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公开(公告)号:KR1020100111012A
公开(公告)日:2010-10-14
申请号:KR1020090029361
申请日:2009-04-06
Applicant: 한국표준과학연구원
IPC: H01L21/00
CPC classification number: H01L21/67017 , B01D51/02
Abstract: PURPOSE: An apparatus and a method for collecting contaminated particles using sonic waves are provided to collect, separate, and select the contaminated particles in a semiconductor and display process. CONSTITUTION: An apparatus for collecting contaminated particles using sonic waves includes a discharge pipe(100), a transducer(210), a sonic wave emitting unit(220), and a reflector(300). The discharge pipe includes an inlet(110) and an outlet(120). The transducer generates a sonic wave. The sonic wave emitting unit has a sonic wave emitting surface(220S) separated from the central axis of the discharge pipe in a transverse direction. The reflector has a reflective surface(300S) facing the sonic wave emitting surface from the central axis of the discharge pipe.
Abstract translation: 目的:提供一种使用声波收集污染颗粒的设备和方法,用于在半导体和显示过程中收集,分离和选择污染颗粒。 构成:使用声波收集污染颗粒的装置包括排放管(100),换能器(210),声波发射单元(220)和反射器(300)。 排出管包括入口(110)和出口(120)。 换能器产生声波。 声波发射单元具有在横向上与放电管的中心轴分离的声波发射表面(220S)。 反射器具有从排出管的中心轴线朝向声波发射表面的反射表面(300S)。
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