公开(公告)号：JPH10148850A

公开(公告)日：1998-06-02

申请号：JP32099796

申请日：1996-11-15

Applicant: AGENCY IND SCIENCE TECHN

Inventor： YOSHIMURA KAZUNORI ,  MIKI TAKESHI ,  TANEMURA SAKAE

IPC: G02F1/15 ,  C09K9/00 ,  C23C14/08 ,  C23C14/34

Abstract: PROBLEM TO BE SOLVED: To provide a thin film showing large changes in transmittance during coloring and decolorizing and having high coloring efficiency by sputtering while controlling the flow amt. of argon gas into a sputtering system to a specified range. SOLUTION: After a sputtering chamber 2 is evacuated by a vacuum pump 14, argon is introduced into the sputtering chamber 2 at 120 to 230sccm flow rate by a mass flow controller 16 and oxygen gas is introduced generally by 5 to 20sccm to perform DC magnetron sputtering. Thereby, titanium atoms sputtered from a target 8 is oxidized to produce titanium oxide by the oxygen gas introduced into the sputtering chamber 2, and the oxide is deposited to form at titanium oxide thin film of specified thickness on the surface of a substrate 10 facing the target. Thereby, the obtd. film shows large changes in the transmittance during coloring and decolorizing and gives high coloring efficiency.