公开(公告)号：US10308753B2

公开(公告)日：2019-06-04

申请号：US15532881

申请日：2015-12-08

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Yu Yang ,  Jason M. Kehren ,  Yongshang Lu ,  Suresh S. Iyer ,  William M. Lamanna ,  Thomas P. Klun ,  Jeffrey A. Peterson

IPC: C08K5/00 ,  C08K5/19 ,  C08G18/08 ,  C08G18/32 ,  C08G18/38 ,  C08G18/40 ,  C08G18/44 ,  C08G18/48 ,  C08G18/75 ,  C07C219/06 ,  C07C229/30 ,  C07C307/06 ,  C07C311/48 ,  C09D175/04 ,  D06M15/576

Abstract: An ionic diol has formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms; R2 and R3 independently represent alkyl groups having from 1 to 4 carbon atoms; R4 represents an alkylene group having from 2 to 8 carbon atoms; and R5 represents an alkylene group having from 1 to 8 carbon atoms. Antistatic polymers are formed by copolymerization of monomers including a diisocyanate, an ionic diol, a polyether diol, and at least one non-ionic diols. Methods of making the antistatic polyurethanes are also disclosed.

公开(公告)号：US20140154632A1

公开(公告)日：2014-06-05

申请号：US14237193

申请日：2012-08-01

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Jason M. Kehren ,  Patricia M. Savu ,  Matthew J. Pinnow

IPC: G03F7/40

CPC classification number: G03F7/40 ,  G03F7/405 ,  H01L21/0273

Abstract: A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.

Abstract translation: 一种修饰光致抗蚀剂材料的表面的方法，包括将光致抗蚀剂材料暴露于水性离子表面活性剂溶液并改变离子表面活性剂水溶液的pH，直到在光致抗蚀剂材料中或其上形成含氟化合物层。 所述含水离子表面活性剂溶液包括式RfS02NH-R'的全氟烷基磺酰胺，其中Rf = CnF2n + 1-和n = 1-6，R'= -H，-CH3和-CH2CH2OH。 所述离子表面活性剂水溶液的pH值为所述全氟烷基磺酰胺的pKa的约3个pH单位。

公开(公告)号：US11920102B2

公开(公告)日：2024-03-05

申请号：US17795387

申请日：2021-01-21

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Jason M. Kehren ,  David J. Lundberg ,  Zai-Ming Qiu ,  Michael G. Costello ,  Michael J. Bulinski ,  Alexandre R. Monteil

IPC: C10M107/38 ,  C08K5/372 ,  C10M135/08 ,  C10M135/22 ,  C10M169/04 ,  C10N20/00 ,  C10N20/02 ,  C10N40/18

CPC classification number: C10M107/38 ,  C08K5/372 ,  C10M135/08 ,  C10M135/22 ,  C10M169/04 ,  C10M2213/0606 ,  C10M2219/04 ,  C10M2219/082 ,  C10N2020/017 ,  C10N2020/02 ,  C10N2040/18

Abstract: A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

公开(公告)号：US10113023B2

公开(公告)日：2018-10-30

申请号：US15532890

申请日：2015-12-08

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Yu Yang ,  Jason M. Kehren ,  Suresh S. Iyer ,  William M. Lamanna ,  Thomas P. Klun ,  Jeffrey A. Peterson

IPC: C08F220/38

Abstract: Antistatic polymers include divalent segments having the formulas (I) and (II) and wherein R1 represents an alkyl group having from 1 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, R4 represents an alkylene group having from 2 to 8 carbon atoms, and R5 independently represents H or methyl. Methods of making antistatic polymers are also disclosed.

公开(公告)号：US10017713B2

公开(公告)日：2018-07-10

申请号：US15508939

申请日：2015-09-10

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： William M. Lamanna ,  Patricia M. Savu ,  Jason M. Kehren ,  Liping Claryn Ng ,  Namiko Ikegaya

IPC: C11D3/43 ,  C11D1/00 ,  B08B3/08 ,  B08B3/02 ,  B08B5/02 ,  C07C311/09

CPC classification number: C11D1/002 ,  B08B3/02 ,  B08B3/08 ,  B08B5/02 ,  C07C311/09 ,  C11D1/004 ,  C11D3/43 ,  G03F7/426

Abstract: A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R1 and R2 is independently H or CH3, n is 1-3, and x is 1-3.

公开(公告)号：US20170362362A1

公开(公告)日：2017-12-21

申请号：US15532890

申请日：2015-12-08

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Yu Yang ,  Jason M. Kehren ,  Suresh S. Iyer ,  William M. Lamanna ,  Thomas P. Klun ,  Jeffrey A. Peterson

IPC: C08F220/38

CPC classification number: C08F220/38 ,  C08F220/34 ,  C08F2220/387 ,  C08F220/06

Abstract: Antistatic polymers include divalent segments having the formulas (I) and (II) and wherein R1 represents an alkyl group having from 1 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, R4 represents an alkylene group having from 2 to 8 carbon atoms, and R5 independently represents H or methyl. Methods of making antistatic polymers are also disclosed.

公开(公告)号：US20170355794A1

公开(公告)日：2017-12-14

申请号：US15532856

申请日：2015-12-04

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Yu Yang ,  Jason M. Kehren ,  Suresh S. Iyer ,  William M. Lamanna ,  Thomas P. Klun ,  Jeffrey A. Peterson

IPC: C08F210/02

CPC classification number: C08F210/02 ,  C09D123/0869

Abstract: Antistatic polymers include divalent segments represented by the formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms, R2 and R3 represent alkyl groups having from 1 to 4 carbon atoms, and R4 represents an alkylene group having from 2 to 8 carbon atoms. Methods of making antistatic polymers are also disclosed.

公开(公告)号：US20230056641A1

公开(公告)日：2023-02-23

申请号：US17795387

申请日：2021-01-21

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Jason M. Kehren ,  David J. Lundberg ,  Zai-Ming Qiu ,  Michael G. Costello ,  Michael J. Bulinski ,  Alexandre R. Monteil

IPC: C10M107/38 ,  C10M135/08 ,  C10M169/04

Abstract: A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

公开(公告)号：US20170355805A1

公开(公告)日：2017-12-14

申请号：US15532881

申请日：2015-12-08

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Yu Yang ,  Jason M. Kehren ,  Yongshang Lu ,  Suresh S. Iyer ,  William M. Lamanna ,  Thomas P. Klun ,  Jeffrey A. Peterson

IPC: C08G18/08 ,  C08G18/44 ,  C07C229/30 ,  C07C307/06 ,  C08G18/75 ,  C08G18/32 ,  C08G18/38

CPC classification number: C08G18/0814 ,  C07C219/06 ,  C07C229/30 ,  C07C307/06 ,  C07C311/48 ,  C08G18/3206 ,  C08G18/3819 ,  C08G18/3861 ,  C08G18/4018 ,  C08G18/44 ,  C08G18/4833 ,  C08G18/758 ,  C08K5/0075 ,  C08K5/19 ,  C09D175/04 ,  D06M15/576

Abstract: An ionic diol has formula wherein R1 represents an alkyl group having from 6 to 18 carbon atoms; R2 and R3 independently represent alkyl groups having from 1 to 4 carbon atoms; R4 represents an alkylene group having from 2 to 8 carbon atoms; and R5 represents an alkylene group having from 1 to 8 carbon atoms. Antistatic polymers are formed by copolymerization of monomers including a diisocyanate, an ionic diol, a polyether diol, and at least one non-ionic diols. Methods of making the antistatic polyurethanes are also disclosed.

公开(公告)号：US20170114308A1

公开(公告)日：2017-04-27

申请号：US15398804

申请日：2017-01-05

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： William M. Lamanna ,  Patricia M. Savu ,  Jason M. Kehren

IPC: C11D11/00 ,  G03F7/42 ,  C11D1/00

CPC classification number: C11D11/0047 ,  C07C303/36 ,  C07C311/00 ,  C08F14/18 ,  C08F290/062 ,  C08F290/065 ,  C11D1/004 ,  C11D1/83 ,  G03F7/40 ,  G03F7/42 ,  G03F7/426

Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—(CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: RfSO2N[CH2CH(CH3)OH]2;  (a) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6;  (b) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or  (c) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.  (d)