박막트랜지스터 및 그의 제조방법
    1.
    发明公开
    박막트랜지스터 및 그의 제조방법 无效
    氧化物薄膜晶体管及其制造方法

    公开(公告)号:KR1020110066370A

    公开(公告)日:2011-06-17

    申请号:KR1020090122990

    申请日:2009-12-11

    Abstract: PURPOSE: An oxide thin film transistor and a method for manufacturing the same are provided to improve mobility and resistivity to temperature by applying a channel layer to a semiconductor layer. CONSTITUTION: In an oxide thin film transistor and a method for manufacturing the same, a source-drain electrode(20) is formed on a substrate(10). A channel layer(30) is formed on the source-drain electrode. A channel layer comprises a nitride which contains boron or aluminum in the oxide semiconductor. A gate insulating layer(40) is formed on the channel layer. The gate electrode(50) is formed on the gate insulating layer.

    Abstract translation: 目的:提供一种氧化物薄膜晶体管及其制造方法,以通过向半导体层施加沟道层来提高迁移率和耐温度。 构成:在氧化物薄膜晶体管及其制造方法中,在基板(10)上形成源极 - 漏极(20)。 沟道层(30)形成在源 - 漏电极上。 沟道层包括在氧化物半导体中含有硼或铝的氮化物。 栅极绝缘层(40)形成在沟道层上。 栅电极(50)形成在栅绝缘层上。

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