Indium-phosphide VCSEL with dielectric DBR

    公开(公告)号:AU2021103713A4

    公开(公告)日:2021-08-19

    申请号:AU2021103713

    申请日:2021-06-29

    Applicant: APPLE INC

    Abstract: An optoelectronic device includes a carrier substrate (22), with a lower distributed Bragg reflector (DBR) stack (24) disposed on an area of the substrate and including alternating first 5 dielectric and semiconductor layers. A set of epitaxial layers (26, 28, 30, 31, 34) is disposed over the lower DBR, wherein the set of epitaxial layers includes one or more Il-V semiconductor materials and defines a quantum well structure (28) and a confinement layer (31). An upper DBR stack (38) is disposed over the set of epitaxial layers and includes alternating second dielectric and semiconductor layers. Electrodes (40, 42) are coupled to apply an excitation current to the 10 quantum well structure. n -36

    Indium-phosphide VCSEL with dielectric DBR

    公开(公告)号:AU2021103713B4

    公开(公告)日:2021-12-02

    申请号:AU2021103713

    申请日:2021-06-29

    Applicant: APPLE INC

    Abstract: An optoelectronic device includes a carrier substrate (22), with a lower distributed Bragg reflector (DBR) stack (24) disposed on an area of the substrate and including alternating first 5 dielectric and semiconductor layers. A set of epitaxial layers (26, 28, 30, 31, 34) is disposed over the lower DBR, wherein the set of epitaxial layers includes one or more Il-V semiconductor materials and defines a quantum well structure (28) and a confinement layer (31). An upper DBR stack (38) is disposed over the set of epitaxial layers and includes alternating second dielectric and semiconductor layers. Electrodes (40, 42) are coupled to apply an excitation current to the 10 quantum well structure.

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