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公开(公告)号：KR1019950026878A
公开(公告)日：1995-10-16
申请号：KR1019940004071
申请日：1994-03-03
Applicant: 한국화학연구원
IPC: C07D498/04
Abstract: 본 발명은 식물병원균에 대하여 우수한 살균활성을 갖는 다음 구조식(I)로 표시되는 신규한 4H, 6H-피롤로[3,4-c]이소옥사졸 유도체와 이를 제조하는 방법에 관한 것이다.
상기식에서, R
1 은 페닐기 또는 할로겐원자나 C
1 ~C
3 알킬기로 치환된 페닐기이고, R
2 는 C
1 ~C
5 알킬기, 페닐기, 치환된 페닐기 또는 C
1 ~C
3 알콕시기이며, 이때 치환된 페닐기의 치환기는 할로겐원자, C
1 ~C
3 알킬기 또는 C
1 ~C
3 알콕시기이다.-
公开(公告)号：KR1019950005734B1
公开(公告)日：1995-05-29
申请号：KR1019920009552
申请日：1992-06-02
Applicant: 한국화학연구원
IPC: C07D498/04
Abstract: The preparation method of isooxazol (I) dervatives which has antifungal activity consists of 1) reacting nitro-olefin and alcohol with basic catalyst to form nitro compounds, 2) dehydrating nitro compounds with triethylamine and phenylisocyanate to form cycles as (I) in benzene or dichlromethane. Derivatives of (I) are R1 = propyl or isopropyl, R2 = H or methyl, R3 = H, methyl, ethyl, phenyl, phenyl chloride, aldehyde, or oxime.
Abstract translation: 具有抗真菌活性的异恶唑（I）衍生物的制备方法包括：1）使硝基烯烃和醇与碱性催化剂反应生成硝基化合物，2）用三乙胺和异氰酸苯酯脱水硝基化合物，形成（I）在苯或 dichlromethane。 （I）的衍生物是R1 =丙基或异丙基，R2 = H或甲基，R3 = H，甲基，乙基，苯基，苯基氯，醛或肟。
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Patent Agency Ranking
公开(公告)号：KR101600428B1
公开(公告)日：2016-03-07
申请号：KR1020140089299
申请日：2014-07-15
CPC classification number: C23F1/30
Abstract: 본발명은유순한혼합산조성물을이용한중이온가속관의나이오븀식각방법에관한것으로서, 더욱상세하게는중이온가속기에적용되는초전도체물질의고순도나이오븀(Nb) 중이온가속관에있어서금속을가공이나가압성형하는공정중에발생된물리적결함을회복시키기위한식각액으로인체및 환경에유순하고, 비점이높은혼합산(Mixed acids)을이용하여화학적식각방법내지는전해연마(Electropolishing) 방법에의해나이오븀(Nb)의물리적결함을회복시킴으로써, 기존에비해환경친화적이고바람직한방법으로가공이가능하도록하는유순한혼합산조성물을이용한중이온가속관의나이오븀(Nb) 식각방법에관한것이다.
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公开(公告)号：KR1020160008899A
公开(公告)日：2016-01-25
申请号：KR1020140089299
申请日：2014-07-15
Abstract: 본발명은유순한혼합산조성물을이용한중이온가속관의나이오븀식각방법에관한것으로서, 더욱상세하게는중이온가속기에적용되는초전도체물질의고순도나이오븀(Nb) 중이온가속관에있어서금속을가공이나가압성형하는공정중에발생된물리적결함을회복시키기위한식각액으로인체및 환경에유순하고, 비점이높은혼합산(Mixed acids)을이용하여화학적식각방법내지는전해연마(Electropolishing) 방법에의해나이오븀(Nb)의물리적결함을회복시킴으로써, 기존에비해환경친화적이고바람직한방법으로가공이가능하도록하는유순한혼합산조성물을이용한중이온가속관의나이오븀(Nb) 식각방법에관한것이다.
Abstract translation: 本发明涉及使用温和混合酸的组合物的重离子腔的铌蚀刻方法，更具体地，涉及使用可以使用温和混合酸的组合物的重离子腔的铌（Nb）蚀刻方法 通过使用对人体和环境温和的混合酸的化学蚀刻方法或电解抛光方法恢复铌（Nb）的物理缺陷，通过与常规方法相比，通过环保和期望的方法促进加工， 具有高沸点，作为恢复在施加到重离子腔的超导体材料的高纯度铌（Nb）重离子腔中的金属的加工或加压过程中产生的物理缺陷的蚀刻剂。
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公开(公告)号：KR100128575B1
公开(公告)日：1997-11-03
申请号：KR1019940004071
申请日：1994-03-03
Applicant: 한국화학연구원
IPC: C07D498/04
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公开(公告)号：KR1019970011394B1
公开(公告)日：1997-07-10
申请号：KR1019940004071
申请日：1994-03-03
Applicant: 한국화학연구원
IPC: C07D498/04
Abstract: Halo alcohol compound is halogenated by trihalophosphate in diethylether as solvent to yield dihalogented compound, thereafter, yielded compound is reacted with amines of R2-NH2 in the presence of base such as sodium carbonate and potassium carbonate in organic solvent such as ethanol, dimethyl formamide and dimethyl sulfoxide to yield compound represented by general formula(I). In general formula(I), R1 represents phenyl group or halogen atoms, R2 represents alkyl group having 1 to 5 of carbon atoms.
Abstract translation: 卤代醇化合物被三乙酸酯在乙醚中作为溶剂卤化，得到二卤化合物，然后在有机溶剂如乙醇，二甲基甲酰胺等有机溶剂如碳酸钠和碳酸钾存在下，使得到的化合物与R2-NH2的胺反应， 二甲基亚砜，得到通式（I）表示的化合物。 通式（I）中，R 1表示苯基或卤原子，R 2表示碳原子数1〜5的烷基。
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公开(公告)号：KR1019900004928B1
公开(公告)日：1990-07-12
申请号：KR1019880006095
申请日：1988-05-24
Applicant: 한국화학연구원
IPC: C07D309/02
Abstract: 2-Oxyamino alkylidene-cyclohexane-1,3-dione derivs. of formula (I) are prepd. by reacting a cpd. of formula (II) with a substd. alkoxy amine or its acid addn. salt of formula H2N-OR4. In the formulas, R and R1 are each H, C1-3 lower alkoxy, OH, acetoxy or halogen; R2 is H; R3 is C2-3 alkyl or alkenyl; R4 is C1-3 lower alkyl or alkenyl. (I) have a good herbicidal effect.
Abstract translation: 2-氧代氨基亚烷基 - 环己烷-1,3-二酮衍生物。 式（I）的化合物是制备的。 通过反应cpd。 式（II）的化合物。 烷氧基胺或其酸加成。 式H2N-OR4的盐。 在式中，R和R 1各自为H，C 1-3低级烷氧基，OH，乙酰氧基或卤素; R2为H; R3是C2-3烷基或烯基; R4是C1-3低级烷基或烯基。 （I）具有良好的除草效果。
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