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公开(公告)号：US20250031295A1
公开(公告)日：2025-01-23
申请号：US18604243
申请日：2024-03-13
Applicant: 6K Inc.
Inventor： Zongren Shang , Michael C. Kozlowski
Abstract: Some embodiments herein are directed to devices and methods for automatically starting a plasma utilizing a wand. In some embodiments, the wand may be used to start a plasma in a plasma torch such as, for example, a microwave plasma torch or an induction plasma torch, as discussed below. The wand may comprise an elongate, hollow wand member comprising a closed distal end, a proximal end, and one or more apertures extending from a hollow interior of the wand member to an exterior surface of the wand member; and an elongate wire member positioned within the hollow interior of the wand member and extending along at least a portion of a length of the wand member, wherein the wire member is configured to be placed in operable communication through the aperture with a power source, such that the power source can be activated to in turn start the plasma within the plasma torch. The plasma torches discussed herein may be used in various applications including, for example, high volume synthesis of advanced materials such as nano-materials, micro-powders, coatings, alloy compositions for additive manufacturing.
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公开(公告)号：US20250014869A1
公开(公告)日：2025-01-09
申请号：US18765824
申请日：2024-07-08
Applicant: 6K Inc.
Inventor： Michael C. Kozlowski , Michael Resnick , Pawel Matys
IPC: H01J37/32
Abstract: Disclosed herein are systems, methods, and devices processing feed material utilizing an upstream swirl module and composite gas flows. Some embodiments are directed to a microwave plasma apparatus for processing a material, comprising: a first flow module, a second flow module, and a liner.
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公开(公告)号：US20210129216A1
公开(公告)日：2021-05-06
申请号：US17102244
申请日：2020-11-23
Applicant: 6K Inc.
Inventor： John Barnes , Aaron Bent , Kamal Hadidi , Makhlouf Redjdal , Scott Turchetti , Saurabh Ullal , Ning Duanmu , Michael C. Kozlowski
Abstract: Disclosed herein are embodiments of methods, devices, and assemblies for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertains to scrap materials, dehydrogenated or non-hydrogenated feed material, and recycled used powder. Microwave plasma processing can be used to spheroidize and remove contaminants. Advantageously, microwave plasma processed feedstock can be used in various applications such as additive manufacturing or powdered metallurgy (PM) applications that require high powder flowability.
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公开(公告)号：US11963287B2
公开(公告)日：2024-04-16
申请号：US17448135
申请日：2021-09-20
Applicant: 6K Inc.
Inventor： Zongren Shang , Michael C. Kozlowski
CPC classification number: H05H1/30 , B23K10/006 , B33Y40/10
Abstract: Some embodiments herein are directed to devices and methods for automatically starting a plasma utilizing a wand. In some embodiments, the wand may be used to start a plasma in a plasma torch such as, for example, a microwave plasma torch or an induction plasma torch, as discussed below. The wand may comprise an elongate, hollow wand member comprising a closed distal end, a proximal end, and one or more apertures extending from a hollow interior of the wand member to an exterior surface of the wand member; and an elongate wire member positioned within the hollow interior of the wand member and extending along at least a portion of a length of the wand member, wherein the wire member is configured to be placed in operable communication through the aperture with a power source, such that the power source can be activated to in turn start the plasma within the plasma torch. The plasma torches discussed herein may be used in various applications including, for example, high volume synthesis of advanced materials such as nano-materials, micro-powders, coatings, alloy compositions for additive manufacturing.
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公开(公告)号：US11273491B2
公开(公告)日：2022-03-15
申请号：US16827322
申请日：2020-03-23
Applicant: 6K Inc.
Inventor： John Barnes , Aaron Bent , Kamal Hadidi , Makhlouf Redjdal , Scott Turchetti , Saurabh Ullal , Ning Duanmu , Michael C. Kozlowski
Abstract: Disclosed herein are embodiments of methods, devices, and assemblies for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertains to scrap materials, dehydrogenated or non-hydrogenated feed material, and recycled used powder. Microwave plasma processing can be used to spheroidize and remove contaminants. Advantageously, microwave plasma processed feedstock can be used in various applications such as additive manufacturing or powdered metallurgy (PM) applications that require high powder flowability.
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Patent Agency Ranking
6.发明授权公开(公告)号：US12094688B2
公开(公告)日：2024-09-17
申请号：US18451720
申请日：2023-08-17
Applicant: 6K Inc.
Inventor： Michael C. Kozlowski , Ed Petersen , John Colwell , Anthony Andrew
IPC: H01J37/32
CPC classification number: H01J37/32201 , H01J37/3244 , H01J37/32477 , H01J37/32642 , H01J2237/327
Abstract: Disclosed herein are systems, methods, and devices processing feed material utilizing a microwave plasma apparatus comprising a powder ingress preventor (PIP). In some embodiments, the microwave plasma apparatus comprises a core plasma tube and a liner; and a ring structure comprising: a bearing surface, the bearing surface contacting an interior diameter of the core plasma tube; and an opening, the opening contacting an outer diameter of the liner.
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7.发明公开公开(公告)号：US20240071725A1
公开(公告)日：2024-02-29
申请号：US18451720
申请日：2023-08-17
Applicant: 6K Inc.
Inventor： Michael C. Kozlowski , Ed Petersen , John Colwell , Anthony Andrew
IPC: H01J37/32
CPC classification number: H01J37/32201 , H01J37/3244 , H01J37/32477 , H01J37/32642 , H01J2237/327
Abstract: Disclosed herein are systems, methods, and devices processing feed material utilizing a microwave plasma apparatus comprising a powder ingress preventor (PIP). In some embodiments, the microwave plasma apparatus comprises a core plasma tube and a liner; and a ring structure comprising: a bearing surface, the bearing surface contacting an interior diameter of the core plasma tube; and an opening, the opening contacting an outer diameter of the liner.
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8.发明公开公开(公告)号：US20240057245A1
公开(公告)日：2024-02-15
申请号：US18492507
申请日：2023-10-23
Applicant: 6K Inc.
Inventor： Michael C. Kozlowski , John Colwell , Richard K. Holman , Saurabh Ullal
CPC classification number: H05H1/30 , C23C4/134 , H05H2242/24 , H05H1/02
Abstract: The embodiments disclosed herein are directed to systems and devices which utilize multiple microwave plasmas can be used to increase the efficiency of traditional single microwave plasma systems. Disclosed herein is a microwave plasma apparatus for processing materials which includes a reaction chamber, a plurality of microwave plasma applicators in communication with the reaction chamber, one or more microwave radiation sources, at least one waveguide for guiding microwave radiation from the one or more microwave radiations sources to multiple plasma applicators, and a material feeding system in communication with the reaction chamber.
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公开(公告)号：US12040162B2
公开(公告)日：2024-07-16
申请号：US18330602
申请日：2023-06-07
Applicant: 6K Inc.
Inventor： Michael C. Kozlowski , Michael Resnick , Pawel Matys
IPC: H01J37/32
CPC classification number: H01J37/32449 , H01J37/32201
Abstract: Disclosed herein are systems, methods, and devices processing feed material utilizing an upstream swirl module and composite gas flows. Some embodiments are directed to a microwave plasma apparatus for processing a material, comprising: a first flow module, a second flow module, and a liner.
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10.发明公开公开(公告)号：US20230247751A1
公开(公告)日：2023-08-03
申请号：US18159643
申请日：2023-01-25
Applicant: 6K Inc.
Inventor： Michael C. Kozlowski , John Colwell , Richard K. Holman , Saurabh Ullal
Abstract: The embodiments disclosed herein are directed to systems and devices which utilize multiple microwave plasmas can be used to increase the efficiency of traditional single microwave plasma systems. Disclosed herein is a microwave plasma apparatus for processing materials which includes a reaction chamber, a plurality of microwave plasma applicators in communication with the reaction chamber, one or more microwave radiation sources, at least one waveguide for guiding microwave radiation from the one or more microwave radiations sources to multiple plasma applicators, and a material feeding system in communication with the reaction chamber.
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