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    Liquid photoreactive composition and method of fabricating structures
    1.
    发明授权
    Liquid photoreactive composition and method of fabricating structures 有权

    公开(公告)号：US10133174B2

    公开(公告)日：2018-11-20

    申请号：US15100577

    申请日：2014-12-01

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Tzu-Chen Lee ,  Robert J. DeVoe ,  Brian K. Nelson ,  Brian J. Gates

    IPC: G03F7/00 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  C08F2/50 ,  G03F7/027 ,  G03F7/031 ,  G03F7/038 ,  C08F222/10

    Abstract: A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.

    MULTI-PHOTON EXPOSURE SYSTEM
    2.
    发明申请
    MULTI-PHOTON EXPOSURE SYSTEM 有权
    多光子曝光系统

    公开(公告)号：US20140092372A1

    公开(公告)日：2014-04-03

    申请号：US14100127

    申请日：2013-12-09

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

    IPC: G03F7/20

    CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

    Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。

    LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES
    3.
    发明申请
    LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES 审中-公开
    液体光电组合物和制造结构的方法

    公开(公告)号：US20160306277A1

    公开(公告)日：2016-10-20

    申请号：US15100577

    申请日：2014-12-01

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Tzu-Chen Lee ,  Robert J. DeVoe ,  Brian K. Nelson ,  Brian J. Gates

    IPC: G03F7/00 ,  G03F7/30 ,  G03F7/20 ,  G03F7/039 ,  G03F7/16

    CPC classification number: G03F7/0037 ,  C08F2/50 ,  C08F2222/1026 ,  G03F7/027 ,  G03F7/031 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2012 ,  G03F7/2053 ,  G03F7/30

    Abstract: A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.

    Abstract translation: 制造结构的方法包括将液体光反应性组合物设置在基材上，将一部分液体光反应性组合物暴露于具有足够强度和波长的激光以通过双光子敏化剂的双光子激发引发聚合， 液体光反应性组合物的一部分由此提供暴露的组合物; 并显影曝光的组合物以提供结构。 液体组合物包括：至少一种可阳离子聚合的聚环氧化物; 至少一种包含可自由基聚合的基团的化合物; 有效量的双光子光引发剂体系，其中组分（a）与组分（b）的重量比为25:75至75:25，包括端值。 双光子光引发剂体系包括双光子敏化剂和芳族鎓盐。 液体光反应性组合物可以含有小于约1重量％的有机溶剂。

    Multiphoton Curing Methods Using Negative Contrast Compositions
    5.
    发明申请
    Multiphoton Curing Methods Using Negative Contrast Compositions 审中-公开
    使用负对比组合的多光子固化方法

    公开(公告)号：US20150030985A1

    公开(公告)日：2015-01-29

    申请号：US14378577

    申请日：2013-02-18

    Applicant: Robert J. DEVOE ,  Tzu-Chen LEE ,  Brian J. GATES ,  3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Robert J. DeVoe ,  Tzu-Chen Lee ,  Brian J. Gates

    IPC: G03F7/20

    CPC classification number: G03F7/2053

    Abstract: The present disclosure relates to multiphoton absorption methods for curing a photocurable composition under conditions wherein negative contrast occurs. The photocurable composition includes a free-radically polymerizable compound. The method is applicable to fabrication of structures with micron-scale dimensions or less.

    Abstract translation: 本发明涉及在发生负对比度的条件下固化可光固化组合物的多光子吸收方法。 光固化性组合物包含可自由基聚合的化合物。 该方法适用于具有微米级尺寸或更小尺寸的结构的制造。

    Multiphoton Imaging Methods in a Scattering and/or Absorbing Medium, and Articles
    6.
    发明申请
    Multiphoton Imaging Methods in a Scattering and/or Absorbing Medium, and Articles 有权

    公开(公告)号：US20220350127A1

    公开(公告)日：2022-11-03

    申请号：US17763763

    申请日：2020-12-02

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Alexander J. Huffman ,  Brian J. Gates ,  Jeremy K. Larsen ,  David A. Ender ,  Gareth A. Hughes ,  James D. Hansen

    IPC: G02B21/33 ,  G02B21/02

    Abstract: The present disclosure provides a multiphoton imaging method. The method includes a) immersing a semi-submersible microscope objective in a liquid medium that is at least one of scattering or absorbing; b) directing laser light through the semi-submersible microscope objective and into the liquid medium in an image-wise manner under conditions such that multiphoton absorption by the multiphoton absorber occurs, and at least partial polymerization of the polymerizable compound occurs resulting in an article; and c) removing uncured polymerizable compound to clean the article. The liquid medium includes a polymerizable compound, a secondary component, and a multiphoton absorber. An article is also provided. The article includes a material defining one or more tortuous or arcuate channels, one or more internal architectural voids, one or more undercuts, one or more perforations, or combinations thereof, at least one of which exhibits a surface roughness of 1.0 micrometer Ra or less.

    Multi-photon exposure system
    10.
    发明授权
    Multi-photon exposure system 有权
    多光子曝光系统

    公开(公告)号：US08885146B2

    公开(公告)日：2014-11-11

    申请号：US14100127

    申请日：2013-12-09

    Applicant: 3M Innovative Properties Company

    Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

    IPC: G03B27/54 ,  G03B27/74 ,  G03F7/20

    CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

    Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。

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