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    MULTI-PHOTON EXPOSURE SYSTEM
    2.
    发明申请
    MULTI-PHOTON EXPOSURE SYSTEM 有权
    多光子曝光系统

    公开(公告)号：US20140092372A1

    公开(公告)日：2014-04-03

    申请号：US14100127

    申请日：2013-12-09

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

    IPC: G03F7/20

    CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

    Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。

    HARDCOATS COMPRISING ALKOXYLATED MULTI (METH)ACRYLATE MONOMERS
    4.
    发明申请
    HARDCOATS COMPRISING ALKOXYLATED MULTI (METH)ACRYLATE MONOMERS 审中-公开
    包含多羟基（甲基）丙烯酸酯单体的硬化剂

    公开(公告)号：US20150132583A1

    公开(公告)日：2015-05-14

    申请号：US14404970

    申请日：2013-07-10

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Richard J. Pokorny ,  Steven D. Solomonson ,  Robert F. Kamrath ,  Anthony M. Renstrom ,  Roger W. Barton ,  Craig R. Sykora

    IPC: C09D135/02 ,  C09D7/12 ,  C08K3/36

    CPC classification number: C09D4/00 ,  C08F2/48 ,  C08F222/1006 ,  C08K3/36 ,  C08K2201/005 ,  C09D7/61 ,  C09D7/67 ,  C09D135/02 ,  G02B1/04 ,  G02B1/14 ,  G03F7/0046 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/0757 ,  G06F3/044 ,  Y10T428/31544

    Abstract: Presently described are hardcoat compositions comprising at least one first (meth)acrylate monomer comprising at least three (meth)acrylate groups and C2-C4 alkoxy repeat units wherein the monomer has a molecular weight per (meth)acrylate group ranging from about 220 to 375 g/mole and at least one second (meth)acrylate monomer comprising at least three (meth)acrylate groups. In one embodiment, the hardcoat composition further comprises and at least 30 wt-% solids of silica nanoparticles having an average particle size ranging from 50 to 150 nm. In another embodiment, the hardcoat composition further comprises and at least 30 wt-% solids of inorganic oxide nanoparticles having an average particle size ranging from 50 to 150 nm. Also described are articles, such as protective films, displays, and touch screens comprising such cured hardcoat compositions.

    Abstract translation: 目前描述的是包含至少一种包含至少三个（甲基）丙烯酸酯基团和C 2 -C 4烷氧基重复单元的至少一种第一（甲基）丙烯酸酯单体的硬涂层组合物，其中该单体具有约220至375的（甲基）丙烯酸酯基团的分子量 g / mol和至少一种包含至少三个（甲基）丙烯酸酯基团的第（甲基）丙烯酸酯单体。 在一个实施方案中，硬涂层组合物还包含平均粒径为50至150nm的二氧化硅纳米颗粒和至少30重量％的固体。 在另一个实施方案中，硬涂层组合物还包含平均粒度范围为50-150nm的无机氧化物纳米颗粒和至少30重量％的固体。 还描述了诸如保护膜，显示器和包含这种固化的硬涂层组合物的触摸屏的制品。

    Multi-photon exposure system
    7.
    发明授权
    Multi-photon exposure system 有权
    多光子曝光系统

    公开(公告)号：US08885146B2

    公开(公告)日：2014-11-11

    申请号：US14100127

    申请日：2013-12-09

    Applicant: 3M Innovative Properties Company

    Inventor： Robert J. DeVoe ,  Brian J. Gates ,  Dean Faklis ,  Robert T. Krasa ,  Przemyslaw P. Markowicz ,  Craig R. Sykora

    IPC: G03B27/54 ,  G03B27/74 ,  G03F7/20

    CPC classification number: G03F7/20 ,  B29C64/135 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70525 ,  G03F7/7085

    Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

    Abstract translation: 曝光系统包括沿着光轴发射能够在树脂中引起多光子反应的光束的光源。 曝光系统还包括进行多光子反应的树脂，以及包括监测器的自动化系统，该监视器测量从垂直于光轴的平面中的功率，脉冲长度，形状，发散度或位置中选择的光束的至少一个性质 。 监视器产生指示光束的属性的至少一个信号，并且子系统响应于来自监视器的信号来调整光束。

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