Abstract:
A method for manufacturing an adhesive sheet according to the present invention is a method for manufacturing an adhesive sheet including a long peeling base material 1 and an adhesive layer 2 provided on the peeling base material 1 in the form of an island, the method including a peeling step of, after laminating a long adhesive layer 2 on the peeling base material 1, peeling off an unnecessary portion 6 of the adhesive layer 2 so that a predetermined portion of the adhesive layer is left on the peeling base material 1 in the form of an island, wherein, in the peeling step, the width W of a narrow portion 8, which is the narrowest in width in a short direction of the unnecessary portion 6 of the adhesive layer 2, is adjusted so that the breaking strength in the narrow portion 8 is 200 g or more.
Abstract:
본 발명의 접착 시트의 제조 방법은, 장척의 박리 기재 (1) 와, 그 박리 기재 (1) 상에 섬상으로 배치된 접착제층 (2) 을 구비하는 접착 시트의 제조 방법으로서, 박리 기재 (1) 상에 장척의 접착제층 (2) 을 적층한 후, 그 접착제층 (2) 의 소정 부분이 박리 기재 (1) 상에 섬상으로 남도록, 그 접착제층 (2) 의 불필요 부분 (6) 을 박리하는 박리 공정을 갖고, 박리 공정에 있어서, 접착제층 (2) 의 불필요 부분 (6) 의 단척 방향의 폭이 가장 좁은 협폭부 (8) 에 있어서의 파단 강도가 200 g 이상이 되도록, 협폭부 (8) 의 폭 (W) 을 조정하는 방법이다.
Abstract:
A dicing/die bonding integral film of the present invention includes a base film, a pressure-sensitive adhesive layer which is formed on the base film and to which a wafer ring for blade dicing is bonded, and a bonding layer formed on the adhesive layer and having a central portion to which a semiconductor wafer to be diced is bonded, wherein a planar shape of the bonding layer is circular, an area of the bonding layer is greater than an area of the semiconductor wafer and smaller than an area of each of the base film and the adhesive layer, and a diameter of the bonding layer is greater than a diameter of the semiconductor wafer and less than an inner diameter of the wafer ring, and a difference in diameter between the bonding layer and the semiconductor wafer is greater than 20 mm and less than 35 mm,
Abstract:
박리기재, 접착층, 점착층 및 기재 필름이 순차 적층된 구성을 갖는 접착시트로서, 상기 접착층은 소정의 제 1의 평면형상을 갖고, 또한, 상기 박리기재 위에 부분적으로 형성되어 있고, 상기 박리기재에는, 상기 제 1의 평면형상의 주변에 따라, 상기 접착층에 접하는 측의 면으로부터 제 1의 절입부가 형성되어 있고, 상기 제 1의 절입부의 칼자국 깊이는, 상기 박리기재의 두께 미만이며, 또한, 25㎛ 이하인 접착시트.
Abstract:
박리기재(10), 기재 필름(14), 및, 박리기재(10)와 기재 필름(14)과의 사이에 배치되는 제 1의 점접착층(12)을 구비하는 접착시트로서, 박리기재(10)에는, 제 1의 점접착층(12)측의 면으로부터 절입부(D)가 환상으로 형성되어 있고, 제 1의 점접착층(12)은, 박리기재(10)에 있어서 상기 절입부(D)의 내측의 면 전체를 덮도록 적층되어 있고, 상기 절입부(D)의 칼자국 깊이(d)는, 박리기재(10)의 두께 미만이며, 또한, 25㎛ 이하인 접착시트.
Abstract:
An adhesive sheet comprising a release substrate 10 , a substrate film 14 , and a first tacky-adhesive layer 12 placed between the release substrate 10 and the substrate film 14 , wherein an annular incision D is formed on the release substrate 10 from the surface of the first tacky-adhesive layer 12 side, the first tacky-adhesive layer 12 is laminated so as to cover the whole inner surface of the incision D in the release substrate 10 , and the incision D has a depth d of less than the thickness of the release substrate 10 and 25 mum or less.
Abstract:
An adhesive sheet is provided with a peeling base material (10), a base material film (14), and a first adhesive layer (12) arranged between the peeling base material (10) and the base material film (14). On the peeling base material (10), an annular cut part (D) is formed from a plane on the side of the first adhesive layer (12). The first adhesive layer (12) is stacked to cover the entire plane on the inner side of the cut part (D) on the peeling base material (10). The cut depth (d) of the cut part (D) is less than the thickness of the peeling base material (10) and is 25mum or less.
Abstract:
An adhesive sheet is provided with a peeling base material (10), a base material film (14), and a first adhesive layer (12) arranged between the peeling base material (10) and the base material film (14). On the peeling base material (10), an annular cut part (D) is formed from a plane on the side of the first adhesive layer (12). The first adhesive layer (12) is stacked to cover the entire plane on the inner side of the cut part (D) on the peeling base material (10). The cut depth (d) of the cut part (D) is less than the thickness of the peeling base material (10) and is 25mum or less.