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1.发明申请HIGH-LOADING-LEVEL COMPOSITES FOR ELECTROMAGNETIC INTERFERENCE (EMI) APPLICATIONS 审中-公开用于电磁干扰（EMI）应用的高负载级复合材料
公开(公告)号：WO2018081407A1
公开(公告)日：2018-05-03
申请号：PCT/US2017/058504
申请日：2017-10-26
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： WEST, Don V. , LINDSAY, Craig W. , ISAACSON, Daniel E. , FREY, Matthew H.
IPC: H05K9/00
Abstract: Electromagnetic interference (EMI) shielding composites with high-loading-level ceramic beads and methods of making and using the same are described. The composites include high-loading-level of ceramic beads distributed inside a polymer matrix. The ceramic beads have a substantially spherical shape. The ceramic beads are formed by melting ceramic powders or particles. In some cases, the ceramic beads include ferrite beads.
Abstract translation: 描述了具有高负载水平的陶瓷珠的电磁干扰（EMI）屏蔽复合材料及其制造和使用方法。 这种复合材料包括分布在聚合物基体内的高负载水平的陶瓷珠。 陶瓷珠具有基本上球形的形状。 陶瓷珠通过熔化陶瓷粉末或颗粒而形成。 在某些情况下，陶瓷珠包括铁氧体珠。
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公开(公告)号：WO2018080784A1
公开(公告)日：2018-05-03
申请号：PCT/US2017/055940
申请日：2017-10-10
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： ECKEL, Joseph B. , NEINABER, Aaron K. , ADEFRIS, Negus B. , JESME, Ronald D. , NELSON, Thomas J. , WEST, Don V.
Abstract: A bonded abrasive wheel comprises magnetizable abrasive particles retained in an organic binder. The bonded abrasive wheel has a central portion adjacent to a central hub, an outer circumference and a rotational axis extending through the central hub. The magnetizable abrasive particles adjacent to the central hub are aligned at an average angle of less than 35 degrees with respect to the rotational axis, and the magnetizable abrasive particles adjacent to the outer circumference of the bonded abrasive wheel are aligned at an average angle that is from 35 and 90 degrees, inclusive, with respect to the rotational axis. Methods of making a bonded abrasive wheel are also disclosed.
Abstract translation: 粘结的磨轮包括保持在有机粘合剂中的可磁化磨粒。 粘结的磨轮具有邻近中心毂的中心部分，外圆周和延伸穿过中心毂的旋转轴线。 与中心轮毂相邻的可磁化磨粒相对于旋转轴线以小于35度的平均角度对齐，并且与粘合磨轮的外周边相邻的可磁化磨粒以平均角度 从35度和90度（包括端点）相对于旋转轴线。 还公开了制造粘结磨轮的方法。
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3.发明申请FUNCTIONAL ABRASIVE PARTICLES, ABRASIVE ARTICLES, AND METHODS OF MAKING THE SAME 审中-公开功能磨料颗粒，磨料制品及其制备方法
公开(公告)号：WO2018080756A1
公开(公告)日：2018-05-03
申请号：PCT/US2017/055360
申请日：2017-10-05
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： ECKEL, Joseph B. , NIENABER, Aaron K. , LIU, Yuyang , WEST, Don V.
IPC: C09K3/14
Abstract: A functional abrasive particle comprises a ceramic body having at least one hole extending therethrough. A functional material is at least partially disposed within the hole. The functional material contains a binder and functional particles that are magnetizable, metallic, or both. Methods of making functional abrasive particles, and abrasive articles including them are also disclosed.
Abstract translation: 功能磨料颗粒包括具有至少一个贯穿其中的孔的陶瓷体。 功能材料至少部分地设置在孔内。 功能材料包含粘合剂和可磁化的金属或两者的功能颗粒。 还公开了制造功能磨料颗粒的方法和包括它们的磨料制品。
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公开(公告)号：WO2020188340A1
公开(公告)日：2020-09-24
申请号：PCT/IB2019/058441
申请日：2019-10-03
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： BROOKS, Brian E. , BENOIT, Gilles J. , OLSON, Peter O. , OLSON, Tyler W. , NAYAR, Himanshu , ARSENAULT, Frederick J. , JOHNSON, Nicholas A. , LEATHERDALE, Catherine A. , WEST, Don V.
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for optimizing parameters of one or more proportional-integral-derivative (PID) controllers. In one aspect, the method comprises repeatedly performing the following: i) selecting a configuration of respective PID parameters for each of the plurality of PID controllers, based on a causal model that measures causal relationships between PID parameters and a measure of success in controlling the system; ii) determining the measure of success of the configuration of respective PID parameters for the plurality of PID controllers in controlling the system; and iii) adjusting, based on the measure of success of the configuration of respective PID parameters for the plurality of PID controllers in controlling the system, the causal model.
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公开(公告)号：WO2018081044A1
公开(公告)日：2018-05-03
申请号：PCT/US2017/057976
申请日：2017-10-24
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： MILLER, Adam D. , MANUILOV, Sergei , JING, Naiyong , SKORINA, Taisiya , NIENABER, Aaron K. , ECKEL, Joseph B. , ANDERSON, Thomas J. , NELSON, Thomas J. , LUKOWSKI, Mark A. , MOREN, Louis S. , WEST, Don V.
Abstract: Magnetizable abrasive particles are described comprising ceramic particles having outer surfaces comprising a coating of unsintered polyion and magnetic particles bonded to the polyion. In favored embodiments, the magnetic particles have a magnetic saturation of at least 10, 15, 20, 25, 30, 35, 40, 45 or 50 emu/gram. In another embodiment, an abrasive article is described comprising a plurality of magnetizable abrasive particles as described herein retained in a binder material. Also described are method of making magnetizable abrasive particles and methods of making an abrasive article comprising magnetizable abrasive particles.
Abstract translation: 描述了包含陶瓷颗粒的可磁化研磨颗粒，所述陶瓷颗粒的外表面包含未烧结的聚离子的涂层和结合到所述聚离子的磁性颗粒。 在有利的实施方案中，磁性颗粒具有至少10,15,20,25,30,35,40,45或50emu /克的磁饱和度。 在另一个实施例中，描述了一种磨料制品，其包括保持在粘合剂材料中的如本文所述的多个可磁化磨料颗粒。 还描述了制造可磁化研磨颗粒的方法和制造包含可磁化研磨颗粒的研磨制品的方法。
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Patent Agency Ranking
公开(公告)号：WO2020188338A1
公开(公告)日：2020-09-24
申请号：PCT/IB2019/058438
申请日：2019-10-03
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： BROOKS, Brian E. , BENOIT, Gilles J. , OLSON, Peter O. , OLSON, Tyler W. , NAYAR, Himanshu , ARSENAULT, Frederick J. , JOHNSON, Nicholas A. , LARAIA, Vincent J. , WEST, Don V.
IPC: G05B13/04 , H01L21/304 , B24B37/005
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for optimizing a process of polishing semiconductor wafers. In one aspect, the method comprises repeatedly performing the following: i) selecting a configuration of input settings for polishing a semiconductor wafer, based on a causal model that measures current causal relationships between input settings and a quality of semiconductor wafers; ii) receiving a measure of the quality of the semiconductor wafer polished with the configuration of input settings; and iii) adjusting, based on the measure of the quality of the semiconductor wafer polished with the configuration of input settings, the causal model.
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公开(公告)号：WO2018080799A1
公开(公告)日：2018-05-03
申请号：PCT/US2017/056266
申请日：2017-10-12
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： NIENABER, Aaron K. , ECKEL, Joseph B. , ANDERSON, Thomas J. , NELSON, Thomas J. , LUKOWSKI, Mark A. , MOREN, Louis S. , WEST, Don V.
IPC: C09K3/14
Abstract: A method of making magnetizable abrasive particles includes: moistening the outer surfaces of ceramic particles with waterglass to provide moistened ceramic particles. Magnetizable particles are contacted with the moistened ceramic particles to provide powder-coated ceramic particles. The powder-coated ceramic particles are heated to at least a temperature sufficient to bond the magnetizable particles of the powder-coated ceramic particles to the respective ceramic particles thereby providing the magnetizable abrasive particles. On a respective basis, each magnetizable abrasive particle comprises a respective ceramic particle having a magnetizable particles bonded thereto.
Abstract translation: 制造可磁化研磨颗粒的方法包括：用水玻璃润湿陶瓷颗粒的外表面以提供湿润的陶瓷颗粒。 可磁化颗粒与湿润的陶瓷颗粒接触以提供粉末涂覆的陶瓷颗粒。 粉末涂覆的陶瓷颗粒被加热到至少足以将粉末涂覆的陶瓷颗粒的可磁化颗粒与各自的陶瓷颗粒结合的温度，由此提供可磁化磨料颗粒。 在相应的基础上，每个可磁化磨料颗粒包括具有与其结合的可磁化颗粒的相应陶瓷颗粒。
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公开(公告)号：EP3532562A1
公开(公告)日：2019-09-04
申请号：EP17865690.6
申请日：2017-10-12
Applicant: 3M Innovative Properties Company
Inventor： NIENABER, Aaron K. , ECKEL, Joseph B. , ANDERSON, Thomas J. , NELSON, Thomas J. , LUKOWSKI, Mark A. , MOREN, Louis S. , WEST, Don V.
IPC: C09K3/14
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公开(公告)号：EP3938849A1
公开(公告)日：2022-01-19
申请号：EP19919847.4
申请日：2019-10-03
Applicant: 3M Innovative Properties Company
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公开(公告)号：EP3532560A1
公开(公告)日：2019-09-04
申请号：EP17864453.0
申请日：2017-10-05
Applicant: 3M Innovative Properties Company
Inventor： ECKEL, Joseph B. , NIENABER, Aaron K. , LIU, Yuyang , WEST, Don V.
IPC: C09K3/14
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