-
公开(公告)号:KR100853199B1
公开(公告)日:2008-08-20
申请号:KR1020070030357
申请日:2007-03-28
Applicant: 한국전자통신연구원
Inventor: 김상협 , 명혜진 , 맹성렬 , 아마라툰가지.에이.제이. , 이선영
CPC classification number: C01G1/02 , B82Y30/00 , C01B13/36 , C01G9/02 , C01P2004/03 , C01P2004/10 , C01P2004/16 , C01P2004/64
Abstract: A method of massproducing oxide-based nanostructure is provided to obtain oxide type nanostructure having uniform electrical characteristics and homogeneous composition in a simple process and to prevent the problems involved with the crystallographic discordance between the nanostructure and substrate by chemical wet-process and physical dry-process. A method of massproducing oxide-based nanostructure comprises steps of: preparing a first organic solution containing metal(S10); mixing the first solution with a second organic solution containing hydroxylic group(S20); stirring the mixture solution(S30); standing the mixture solution(S40); filtering the mixture solution in order to collect the formed oxide-based nanostructure from the mixture solution(S50); drying the collected oxide-based nanostructure in order to remove the remaining organic solution(S60); and subjecting the dried oxide-based nanostructure to heat-treatment(S70). The metal contains an element selected from a group consisting of Sc, Ti, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, lanthanide, actinoid, Si, Ge, Sn, As, Sb, Bi, Ga and In. The second organic solution contains one selected from a group consisting of methanol, ethanol, ethylene glycol, glycerol, propanol, butanol, phenol, catechol, cresol, pyrogallol and naphthol.
Abstract translation: 提供大规模生产基于氧化物的纳米结构的方法,以简单的方法获得具有均匀电特性和均匀组成的氧化物型纳米结构,并通过化学湿法和物理干法处理纳米结构和基底之间的结晶不一致问题, 处理。 大量生产基于氧化物的纳米结构的方法包括以下步骤:制备含有金属的第一有机溶液(S10); 将第一溶液与含有羟基的第二有机溶液混合(S20); 搅拌混合溶液(S30); 静置混合液(S40); 过滤混合溶液以从混合溶液中收集形成的氧化物基纳米结构(S50); 干燥所收集的氧化物基纳米结构以除去剩余的有机溶液(S60); 并对干燥的氧化物基纳米结构进行热处理(S70)。 该金属含有选自Sc,Ti,Cr,Mn,Fe,Co,Ni,Cu,Zn,Y,Zr,Nb,Mo,Tc,Ru,Rh,Pd Ag,Cd,Hf, Ta,W,Re,Os,Ir,Pt,Au,Hg,镧系元素,锕系元素,Si,Ge,Sn,As,Sb,Bi,Ga和In。 第二有机溶液含有选自甲醇,乙醇,乙二醇,甘油,丙醇,丁醇,苯酚,邻苯二酚,甲酚,连苯三酚和萘酚中的一种。