公开(公告)号：KR1019920001309B1

公开(公告)日：1992-02-10

申请号：KR1019890006260

申请日：1989-05-10

Applicant: 한국표준과학연구원

Inventor： 정명세 ,  우인훈 ,  엄태봉 ,  양상희 ,  임재선

IPC: G01B3/18

Abstract: A correcting device for height micrometer uses laser interference to improve the accuracy and to reduce the correcting time. The said device includes a height micrometer (H) equipped with gage blocks (G)(G') to be corrected, and the micrometer is set on a surface plate (1) with a correcting device (2) sitting opposite to it. The device (2) has a two-stage feeding member (4) moving along the cylindrical column (3) by a step motor (S). The one stage of the feeding member installs a laser reflector (corner cube) (5) moving horizontally by another step motor (S1) and an electric micrometer (E) attaching a measuring hand (6). A laser interferometer (11) is installed on the top of the correcting device.

Abstract translation: 用于高度测微计的校正装置使用激光干涉来提高精度并减少校正时间。 所述装置包括配备有要校正的计量块（G）（G'）的高度千分尺（H），并且千分尺设置在具有与其相对的校正装置（2）的表面板（1）上。 装置（2）具有通过台阶马达（S）沿圆柱体（3）移动的两级进给构件（4）。 馈送部件的一个阶段安装由另一个步进电动机（S1）水平移动的激光反射器（5角）和安装测量手（6）的电动千分表（E）。 激光干涉仪（11）安装在校正装置的顶部。

公开(公告)号：KR100051178B1

公开(公告)日：1992-05-01

申请号：KR1019890006260

申请日：1989-05-10

Applicant: 한국표준과학연구원

Inventor： 정명세 ,  우인훈 ,  엄태봉 ,  양상희 ,  임재선

IPC: G01B3/18

公开(公告)号：KR1019900018637A

公开(公告)日：1990-12-22

申请号：KR1019890006260

申请日：1989-05-10

Applicant: 한국표준과학연구원

Inventor： 정명세 ,  우인훈 ,  엄태봉 ,  양상희 ,  임재선

IPC: G01B3/18

Abstract: 내용 없음