PHOTOSENSITIVE RESIN COMPOSITION
    1.
    发明专利

    公开(公告)号:JPS62250440A

    公开(公告)日:1987-10-31

    申请号:JP9519586

    申请日:1986-04-24

    Abstract: PURPOSE:To obtain the titled composition capable of giving good solvent and moisture resisting properties, and forming a cured film having sufficient abrasion and print resisting properties after photopolymerizing it by incorporating a prescribed inorg. solid matter to a partially saponified vinylacetate polymer having a photocross-linkable group and a hydrophobic polymer emulsion. CONSTITUTION:The photosensitive resin composition is composed of an aqueous emulsion contg. the partially saponified vinylacetate polymer which has a styrbazolium group and 70-99mol% saponification degree, and the hydrophobic polymer emulsion. The aqueous emulsion contains 1-50wt% of water insoluble inorg. solid matter based on the solid component contained in the aqueous emulsion. Thus, the partially saponified vinylacetate polymer, which forms a continuous phase, is cross-linked and cured in the presence of the styrbazolium group as the photocross-linking group, and the emulsified ethylenic unsatd. compd. polymerizes, and binds with the hydrophobic polymer emulsion particles at an interface between the partially saponified vinylacetate polymer and the ethylenical unstd. emulsion particles, thereby forming a strong hardened film.

    NONLINEAR OPTICAL MATERIAL
    2.
    发明专利

    公开(公告)号:JPH0869023A

    公开(公告)日:1996-03-12

    申请号:JP20653694

    申请日:1994-08-31

    Abstract: PURPOSE: To control nonlinear optical characteristics in a two-dimensional space at a fast rate by light by incorporating a compd. showing reversible or irreversible changes in absorption of light by irradiation of light or combination of irradiation of light and heat treatment into a polymer matrix in a specified proportion. CONSTITUTION: A compd. (photochromic compd.) showing reversible or irreversible changes in absorption of light by irradiation of light or combination of irradiation of light and heat treatment is incorporated by 30-90wt.%, preferably 40-70wt.% of the total nonlinear optical material into a polymer matrix. As for the photochromic compd. for example, spiropyran, fulgide, azobenzene, spirooxazine, diarylethene, deriv. of these, combination of biimidazole deriv. and leuco dye, or combination of org. halogen compd. and leuco dye can be used.

    PHOTOSENSITIVE MATERIAL FOR HOLOGRAM RECORDING

    公开(公告)号:JPH03278082A

    公开(公告)日:1991-12-09

    申请号:JP7849090

    申请日:1990-03-27

    Abstract: PURPOSE:To provide the photosensitive material which has excellent chemical stability, high resolution, high diffraction efficiency, etc., and has an excellent photosensitive characteristic to long-wavelength laser beams by combining poly-N-vinyl carbazole, a compd. having polymerizable ethylenic unsatd. bonds and a specific photopolymn. initiator. CONSTITUTION:The photopolymn. initiator, consisting of the combination of the tetrabenzoporphyrins expressed by formula I or metal complex thereof and an electron-accepting radical generator, the poly-N-vinyl carbazole as a supporting material having a refractive index as high as 1.68 and the compd. having at least >=1 pieces of the polymerizable ethylenic unsatd. bonds are combined. In the formula I, R denotes a hydrogen atom, alkyl group or a residual arom. group which may have a substituent; the respective benzene rings may have an alkyl group or alkoxy group as a substituent. The photosensitive material for hologram recording which has the excellent chemical stability, the high resolution and the high diffraction efficiency based on high-refractive index modulation and has the excellent photosensitive material to the long- wavelength laser beams of >=600nm is obtd. in this way.

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