公开(公告)号：DE19709761C2

公开(公告)日：2002-11-21

申请号：DE19709761

申请日：1997-03-10

Applicant: ADVANTEST CORP

Inventor： YAMASHITA KOICHI

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027 ,  H01J37/304 ,  H01J37/317 ,  H01L21/30

Abstract: A pattern density for each of regions on a wafer is calculated from circuit pattern data, and a stage speed suitable for the pattern density for each of the regions is determined. An acceleration is etermined from the difference between the stage speeds for two adjacent the regions, and a higher one of the stage speeds is corrected into a lower stage speed such that the determined acceleration becomes smaller than a predetermined value. Inflection points where the stage speeds change are found. A quadratic function interconnecting adjacent two of the inflection points is determined, and the inflection points are interconnected with a curve represented by the quadratic function, thereby determining a path of movement for the stage of an electron beam exposure system. The stage is controlled to move along the path of movement thus determined.

公开(公告)号：DE19709761A1

公开(公告)日：1997-10-02

申请号：DE19709761

申请日：1997-03-10

Applicant: ADVANTEST CORP

Inventor： YAMASHITA KOICHI

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027 ,  H01J37/304 ,  H01J37/317 ,  H01L21/30

Abstract: The apparatus has an electron cannon (11) for ejecting electrons, deflectors (12,13) which control the electron beam, and a table (8) which supports a wafer (9), on which a circuit pattern has to be formed. A processor (1) controls the movement of the table. The processor also calculates the acceleration needed to cut the pattern in required density for every region. An arrangement is included, calculating the difference between the table velocity of two adjacent regions, correcting to the predefined value. Turning points are discovered as well and a quadrature function is provided connecting two points forming a curve for defining the cutting path. The magnetic and electric fields which control the deflectors are controlled by the exposure control unit (6) and the table by the table control unit (7). A magnetic disc (2) or tape (3) stores the programme for exposing the wafer to the beam and the data to be written, under the overall direction of the processor (1).

公开(公告)号：JPH0980100A

公开(公告)日：1997-03-28

申请号：JP23169195

申请日：1995-09-08

Applicant: ADVANTEST CORP

Inventor： FUKUI TAKAMASA ,  YAMASHITA KOICHI ,  YAMAGUCHI TAKAHIRO ,  AOYAMA OSAMU ,  KOSUGE TAKASHI ,  MIYAMAE YOSHIAKI ,  KASAHARA TOSHIHARU ,  TAKAOKU HIROAKI

IPC: G01R23/173 ,  G01R29/26

Abstract: PROBLEM TO BE SOLVED: To simply show time progress of noise level change by displaying the spectrum waveform of an input signal on one half part of a display screen and displaying noise on the other half part in a time domain. SOLUTION: A carrier frequency is positioned in the center of the left half of a display screen, and frequencies upward and downward separated by an offset value fof from the carrier frequency on both ends, and each spectrum therebetween is displayed. In other words, a spectrum waveform (frequency region) is displayed. In addition, the level of noise of a frequency fN upward separated by the offset value fof from the carrier frequency is displayed in time domain on the right half part of the display screen. In spectrum display for the frequency region of the left half part, frequency sweep is performed at least between fc ±Fof in regard to an input signal, necessary parts are taken out from data taken in a backup memory and are displayed. Taken-in display of the data for the left part display and the other taken-in display of the data for the right part display are performed alternately.

公开(公告)号：JP2008124477A

公开(公告)日：2008-05-29

申请号：JP2007296423

申请日：2007-11-15

Applicant: Advantest Corp ,  Fujitsu Ltd ,  富士通株式会社 ,  株式会社アドバンテスト

Inventor： KAWAKAMI KENICHI ,  SUSA MASAHIKO ,  KOBAYASHI KATSUHIKO ,  YAMADA AKIO ,  YAMASHITA KOICHI ,  NISHIO NAOKI

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/305

Abstract: PROBLEM TO BE SOLVED: To provide a variable-speed scan exposure method capable of attaining an exposure in a minimum exposure time while avoiding a faulty exposure. SOLUTION: The method of exposing to a charged particle beam includes irradiating a workpiece with a charged particle beam while moving the workpiece to expose an area of an exposure pattern, the method including: a step of generating speed data 56 having a speed distribution in a direction of motion of the workpiece, in which the speed data 56 are generated in accordance with secondary data 54 that are generated from pattern data 53 having at least data regarding the exposure pattern and data regarding exposure positions to have at least "dense/sparse" information on the exposure pattern; and a step of, while moving the workpiece at a variable speed according to the speed data 56 obtained by the preceding step, applying the charged particle beam onto the workpiece according to the pattern data 53. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够在避免曝光不良的同时以最小曝光时间获得曝光的可变速扫描曝光方法。 解决方案：暴露于带电粒子束的方法包括在移动工件的同时照射具有带电粒子束的工件以暴露曝光图案的区域，该方法包括：产生具有速度的速度数据56的步骤 在工件的运动方向上的分布，其中根据从具有至少关于曝光图案的数据的图案数据53生成的二次数据54生成速度数据56，以及关于曝光位置的数据至少具有“密集 /稀疏“信息; 以及根据由前述步骤获得的速度数据56以可变速度移动工件的步骤，根据图案数据53将带电粒子束施加到工件上。（C）2008年， JPO＆INPIT

公开(公告)号：JPH0980094A

公开(公告)日：1997-03-28

申请号：JP23166295

申请日：1995-09-08

Applicant: ADVANTEST CORP

Inventor： YAMASHITA KOICHI ,  FUKUI TAKAMASA ,  YAMAGUCHI TAKAHIRO ,  AOYAMA OSAMU ,  KOSUGE TAKASHI ,  MIYAMAE YOSHIAKI ,  KASAHARA TOSHIHARU ,  TAKAOKU HIROAKI

IPC: G01R23/173 ,  G01R23/20

Abstract: PROBLEM TO BE SOLVED: To properly measure three-dimensional distortion of a low level. SOLUTION: The input attenuation is made 0dB (S2 ), thereby it is made large by step 10dB and the three-dimensional distortion level L3 at this time is measured (S3 ). Next, the quantity of the input attenuation is changed to δATT=1dB, a three-dimensional distortion level L3 ' and a fundamental wave level L1 are measured and at the time a change quantity of the three- dimensional distortion level δDis =L3 -L3 ' is found. If the δDis is not within δATT±ε, it will be returned to (S3 ), furthermore the attenuation of 10dB is increased, and the similar method is performed. If the δDis is within δATT±ε, the three-dimensional distortion L3 ' at this time is made input and L1 -L3 '=ΔL represents the level difference between the fundamental wave and the three- dimensional distortion.

公开(公告)号：JPH0980092A

公开(公告)日：1997-03-28

申请号：JP23167895

申请日：1995-09-08

Applicant: ADVANTEST CORP

Inventor： FUKUI TAKAMASA ,  YAMASHITA KOICHI ,  YAMAGUCHI TAKAHIRO ,  AOYAMA OSAMU ,  KOSUGE TAKASHI ,  MIYAMAE YOSHIAKI ,  KASAHARA TOSHIHARU ,  TAKAOKU HIROAKI

IPC: G01R23/173 ,  G01R29/26

Abstract: PROBLEM TO BE SOLVED: To automatically determine the pass band width(RBW) or the like of a spectrum analyzer by determining RBW of BPF on the basis of the frequency interval of a waveform to be displayed, the noise level or the like. SOLUTION: RBW of BPFs 19, 24 of a spectrum analyzer 15 is made a parameter, and RBW is determined from the frequency interval of the waveform to be displayed so as to satisfy the relation with the frequency interval of the waveform to be displayed and the noise level or the dynamic range of an input signal. In other words, a control part 31 reads the spectrum of the input signal from a buffer memory 29, detects a frequency with its maximum value and makes it a central frequency. The central frequency is stored in a parameter value storing part 36. When the central frequency is determined, the input signal is measured again so that the central frequency may be in the center of a display scope and stored in a buffer memory 29. A noise part to be measured is made an offset value, three times thereof a frequency span, and RBW of BPFs 19, 24 is determined.

公开(公告)号：JPH09270375A

公开(公告)日：1997-10-14

申请号：JP7658996

申请日：1996-03-29

Applicant: ADVANTEST CORP

Inventor： YAMASHITA KOICHI

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To increase the throughput thereby alleviating the burden imposed on a stage driving mechanism by a method wherein the adjustable rate of a stage is decided by limiting the acceleration to a value not exceeding a specific allowance value as well as deciding the moving locus of a stage by connecting the rate changing points with the quadratic curve described by a quadratic function. SOLUTION: A processor 1 computes the pattern density from the pattern data on a wafer 9 stored in a magnetic disc 2 or magnetic tape 3 to decide the rate of stage 8 in each region. Next, the acceleration is calculated from the stage rate in adjacent regions so as to lower the rate of a stage 8 in the faster rate for making the acceleration not to exceed the specific allowable value. Next, the beam exposable range by electron beams per stage position to detect a bending point as the changing position of the rate of the stage 8 for deciding the secondary functions connecting adjacent two bending points so that the moving locus of the stage 8 may be decided by connecting respective inflection points with the curve described by the a quadratic function.

公开(公告)号：JPH07134151A

公开(公告)日：1995-05-23

申请号：JP27978293

申请日：1993-11-09

Applicant: ADVANTEST CORP

Inventor： YAMAGUCHI TAKAHIRO ,  FUKUI TAKAMASA ,  KASAHARA TOSHIHARU ,  YAMASHITA KOICHI ,  AOYAMA OSAMU ,  KOSUGE TAKASHI ,  MIYAMAE YOSHIAKI ,  TAKAOKU HIROAKI

IPC: G01R23/16 ,  G01R23/173

Abstract: PURPOSE:To store analytical conditions for high speed measurement and a plurality of precise measurements in an analytical condition memory means, successively store each analytical condition in each setting memory means, read the results obtained by frequency analysis according to respective analytical conditions into an image memory, and display a plurality of measurement results on one screen. CONSTITUTION:An analytical condition file for high speed measurement is stored in the memory area 200A of an analytical condition memory means 200, and analytical condition files for precise measurement are stored in the memory area 200B-200D. After the analytical conditions are stored in each memory area 200A-200D, the mode is switched to automatic measurement mode. A controller 115 successively reads the analytical condition files for high speed measurement and precise measurement, temporarily stores them in setting memory means 106, 107, 112, 117, 118, and performs frequency analysis according to the analytical conditions. The results are stored in four memory areas of an image memory 300. Thus, one or a plurality of the measurement results can be displayed in one screen of an indicator 301.

公开(公告)号：JPH10284387A

公开(公告)日：1998-10-23

申请号：JP9224897

申请日：1997-04-10

Applicant: FUJITSU LTD ,  ADVANTEST CORP

Inventor： KAWAKAMI KENICHI ,  SUSA MASAHIKO ,  KOBAYASHI KATSUHIKO ,  YAMADA AKIO ,  YAMASHITA KOICHI ,  NISHIO NAOKI

IPC: H01J37/20 ,  G03F7/20 ,  H01J37/147 ,  H01J37/302 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a variable speed scan exposing method in which the exposing time is minimized while avoiding defective exposure. SOLUTION: A sample 15 irradiated with a charged particle beam while being moved and the region of an exposing pattern is exposed. A speed data 56 having a speed distribution in the moving direction of the sample is then generated according to a secondary data 54 having the density information of exposing pattern generated from a pattern data 53 comprising the data of the exposing pattern and the exposing position. Furthermore, the sample is irradiated with a charged particle beam according to the pattern data 53 while being moved according to the speed data 56 thus obtained.