公开(公告)号：EP2927216A4

公开(公告)日：2016-04-20

申请号：EP13859004

申请日：2013-11-27

Applicant: ADEKA CORP

Inventor： YANAGISAWA SATOSHI ,  FUJITA SHOHEI ,  MINAMISHIMA TAKUYA ,  SHIGENO KOICHI

IPC: C07D221/14 ,  C09K3/00 ,  G03F7/004

CPC classification number: C07D221/14 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0385

Abstract: Provided are: a compound which shows large absorption for light having a wavelength of 365 nm and has good acid generation rate; and a photoacid generator, cationic polymerization initiator, resist composition and cationically polymerizable composition that use the compound. The sulfonic acid derivative compound of the present invention is characterized by being represented by the following Formula (I): (wherein, X represents a linear or branched alkyl group having 1 to 14 carbon atoms; and R represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, an aryl group having 7 to 20 carbon atoms which is substituted with an acyl group, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, 10-camphoryl group or a group represented by the following Formula (II), which aliphatic hydrocarbon group, aryl group, arylalkyl group or alicyclic hydrocarbon group is unsubstituted or substituted with a group selected from a halogen atom, a halogenated alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 18 carbon atoms and an alkylthio group having 1 to 18 carbon atoms).