公开(公告)号：US20200164484A1

公开(公告)日：2020-05-28

申请号：US16636348

申请日：2018-08-02

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Kenneth A.P. Meyer ,  John J. Sullivan ,  Brian W. Lueck ,  Duy K. Lehuu ,  David J. Muradian ,  David F. Slama

IPC: B24B37/26 ,  B24B37/22

Abstract: An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface, a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface defines a wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material defines a displacement plane that is below the base plane or within a tolerance of the top plane.

公开(公告)号：US20220023991A1

公开(公告)日：2022-01-27

申请号：US17297221

申请日：2019-11-22

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Duy K. Lehuu ,  Qin Lin ,  David J. Muradian ,  Samad Javid

IPC: B24B37/22 ,  B24B37/24 ,  B24B37/04

Abstract: A polishing pad includes a polishing layer having a first major surface and a second major surface opposite the first major surface. The polishing pad further includes a subpad, which is coupled to the polishing layer, and has a first major surface and a second major surface opposite the first major surface. At least 50% of the subpad, based on the total surface area of the first major surface of the subpad, is optically transparent.

公开(公告)号：US20250033162A1

公开(公告)日：2025-01-30

申请号：US18717617

申请日：2022-12-28

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Qin Lin ,  Alexander W. Simpson ,  Duy K. Lehuu ,  David J. Muradian ,  Matthew J. Triemert ,  Craig R. Hoff

IPC: B24B37/26

Abstract: Polishing pads include a polishing layer having a thickness and including a polymer having a working surface and a second surface opposite the working surface are described. In particular, polishing pads where the working surface includes a window, a plurality of precisely shaped pored, a plurality of precisely shaped asperities, and a land region are described. The window has a thickness different from the thickness of the polishing layer and includes a fluorinated polymer. The window has at least 20% transmission for any wavelength of light between 200 nm and 800 nm.

公开(公告)号：US12208483B2

公开(公告)日：2025-01-28

申请号：US16636348

申请日：2018-08-02

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Kenneth A. P. Meyer ,  John J. Sullivan ,  Brian W. Lueck ,  Duy K. Lehuu ,  David J. Muradian ,  David F. Slama

IPC: B24B37/26 ,  B24B37/22 ,  B24B37/24 ,  B24D3/28 ,  B24D11/00 ,  B29L31/00 ,  H01L21/304 ,  H01L21/306

Abstract: An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface, a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface defines a wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material defines a displacement plane that is below the base plane or within a tolerance of the top plane.