公开(公告)号：JP2002357781A

公开(公告)日：2002-12-13

申请号：JP2002047783

申请日：2002-02-25

Applicant: 3 D SYSTEMS INC

Inventor： PARTANEN JOUNI P ,  TANG NANSHENG ,  WU XINGKUN

IPC: G03F7/20 ,  B23K26/04 ,  B23K26/06 ,  B23K26/067 ,  B23K26/073 ,  B29C67/00 ,  G02B7/10 ,  G02B27/09 ,  G02B27/40

Abstract: PROBLEM TO BE SOLVED: To provide a easily mountable solid state laser illumination system for stereolithography with which the optimization of characteristics is easily controlled. SOLUTION: The illumination system is provided with the optical system capable of adjusting the size of a light beam and adjusting the focus of the light beam. A spot size control optical system adjusts the overall size of the light beam and separately adjusts the ellipticity of the beam, primarily in one dimension. Light from the spot size control optical system passes to a focus control optical system that controls the overall focus of the light beam and adjusts the astigmatism of the beam by altering the focal position of the light beam in one dimension. The laser system, the spot size control optical system and the focus control optical system are within an enclosure. Actuators under remote control from outside of the enclosure adjust both of the spot size control optical system and the focus control optical system in the thermal environment of the illumination system.