公开(公告)号：WO1996017253A1

公开(公告)日：1996-06-06

申请号：PCT/US1995015466

申请日：1995-11-29

Applicant: ANALOG DEVICES, INC.

Inventor： ANALOG DEVICES, INC. ,  HOWE, Roger, T. ,  BARBER, H., Jerome ,  JUDY, Michael

IPC: G01P15/08

CPC classification number: B81B3/0008 ,  G01P15/0802 ,  G01P15/125 ,  G01P2015/0814 ,  Y10S73/01

Abstract: An electro-mechanical micromachined structure uses bumpers (52) to prevent contact between structures at different potentials. A beam (22) is connected to one or more anchors (26) by flexible suspensions (24), which permit the beam (22) to move along a predetermined axis relative to one or more plates (34, 36). The suspension (24) includes at least one bumper (52) positioned so that the bumper (52) will contact another part of the suspension (24) before the beam (22) contacts the plates. The bumper is made from the same material as the suspension (24), during the same processing step. The bumper (52) is positioned to take advantage of shrinkage or expansion of the beam (22) during processing which forces the bumper (52) closer to its contact point than would otherwise be possible.

Abstract translation: 机电微加工结构使用缓冲器（52）来防止在不同电位下的结构之间的接触。 梁（22）通过柔性悬架（24）连接到一个或多个锚固件（26），这允许梁（22）相对于一个或多个板（34,36）沿着预定轴线移动。 悬架（24）包括至少一个缓冲器（52），其被定位成使得缓冲器（52）在梁（22）接触板之前将接触悬架（24）的另一部分。 在相同的加工步骤中，保险杠由与悬架（24）相同的材料制成。 保险杠（52）被定位成在处理期间利用梁（22）的收缩或膨胀，这迫使保险杠（52）比其它方式更接近接触点。

公开(公告)号：WO1996017232A1

公开(公告)日：1996-06-06

申请号：PCT/US1995015284

申请日：1995-11-29

Applicant: ANALOG DEVICES, INC.

Inventor： ANALOG DEVICES, INC. ,  HOWE, Roger, T. ,  BART, Stephen

IPC: G01L01/14

CPC classification number: G01P15/125 ,  G01L1/148 ,  G01P15/131 ,  G01P2015/0814 ,  H01G5/14

Abstract: A micromachined force sensor containing separate sensing (38) and actuator (80) structures. A member (10) is suspended above the substrate so that it is movable along an axis (X) in response to a force. The member includes a set of parallel sense (38) fingers and a separate set of parallel force (80) fingers. The sense fingers are positioned between fingers of two sense plates (40, 42) to form a first differential capacitor, whose capacitance changes when the member moves in response to a force along the axis. The change in capacitance induces a sense signal on the member, which permits the measurement of the magnitude and duration of the force. The force fingers are positioned between fingers of two actuator plates (82, 84) to form a second differential capacitor. The sense signal can be used to provide feedback to the second differential capacitor to generate different electrostatic forces between the force fingers (80) and the two actuator plates (82, 84) to offset the force applied along the preferred axis. Limit stops (30) limit the movement of the member to less than the distance between the electrodes of the differential capacitors, to prevent contact between the electrodes. Additional fingers (100, 102, 104) are positioned around the differential capacitors to minimize parasitic capacitances.

Abstract translation: 包含单独的感测（38）和致动器（80）结构的微机械力传感器。 构件（10）悬挂在基板上方，使得其可以响应于力而沿轴线（X）移动。 该构件包括一组平行的手指（38）和一组单独的平行力（80）的手指。 感测指状物定位在两个感测板（40,42）的指状物之间，以形成第一差分电容器，当构件响应于沿着轴的力移动时，其电容发生变化。 电容的变化会引起元件上的感应信号，这样可以测量力的大小和持续时间。 力指定位于两个致动器板（82,84）的指状物之间，以形成第二差分电容器。 感测信号可以用于向第二差分电容器提供反馈以在力指（80）和两个致动器板（82,84）之间产生不同的静电力，以抵消沿着优选轴施加的力。 极限停止（30）将构件的移动限制为小于差动电容器的电极之间的距离，以防止电极之间的接触。 附加指状物（100,102,104）围绕差分电容器定位以最小化寄生电容。

公开(公告)号：WO1996017256A1

公开(公告)日：1996-06-06

申请号：PCT/US1995015286

申请日：1995-11-29

Applicant: ANALOG DEVICES, INC.

Inventor： ANALOG DEVICES, INC. ,  CHAU, Kevin, Hin-Leung ,  HOWE, Roger, T. ,  PAYNE, Richard, S. ,  ZHAO, Yang ,  CORE, Theresa ,  SHERMAN, Steven, J.

IPC: G01P15/125

CPC classification number: G01P15/125 ,  G01P15/0802 ,  G01P2015/0814

Abstract: A method and apparatus for providing a conductive plane (40) beneath a suspended microstructure. A conductive region is diffused into a substrate. A dielectric layer is added, covering the substrate, and then removed from a portion of the conductive region. A spacer layer is deposited over the dielectric and exposed conductive region. A polysilicon layer is deposited over the spacer layer, and formed into the shape of the suspended microstructure. After removal of the spacer layer, the suspended microstructure is left free to move above an exposed conductive plane (40). The conductive plane is driven to the same potential as the microstructure.

Abstract translation: 一种用于在悬浮微结构下方提供导电平面（40）的方法和装置。 导电区域扩散到基板中。 添加介电层，覆盖基板，然后从导电区域的一部分去除。 间隔层沉积在电介质和暴露的导电区域上。 在间隔层上沉积多晶硅层，并形成为悬浮微结构的形状。 在去除间隔层之后，悬浮的微结构保持自由以在暴露的导电平面（40）上移动。 导电平面被驱动到与微结构相同的电位。

公开(公告)号：WO1993021536A1

公开(公告)日：1993-10-28

申请号：PCT/US1993003179

申请日：1993-04-05

Applicant: ANALOG DEVICES, INC.

Inventor： ANALOG DEVICES, INC. ,  CORE, Theresa, A. ,  HOWE, Roger, T.

IPC: G01P15/08

CPC classification number: B81C1/0092 ,  B81B2201/0235 ,  B81C1/00928 ,  B81C99/004 ,  G01P15/0802 ,  G01P15/125 ,  G01P15/131 ,  G01P2015/0814

Abstract: A suspended microstructure fabrication process. Photoresist pedestals (38a) are inserted in a sacrificial layer (30) between the suspended microstructure (20) and the substrate (14) and photoresist spacers (38) are inserted in the microstructure layer between non-contacting portions of the suspended microstructure so that the photoresist pedestals and spacers support the microstructure bridge during the wet etching and drying process used to remove the sacrificial layer.

Abstract translation: 悬浮微结构制造工艺。 将光阻基座（38a）插入在悬浮微结构（20）和衬底（14）之间的牺牲层（30）中，并且将光致抗蚀剂间隔物（38）插入悬浮微结构的非接触部分之间的微结构层中，使得 在用于去除牺牲层的湿蚀刻和干燥过程期间，光致抗蚀剂基座和间隔件支撑微结构桥。