FORMATION OF TIB2 FILM AND TIB2 FILM

    公开(公告)号:JPH04103751A

    公开(公告)日:1992-04-06

    申请号:JP21949790

    申请日:1990-08-20

    Abstract: PURPOSE:To form a TiB2 film obtainable as a film in which TiB2 shall be utilized as various functional materials by mixing Ti powder and B powder in a specified ratio and thermal-spraying this mixed powder on the surface of a substrate in an inert atmosphere. CONSTITUTION:B powder is used in the ratio of 1.1 to 2mol 1mol of Ti powder, and both powder is mixed preferably in such a manner that the Ti powder is coated with the B powder. Next, the above mixed powder is plasma-sprayed on the surface of a substrate to font a TiB2 film on the surface of the substrate. Furthermore, at the time of using aluminum or the allay thereof as the substrate, the TiB2 film formed on the surface of the above substrate is mingled in the boundary between the substrate and the film, and is joined to the substrate with high mechanical strength.

    PRODUCTION OF METAL OXIDE AEROGEL

    公开(公告)号:JPH10130003A

    公开(公告)日:1998-05-19

    申请号:JP3375897

    申请日:1997-02-18

    Abstract: PROBLEM TO BE SOLVED: To obtain an aerogel of an excellent bulk body free from the generation of shrinkage and crack by holding a wet gel body of a metal oxide, a solvent and a specific material under a prescribed condition and removing the solvent to dry the wet gel body. SOLUTION: The wet gel body of the metal oxide (e.g. a silica wet gel body obtained by impregnating the gel body, which is obtained by mixing tetramethoxysilane with a methanol/ammonia water, pouring to a prescribed shaped vessel and allowing to stand, with methanol to remove an unreacted component), the solvent (e.g. methanol) and a granular zeolite having preferably 2-3mm average particle diameter are held under the critical condition or super critical condition (e.g. 280 deg.C 140atm) of the solvent preferably for 1-3hr and after that, the solvent is gradually released and removed to dry the wet gel body.

    FORMATION OF TIB2 DEPOSIT AND TIB2 DEPOSIT

    公开(公告)号:JPH04173950A

    公开(公告)日:1992-06-22

    申请号:JP29865790

    申请日:1990-11-02

    Abstract: PURPOSE:To stably form TiB2 deposit on the surface of a substrate having high hardness and excellent in wear resistance, at the time of forming TiB2 deposit on the surface of a substrate by plasma thermal spraying, by executing the thermal spraying in such a manner that the place of the tip of a thermal spraying nozzle is set to a one with a specified distance from the surface of the substrate. CONSTITUTION:The tip 11a of a thermal spraying nozzle of a plasma gun 11 is set on the surface of the substrate 16 to be treated in such a manner that the distance at which Ti powder 1 to be thermal-sprayed is not at all exposed to the air. A plasma gas is fed from a feeding apparatus 14 as well as the Ti powder 1 coated with B powder 2 is fed to the surface 1a, and Ti and B are thermal-sprayed on the surface of the substrate 16. Ti and B are formed into TiB2 by self exothermic reaction to form a plasma sprayed deposit contg. >=5wt.% Ti simple substance and TiO2 on the surface, consisting essentially of TiB2 and having high hardness and excellent wear resistance.

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