公开(公告)号：KR20200127155A

公开(公告)日：2020-11-10

申请号：KR20207020477

申请日：2019-02-25

Applicant: ADEKA CORP

Inventor： TAKENOUCHI HIROMI ,  YOKOMIZO TOMOFUMI ,  SHINANO HIROKATSU ,  KAKIAGE KENJI ,  NOHARA YUTA ,  AOYAMA YOHEI

IPC: H01M4/60 ,  C08F8/34 ,  H01M10/052

Abstract: 본발명의과제는큰 충방전용량을가지고, 초회효율이높으며, 사이클특성및 레이트특성이뛰어난비수전해질이차전지에알맞게사용되는전극활물질을제공하는것에있다. 본발명은나트륨과칼륨함량의합계가 100질량ppm~1000질량ppm인유기황계전극활물질, 이것을전극활물질로하는이차전지용전극및 상기전극을가지는비수전해질이차전지이다. 상기유기황계전극활물질은추가로철 함량이 1질량ppm~20질량ppm인것이바람직하다. 또한, 상기유기황계전극활물질은황변성폴리아크릴로니트릴이며, 황함량이 25질량%~60질량%인것이바람직하다.

公开(公告)号：KR20200135301A

公开(公告)日：2020-12-02

申请号：KR20207022550

申请日：2019-03-26

Applicant: ADEKA CORP

Inventor： KAKIAGE KENJI ,  AOYAMA YOHEI ,  TAKENOUCHI HIROMI ,  NOHARA YUTA

IPC: H01M4/137 ,  H01M4/02 ,  H01M4/60 ,  H01M10/052 ,  H01M10/44

Abstract: 본발명은황변성폴리아크릴로니트릴을활물질로하는음극을가지는리튬이온이차전지로서, 음극의충전하한전위가 0.1V(vs.Li/Li+) 이상이고 1.0V(vs.Li/Li+) 미만인리튬이온이차전지이다. 또한본 발명은황변성폴리아크릴로니트릴을활물질로하는음극을가지는리튬이온이차전지로서, 음극의충전하한전위를적어도 0.1V(vs.Li/Li+)이고 1.0V(vs.Li/Li+) 미만으로하는리튬이온이차전지의작동방법이다. 황변성폴리아크릴로니트릴의황 함유량이 25질량%∼60질량%인것이바람직하다.

公开(公告)号：JP2012237854A

公开(公告)日：2012-12-06

申请号：JP2011106297

申请日：2011-05-11

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： TAKENOUCHI HIROMI ,  OMI JUNICHI

IPC: G03F7/023 ,  C07F7/18 ,  C07F7/21 ,  C08G77/16 ,  C08G77/38 ,  C08G77/50 ,  G03F7/075 ,  G03F7/40 ,  H01L21/027

CPC classification number: C07F7/21 ,  C08G77/045 ,  C08G77/12 ,  C08G77/38 ,  C08G77/80 ,  C09D183/04 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/0757 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive composition showing excellent heat resistance and chemical resistance after subjected to high temperature thermal history and having little film reduction during development and a large development margin in a developing process.SOLUTION: The positive photosensitive composition includes: (A) a silanol group-containing polysiloxane compound comprising a structure obtained by a hydrolysis and condensation reaction of a compound expressed by formula (1) with a compound expressed by formula (2); (B) a compound having at least two epoxy-containing organic groups; (C) diazonaphthoquinones; and (D) an organic solvent. In formula (1), Rrepresents an alkyl group having 1 to 4 carbon atoms, or the like; Rrepresents a divalent hydrocarbon group having 2 to 10 carbon atoms; Rrepresents a divalent saturated aliphatic hydrocarbon group having 2 to 10 carbon atoms; and X represents a group expressed by a specified general formula.

Abstract translation: 要解决的问题：提供一种在经历高温热历史之后显示出优异的耐热性和耐化学性，并且在显影过程中几乎没有膜还原和在显影过程中具有大的显影余量的正性光敏组合物。 正光敏组合物包括：（A）含有通过式（1）表示的化合物与式（2）表示的化合物的水解和缩合反应获得的结构的含硅烷醇基的聚硅氧烷化合物; （B）具有至少两个含环氧基的有机基团的化合物; （C）重氮萘醌; 和（D）有机溶剂。 式（1）中，R 1表示碳原子数1〜4的烷基等， R 2表示具有2〜10个碳原子的二价烃基; R 2表示碳原子数2〜10的二价饱和脂肪族烃基， X表示由规定的通式表示的基团。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010101957A

公开(公告)日：2010-05-06

申请号：JP2008270972

申请日：2008-10-21

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： SAITO SEIICHI ,  MORITA HIROSHI ,  TAKENOUCHI HIROMI ,  KOBAYASHI JUN ,  OMI JINICHI

IPC: G03F7/075 ,  C08G77/16 ,  G02F1/1333 ,  G03F7/023 ,  G03F7/40 ,  H01L21/027 ,  H01L51/50 ,  H05B33/22

CPC classification number: G03F7/0757 ,  C08G77/16 ,  C08G77/18 ,  G03F7/0233 ,  G03F7/40 ,  H05B33/10 ,  H05B33/22

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is excellent in transparency and provides a permanent resist having such high heat resistance and chemical resistance after high-heat history that it is also used as an insulating film above an active matrix substrate, a permanent resist using the positive photosensitive composition and a method for producing the same. SOLUTION: The positive photosensitive composition includes (A) a silicone resin having at least two groups per molecule represented by general formula (1) (wherein, R 1 denotes a 1-10C alkylene group which may have a substituted hydrocarbon group, R 2 denotes a 1-4C alkyl group, a denotes an integer of 0 or 1-4, b denotes an integer of 1-3, and a+b does not exceed 5), (B) a siloxane compound having a glycidyl group, (C) diazonaphthoquinones and (D) an organic solvent. The permanent resist is produced by applying the positive photosensitive composition on a substrate and subjecting the resulting coating to exposure, alkali development and post-bake at 120-350°C. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供透明性优异的正性感光性组合物，并且在高热历史之后提供具有如此高的耐热性和耐化学性的永久性抗蚀剂，它也用作有源矩阵上的绝缘膜 基板，使用正性感光性组合物的永久抗蚀剂及其制造方法。 正光敏组合物包括（A）每分子具有至少两个由通式（1）表示的基团的有机硅树脂（其中，R SP 1表示1-10C亚烷基，其中， 可以具有取代的烃基，R 2是表示1-4C的烷基，a表示0或1-4的整数，b表示1-3的整数，a + b不是 超过5），（B）具有缩水甘油基的硅氧烷化合物，（C）重氮萘醌和（D）有机溶剂。 永久抗蚀剂通过将正性感光性组合物涂布在基材上并使所得涂层在120-350℃下进行曝光，碱显影和后烘烤来制造。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012113161A

公开(公告)日：2012-06-14

申请号：JP2010262741

申请日：2010-11-25

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MORITA HIROSHI ,  TAKENOUCHI HIROMI ,  KOBAYASHI JUN ,  OMI JUNICHI

IPC: G03F7/023 ,  C07F7/18 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition suitable for the formation of an interlayer insulating film having high heat resistance, high solvent resistance, high transmittance and a low dielectric constant, and having a large development margin that allows formation of a favorable pattern even when a developing time exceeds the optimal developing time in a developing process.SOLUTION: A positive photosensitive resin composition contains a polysiloxane compound having a carboxyl group and/or a phenolic hydroxyl group as a base resin, a photosensitive diazoquinone compound as a photosensitive component, and an organic solvent, into which an epoxy siloxane compound is incorporated. The epoxy siloxane compound comprises groups of a cyclic siloxane structure having an epoxy group connected via a residue of a compound having 2 to 4 vinyl groups per molecular from which the vinyl groups are removed.

Abstract translation: 要解决的问题：提供适合于形成具有高耐热性，高耐溶剂性，高透射率和低介电常数的层间绝缘膜的正型感光性树脂组合物，并且具有允许形成的大的显影边缘 即使在显影时间超过显影过程中的最佳显影时间的情况下也是有利的。 解决方案：正性感光性树脂组合物含有具有羧基和/或酚羟基作为基础树脂的聚硅氧烷化合物，作为感光性成分的感光性重氮醌化合物和有机溶剂，环氧硅氧烷化合物 被纳入。 环氧硅氧烷化合物包含环状硅氧烷结构的基团，其环氧基通过除去乙烯基的每个分子的具有2-4个乙烯基的化合物的残基连接。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010252631A

公开(公告)日：2010-11-11

申请号：JP2009102828

申请日：2009-04-21

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： TAKENOUCHI HIROMI ,  TANIOKA ASUKA ,  SAITO SEIICHI ,  KOIKE SEIJI ,  SUMITOMO KEIKO ,  ARAKAWA TAKAHIRO ,  YAMAGUCHI YOSHINORI

IPC: C12M3/00

CPC classification number: C12M23/20 ,  C12M25/06

Abstract: PROBLEM TO BE SOLVED: To provide a cell culture substrate having high cellular adhesiveness, enabling normal-temperature preservation and long-term preservation, and fine processing in a micro- or nano-scale. SOLUTION: The cell culture substrate has a silicone resin having a group represented by general formula (1) and/or a group represented by general formula (2) and formed on the surface. In the formulas, R 1 is 1-10C alkylene which may have substituted hydrocarbon; R 2 is 1-4C alkyl; (a) is a number of 0 or 1-4; (b) is a number of 1-3, with the proviso that (a+b) does not exceed 5; R 3 is 1-10C alkylene which may have substituted hydrocarbon; R 4 is 1-4C alkyl; (c) is a number of 0 or 1-4; and (d) is a number of 1-3, with the proviso that (c+d) does not exceed 5. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高细胞粘附性，能够进行常温保存和长期保存的细胞培养基质，以及微米级或纳米级的精细加工。 解决方案：细胞培养基底具有由通式（1）表示的基团和/或由通式（2）表示的基团的表面形成的基团的有机硅树脂。 在式中，R 1是具有取代烃的1-10C亚烷基; R 2是1-4C烷基; （a）是0或1-4的数字; （b）为1-3，条件是（a + b）不超过5; R 3是具有取代烃的1-10C亚烷基; R 4是烷基; （c）是0或1-4的数; （d）为1-3，条件是（c + d）不超过5.版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013256587A

公开(公告)日：2013-12-26

申请号：JP2012133191

申请日：2012-06-12

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： TAKENOUCHI HIROMI ,  MATSUMOTO TAKUYA ,  SUEYOSHI TAKASHI

IPC: C08J5/18 ,  C08L83/05 ,  C08L83/07

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition capable of obtaining the corresponding cured product with hardness and adhesiveness, and supressed in development of debonding and cracks even if heated to 260°C as a lead-free solder reflow temperature, thus maintaining its own adhesiveness.SOLUTION: A curable composition comprises: (A) a siloxane compound having in the molecule at least three SiH groups; (B) a siloxane compound having in the molecule at least two alkenyl groups reactive with SiH group; and (C) a hydrosilylating catalyst. In this curable composition, the molar ratio of the SiH groups to the alkenyl groups reactive with the SiH groups is 2-15; and the excess amount of the content of the SiH groups based on that of the alkenyl groups reactive with the SiH groups is at least 2 mmol/g.

Abstract translation: 要解决的问题：提供一种能够获得相应的硬化和粘合性的固化产物的固化性组合物，即使加热至260℃，因此无需维持其自身的温度，因此在剥离和裂纹的开发中被抑制 粘合性。解决方案：可固化组合物包含：（A）在分子中具有至少三个SiH基团的硅氧烷化合物; （B）在分子中具有至少两个与SiH基反应的烯基的硅氧烷化合物; 和（C）氢化硅烷化催化剂。 在该可固化组合物中，SiH基与与SiH基反应的烯基的摩尔比为2-15; 并且基于与SiH基反应的烯基的SiH基的含量的过量为至少2mmol / g。

公开(公告)号：JP2011227291A

公开(公告)日：2011-11-10

申请号：JP2010096941

申请日：2010-04-20

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： TAKENOUCHI HIROMI ,  OMI JUNICHI ,  SAITO SEIICHI

IPC: G03F7/075 ,  C08G59/40 ,  C08G77/14 ,  C08G77/20 ,  G03F7/004 ,  G03F7/023

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which can provide a permanent resist which is excellent in terms of transparency, can also be used as an insulating film of an active matrix substrate and has high heat resistance and chemical resistance after high heat history and to provide a permanent resist using the positive photosensitive composition and a method for manufacturing the permanent resist.SOLUTION: A positive photosensitive composition includes as (A) component polysiloxane compound obtained by hydrolysis and condensation of a predetermined cyclic siloxane compound and a predetermined alkoxysilane compound such that silanol groups remain, as (B) component a compound with at least two epoxy groups, as (C) component diazonaphthoquinones and as (D) component an organic solvent.

Abstract translation: 要解决的问题：为了提供能够提供透明性优异的永久性抗蚀剂的正性感光性组合物，也可以用作有源矩阵基板的绝缘膜，并且具有高耐热性和耐化学性 高热历史，并提供使用正性感光性组合物的永久抗蚀剂和永久抗蚀剂的制造方法。 解决方案：正型感光性组合物包含作为（A）成分的聚硅氧烷化合物，其通过使预定的环状硅氧烷化合物和规定的烷氧基硅烷化合物水解缩合而使硅烷醇基保留，作为（B）成分，具有至少两个 环氧基，（C）组分重氮萘醌和（D）组分为有机溶剂。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2013092633A

公开(公告)日：2013-05-16

申请号：JP2011234285

申请日：2011-10-25

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： TAKENOUCHI HIROMI ,  OMI JUNICHI ,  SAITO SEIICHI

IPC: G03F7/039 ,  C08G77/14 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition, which is suitable for the formation of an interlayer insulating film having high heat resistance, high solvent resistance, high transmittance and a low dielectric constant, and which has a large development margin capable of forming a favorable pattern even over the optimal developing time.SOLUTION: The positive photosensitive composition comprises a polysiloxane compound obtained by hydrolysis condensation of a compound (1) and a compound (2) of the formulae, a photoacid generator and an organic solvent. In the formulae, Rrepresents a 1-4C alkyl group or a 6-10C aryl group; Rrepresents a 2-10C divalent hydrocarbon group; Rrepresents a 2-10C divalent saturated aliphatic hydrocarbon group; and Xand Xrepresent an acid dissociable dissolution inhibiting group.

Abstract translation: 要解决的问题：提供一种正型感光性树脂组合物，其适于形成具有高耐热性，高耐溶剂性，高透射率和低介电常数的层间绝缘膜，并且具有大的显影性 即使在最佳开发时间内，边缘也能形成有利的格局。 解决方案：正型光敏组合物包含通过化合物（1）和式（2）的化合物（2），光酸产生剂和有机溶剂的水解缩合得到的聚硅氧烷化合物。 在该式中，R 1表示1-4C烷基或6-10C芳基; R 2 表示2-10C二价烃基; R 3 表示2-10C二价饱和脂族烃基; 并且X 1 和X 2 表示酸解离溶解抑制基团。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012113160A

公开(公告)日：2012-06-14

申请号：JP2010262740

申请日：2010-11-25

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MORITA HIROSHI ,  TAKENOUCHI HIROMI ,  KOBAYASHI JUN ,  OMI JUNICHI

IPC: G03F7/023 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition suitable for the formation of an interlayer insulating film having high heat resistance, high solvent resistance, high transmittance and a low dielectric constant, and having a large development margin that allows formation of a favorable pattern even when a developing time exceeds the optimal developing time in a developing process.SOLUTION: A positive photosensitive resin composition contains: a polysiloxane compound having a carboxyl group and/or a phenolic hydroxyl group as a base resin; a photosensitive diazoquinone compound as a photosensitive component; an organic solvent; and a hydrolyzed condensate of an alkyl silane compound expressed by a general formula (1) and an aryl silane compound expressed by a general formula (2).

Abstract translation: 要解决的问题：提供一种适用于形成具有高耐热性，高耐溶剂性，高透射率和低介电常数的层间绝缘膜的正型感光性树脂组合物，并且具有允许形成的大的显影边缘 即使在显影时间超过显影过程中的最佳显影时间的情况下也是有利的。 解决方案：正性感光性树脂组合物含有：具有羧基和/或酚性羟基的聚硅氧烷化合物作为基础树脂; 感光性重氮醌化合物作为感光性成分; 有机溶剂; 和由通式（1）表示的烷基硅烷化合物和由通式（2）表示的芳基硅烷化合物的水解缩合物。 版权所有（C）2012，JPO＆INPIT