3）铝（掩模材料）沉积;（4）光刻胶沉积;（5）光刻 ;（6）光刻胶显影;（7）蚀刻铝层;（8）蚀刻硅衬底-DRIE;（9）光刻胶+光刻;（AA）

公开(公告)号：KR101269098B1

公开(公告)日：2013-05-29

申请号：KR1020110141176

申请日：2011-12-23

Applicant: 한국원자력연구원

Inventor： 이기태 ,  김경남 ,  장규하 ,  박성희 ,  김하나 ,  정영욱

IPC: H01J27/24

Abstract: PURPOSE: A bilayer target having a vacuum layer for generating laser induced particles is provided to prevent the target from being damaged by a linear pulse in laser induced particle acceleration, by using a micro short high peak output laser. CONSTITUTION: A first target layer(21) generates plasma by reacting to a linear pulse of a laser. A second target layer(23) generates an ion beam by a main pulse of the laser. A vacuum layer(22) is formed between the first target layer and the second target layer. The vacuum layer prevents an impulse wave due to the plasma from being delivered to the second target layer. A part of the ion beam generated in the second target layer is reflected by the plasma generated in the first target layer and then is injected into the second target layer again.

Abstract translation: 目的：提供具有用于产生激光诱导粒子的真空层的双层靶，以通过使用微小的高峰值输出激光来防止靶被激光诱导粒子加速中的线性脉冲损坏。 构成：第一目标层（21）通过与激光的线性脉冲反应产生等离子体。 第二目标层（23）通过激光的主脉冲产生离子束。 在第一目标层和第二目标层之间形成真空层（22）。 真空层防止由于等离子体的脉冲波被传送到第二目标层。 在第二目标层中产生的离子束的一部分被第一目标层中产生的等离子体反射，然后再次注入第二目标层。

公开(公告)号：KR1020150080397A

公开(公告)日：2015-07-09

申请号：KR1020140063997

申请日：2014-05-27

Applicant: 한국원자력연구원

Inventor： 김경남 ,  이기태 ,  박성희 ,  정영욱 ,  장규하 ,  김하나 ,  한병헌

IPC: H01J27/24

CPC classification number: H01J27/24 ,  H01J27/20

Abstract: 본발명은, 레이저가입사되는제 1 타겟층; 상기레이저의진행방향에따라서상기제 1 타겟층의뒤쪽에위치하며, 목표로하는이온빔이생성되는중간층; 및상기중간층을사이에두고상기제 1 타겟층과반대쪽에위치하는제 2 타겟층을포함하는것을특징으로하는레이저유도입자가속을위한필름타겟및 그제작방법에관한것으로서, 본발명에따르면, 제 1 타겟층과제 2 타겟층사이에서목표로하는이온빔이발생함으로써, 레이저선행펄스에의한영향에둔감하여, 레이저선행펄스를감소시키기위한추가적인기술이요구되지않는효과가있다.

Abstract translation: 本发明涉及一种激光诱导粒子加速用薄膜靶材，其包括：激光器输入的第一靶层，位于激光器的前进方向位于第一靶层后方的中间层，并产生离子束 以及通过插入中间层而被定位成与第一目标层相对的第二目标层及其制造方法。 根据本发明，通过产生作为第一目标层和第二目标层之间的目标的离子束，通过激光预脉冲的影响的不敏感性，不需要用于减少激光预脉冲的附加技术。

公开(公告)号：KR101623152B1

公开(公告)日：2016-05-23

申请号：KR1020140063997

申请日：2014-05-27

Applicant: 한국원자력연구원

Inventor： 김경남 ,  이기태 ,  박성희 ,  정영욱 ,  장규하 ,  김하나 ,  한병헌

IPC: H01J27/24

Abstract: 본발명은, 레이저가입사되는제 1 타겟층; 상기레이저의진행방향에따라서상기제 1 타겟층의뒤쪽에위치하며, 목표로하는이온빔이생성되는중간층; 및상기중간층을사이에두고상기제 1 타겟층과반대쪽에위치하는제 2 타겟층을포함하는것을특징으로하는레이저유도입자가속을위한필름타겟및 그제작방법에관한것으로서, 본발명에따르면, 제 1 타겟층과제 2 타겟층사이에서목표로하는이온빔이발생함으로써, 레이저선행펄스에의한영향에둔감하여, 레이저선행펄스를감소시키기위한추가적인기술이요구되지않는효과가있다.