公开(公告)号：EP1551936A4

公开(公告)日：2008-04-16

申请号：EP03765600

申请日：2003-07-16

Applicant: ADVANCED TECH MATERIALS

Inventor： BAUM THOMAS H ,  BERNHARD DAVID ,  MINSEK DAVID ,  RATH MELISSA

IPC: H01L21/02 ,  C03C15/00 ,  C09K13/00 ,  C09K13/08 ,  G03F7/42 ,  H01L21/306 ,  H01L21/308 ,  H01L21/311

CPC classification number: H01L21/31133 ,  C03C15/00 ,  C09K13/08 ,  G03F7/423 ,  H01L21/02063

Abstract: A composition and process for wet stripping removal of sacrificial anti-reflective silicate material, e.g., from a substrate or article having such material deposited thereon, particularly where the sacrificial anti-reflective material is present with permanent silicate materials desired to be unaffected by the wet stripping composition.